Tosoh Corporation

Tosho, Inc.

Takashi Yamamoto

Toru Seita

Takahiko Ishiguro

Hisao Eguchi

Juichi Saitoh

Yasumichi Miyagawa

Ryuichi Horie

Yoshitaka Tsutsumi

Takumi Tokunaga

Shinji Ozoe

Mitsuhiro Kamezawa

Shin-ichi Ishikawa

Masaaki Todoko

Tadashi Hayashi

Toshiya Higashino

Kyoko Nagaoka

Katsuya Shibata

Yasuhiro Oda

Toshitaka Taya

Kosaburo Matsumura

Takeshi Hironaka

Tatsuki Suzuki

An aminoalkoxystyrene represented by the formula (1) wherein Rand Rare Calkyl and n is 3-6. The aminoalkoxystyrene is prepared by reacting an aminoalkoxyphenylmagnesium halide with vinyl halide in the presence of a catalyst. A quaternized amino group-containing polymer made by quaternizing the amino groups of a polymer prepared from the aminoalkoxystyrene is useful as an anion exchanger.

Aminoalkoxystyrene, process for preparation thereof, polymer thereof, process for producing the polymer and use thereof

Nucleic acid probe

A chloroprene rubber having a shade of white only slightly tinged with pale yellow and exhibiting good tackiness is prepared by an aqueous radical emulsion polymerization of chloroprene or a mixture comprised of chloroprene and a copolymerizable monomer, wherein the polymerization is effected by using an alkali metal salt of a disproportioned rosin acid as an emulsifier, and a water-soluble polymeric substance as a dispersion stabilizer which has a sulfonic acid group and/or sulfate ester groups, which group has been introduced by an addition polymerization procedure or by a procedure of a polymeric reaction following an addition polymerization.

Process for producing chloroprene rubber

An acrylic copolymer rubber which is a random copolymer of

Acrylic copolymer rubber

Photoresist composition comprising a non-aromatic resin having no

A pellicle film comprised of a resin prepared by reducing a polyvinyl acetal of the formula: ##STR1## wherein R is a C1-3 alkyl group and the vinyl acetate content 'y/(x+y+z)' is not larger than 0.1 and the degree of acetalization 'z/(x+y+z)' is at least 0.6. This pellicle film exhibits a reduced UV absorption in the vicinity of 365 nm and is durable against irradiation with UV rays, especially i-line of a mercury arc light.

Film for pellicle

Growing community of inventors

Shunan, Japan

Takashi Yamamoto