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Kabushiki Kaisha Toyoda Jidoshokki Seisakusho

Takatoshi Ito

Kazunori Shimazaki

Shuzo Hattori

Akihiro Yoshida

A hybrid IC substrate has a substrate body and a retaining film which is formed on a surface of the substrate body. The retaining film enables a solution containing a circuit-element-forming material to permeate therethrough and retains the solution on the substrate body. The solution, which is expelled onto the hybrid IC substrate in the form of liquid drops, permeates the above-mentioned retaining film and becomes attached to the surface of the substrate body. Then, the hybrid IC substrate is baked. The retaining film is thus backed off, thereby forming a film of the circuit-element-forming material as a circuit pattern on the substrate body.

Substrate of a hybrid IC, method of forming a circuit pattern and

A hybrid IC substrate has a substrate body and a retaining film which is formed on a surface of the substrate body. The retaining film enables a solution containing a circuit-element-forming material to permeate therethrough and retains the solution on the substrate body. The solution, which is expelled onto the hybrid IC substrate in the form of liquid drops, permeates the above-mentioned retaining film and becomes attached to the surface of the substrate body. Then, the hybrid IC substrate is baked. The retaining film is thus baked off, thereby forming a film of the circuit-element-forming material as a circuit pattern on the substrate body.

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Kariya, Japan

Takatoshi Ito