Kishimoto Sangyo Co., Ltd.

Otsuka Chemical Co., Ltd.

Fine Polymers Corporation

Takashi Yata

Yutaka Koinuma

Kazunori Fukumura

Shigeru Kamon

Shigemasa Suga

Akihiro Terai

Shigeki Terayama

Takeru Ohgushi

Yoshihito Fukumura

Shigek Terayama

The invention has for its object the provision of a cleaner capable of removing particles and metal impurities present on the surface of a wafer without corrosion of wirings, gates or the like yet at normal temperature in a short period of time and with a one-pack type solution. To accomplish the above object, the invention provides a cleaner that is an aqueous solution containing phosphoric acid, hydrofluoric acid, and ammonia and/or amine, and having a pH ranging from 2 to 12, wherein the aqueous solution comprises 0.5 to 25 mass % of phosphoric acid, 0.1 to 10 mass % of ammonia and/or amine, and 5&#xd7;10to 5.0 mass % of hydrofluoric acid.

Cleaner for semiconductor devices

The invention provides a nontoxic, undangerous resist residue remover that enables removal of resist residues to be carried out without metal corrosion or other problems and with safety. The remover is an aqueous solution containing ammonium phosphate and/or condensed ammonium phosphate and having a pH ranging from 1 to 10.

Resist residue remover

Detergent for processes for producing semiconductor devices or producing

Growing community of inventors

Osaka, Japan

Takashi Yata