Sharp Kabushiki Kaisha Corporation

Kyoritsu Chemical Co., Ltd.

Takashi Yoshizawa

Tokio Taguchi

Akiyoshi Fujii

Chiaki Minari

Katsuhisa Senda

Eishi Katakami

Tsubasa Shiine

Mitsutoshi Naito

Kenta Ishino

The present invention provides a display panel with a flat plate in which a member partially provided with a light blocking part is disposed in front of a display panel, and a curable resin therebetween is sufficiently cured even in an area behind the light blocking part. The display panel with a flat plate of the present invention includes: a flat plate provided with a light passing part and a light blocking part; a display panel; and an adhesive layer between the flat plate and the display panel, the adhesive layer being a cured resin layer obtainable by polymerization involving at least one reactive component selected from the group consisting of a (meth)acrylate oligomer, a bicyclic ring-containing (meth)acrylate monomer, and a hydroxyl group-containing (meth)acrylate monomer, a peroxide component, and a primer as reaction materials.

Display panel with flat plate, method for manufacturing display panel with flat plate, and resin composition

The present invention provides a display panel equipped with a front plate and a display device, in each of which streak unevenness is sufficiently resolved in the periphery of a display area. The display panel equipped with a front plate of the present invention comprises: a display panel; a front plate; and a cured resin composition layer disposed between the display panel and the front plate, wherein the cured resin composition layer has a loss tangent of 2 or less at 0 to 70&#xb0; C.

Display panel equipped with front plate, display device, and resin composition

A plasma processing apparatus that allows processing of high quality under a wider processing condition is provided by optimizing the distance between a plasma region and a substrate even in the case where the processing condition such as process pressure or high frequency output differs. A plasma chamber is divided into a lower plasma chamber and an upper plasma chamber. A process chamber and the lower plasma chamber are connected flexibly by a lower chamber bellows. The lower plasma chamber and the upper plasma chamber are connected flexibly by an upper chamber bellows. Since the radioactive species volume is increased when the process pressure is low, the lower and upper plasma chambers are respectively raised. In contrast, since the radioactive species volume is reduced when the process pressure is high, the upper and lower plasma chambers are respectively lowered.

Plasma processing apparatus

A substrate processing device of the present invention includes: a conveyor mechanism provided in a vacuum chamber for conveying a substrate thereon; a heating section provided within the vacuum chamber for heating the substrate; and a processing gas introduction section for introducing a processing gas to a processing zone within the vacuum chamber. A surface of the substrate is consecutively subjected to a predetermined process by: introducing a flow of the processing gas from the processing gas introduction section into the processing zone; conveying the substrate into and past the processing zone by means of the conveyor mechanism while heating the substrate by means of the heating section. The substrate processing device further includes an inert gas supplying section provided in the vacuum chamber for supplying an inert gas for controlling the flow of the processing gas.

Growing community of inventors

Osaka, Japan

Takashi Yoshizawa