Renesas Electronics Corporation

Renesas Technology Corp.

Hitachi Ulsi Systems Co., Ltd.

Other

Takashi Yamaki

Toshihiro Tanaka

Yutaka Shinagawa

Masamichi Fujito

Kazufumi Suzukawa

Mitsuru Hiraki

Hiroyuki Tanikawa

Yukiko Umemoto

Nozomu Matsuzaki

Yoshiaki Kamigaki

Shinichi Minami

Kozo Katayama

Digh Hisamoto

Akira Kato

Kan Yasui

Yoshiki Kawajiri

Masashi Wada

Kiichi Makuta

Daisuke Okada

Tetsuya Ishimaru

Hiromi Notani

Kan Takeuchi

Takayuki Fukuoka

Yoshikazu Iida

Fumihiko Nitta

Jiro Ishikawa

Mitsuru Hirakii

In a semiconductor device, memory modules each having a low power consumption mode that is enabled and disabled by a control signal belong to a memory block. A transmission path of the control signal is provided such that the control signal is inputted in parallel to the memory module via an inside-of-module path, and such that the control signal is outputted by a particular memory module of the memory modules via the inside-of-module path to a downstream outside-of-module path. The particular memory module in the memory block is selected such that it has a greater storage capacity than the other memory modules belonging to this same memory block have.

Semiconductor device

A semiconductor device includes a plurality of nonvolatile memory cells (). Each of the nonvolatile memory cells comprises a MOS type first transistor section () used for information storage, and a MOS type second transistor section () which selects the first transistor section. The second transistor section has a bit line electrode () connected to a bit line, and a control gate electrode () connected to a control gate control line. The first transistor section has a source line electrode () connected to a source line, a memory gate electrode () connected to a memory gate control line, and a charge storage region () disposed directly below the memory gate electrode. A gate withstand voltage of the second transistor section is lower than that of the first transistor section. Assuming that the thickness of a gate insulating film of the second transistor section is defined as tc and the thickness of a gate insulating film of the first transistor section is defined as tm, they have a relationship of tc&#x3c;tm.

A semiconductor device having an active mode and a standby mode as operation modes, includes a first power supply line supplied with a first internal power supply voltage from a first external power supply and an internal power supply circuit generating a second internal power supply voltage based on an external power supply voltage from a second external power supply circuit. A second power supply line supplied with said second internal power supply voltage from said internal power supply circuit.

Semiconductor device having active mode and standby mode

In an active mode, a VDD line receives an internal power supply voltage from an external regulator. A VDD_RAM line receives an internal power supply voltage from an internal regulator. A PMOS switch includes a first PMOS transistor having a source and an N-type well connected to the VDD line, and a second PMOS transistor having a source and an N-type well connected to the VDD_RAM line and a drain connected to a drain of the first PMOS transistor. The first PMOS transistor is controlled based on a control command from a system control circuit and a voltage of the VDD_RAM line. The second PMOS transistor is controlled based on the control command and a voltage of the VDD line.

When a leakage type determining circuit determines that leakage current components of a gate leakage and a substrate leakage are larger in a resume standby mode, a VDDR regulator generates a power supply voltage VDDR at a first voltage level lower than a power supply voltage VDD, and supplies the voltage as a power supply voltage VDDRto an SRAM module via a selector switch. When the leakage type determining circuit determines that a leakage current of a channel leakage is larger, the VDDR regulator supplies the power supply voltage VDDRhigher than the first voltage level and lower than the power supply voltage VDD to the SRAM module. Also, an ARVSS regulator supplies a cell source power supply voltage higher than a reference voltage to an SRAM module in another region.

Semiconductor integrated circuit device

A phase change memory includes a memory cell with a phase change element storing data according to level change of a resistance value in association with phase change, a write circuit converting the phase change element to an amorphous state or a polycrystalline state according to the logic of write data in a write operation mode, a read circuit reading out stored data from the phase change element in a readout operation mode, and a discharge circuit applying a discharge voltage to the phase change element to remove electrons trapped in the phase change element in a discharge operation mode. Accordingly, variation in the resistance value at the phase change element can be suppressed.

Semiconductor device including resistance storage element

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Kodaira, Japan

Takashi Yamaki