Matsushita Electric Industrial Co., Ltd.

Hoya Corporation

Takashi Yasui

Katsuhiro Takushima

To provide a photomask capable of preventing a foreign matter generation in using the photomask, and an exposure method using this photomask. The photomask includes a transparent substrate; a transfer patternformed in a main regionof a center portion of the transparent substrate; a light-shading band regionprovided adjacent to the main regionin the outer peripheral region of the main region; and a pellicleformed by adhering a pellicle filmto a pellicle frameby an adhesive, wherein this pellicleis adhered onto a light-shading regionconsisting of a light-shading film formed in the outer peripheral region of the main region, through an adhesive

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Osaka, Japan

Takashi Yasui