Canon Kabushiki Kaisha

Toyota Jidosha Kabushiki Kaisha

Taiho Industries Co., Ltd.

No Touch North America

Takashi Ushijima

Yoshitaka Zaitsu

Yoshikatsu Ichimura

Atsushi Kandori

Takayuki Yagi

Takayuki Teshima

Yasuhiro Shimada

Kaoru Noguchi

Toshiyuki Ogawa

Susumu Yasuda

Kazuhiko Kato

Futoshi Hirose

Makoto Terui

Kazuhiro Hayakawa

Takeo Yamazaki

Seigo Shinohara

Takahisa Kato

Koichiro Nakanishi

Atsushi Imai

Yosuke Osanai

Tetsuo Kijima

Rei Kurashima

Tsuyoshi Nishiwaki

Atsushi Ikeda

Tomoyuki Kawano

Masakazu Okada

Jiro Nohara

A semiconductor device including: a semiconductor substrate a semiconductor element is formed; a first electrode layer stacked on the semiconductor substrate and connected to the semiconductor element; a first insulation film stacked on an upper face of the first electrode layer; and a second electrode layer stacked over the first electrode layer and the first insulation film, the second electrode layer including a material having a mechanical strength that is higher than a mechanical strength of a material included in the first electrode layer; wherein a groove portion is provided from the upper face in a direction toward a lower face of the first electrode layer, a protrusion portion protruding into the groove portion is provided on a lower face of the second electrode layer, and a lower end of the protrusion portion is positioned below the center position in a thickness direction of the first electrode layer.

Semiconductor device

A semiconductor device including a semiconductor substrate and an electrode formed from an alloy containing aluminum, silicon and titanium. The silicon content in the electrode is from 0.5 to 1.0% by weight relative to the total weight of the electrode, the titanium content in the electrode is from 0.8 to 3.0% by weight relative to the total weight of the electrode, and the thickness of the electrode is at least 1 &#x3bc;m.

A manufacturing method of a semiconductor device includes placing a mask having an opening on an external region of a top face of a substrate to locate an end portion of the opening of the mask just above a concave portion formed on the top face of the substrate, the external region being located outside the concave portion. The manufacturing method further includes: growing a conductive film on part of the top face of the substrate through the mask after the mask is placed on the substrate, the part of the top face containing the concave portion; and removing the mask from the substrate after the conductive film is grown.

Semiconductor device and manufacturing method of semiconductor device

An inspection apparatus for inspecting output signal of a semiconductor device is provided with a monitor device configured to sense a signal on the monitor line and a plurality of inspection circuits connected to the monitor line. Each inspection circuit is provided with a semiconductor device support allowing a semiconductor device to be set thereon and including a signal terminal to which a signal is input from the set semiconductor device, a first resistor connected between the signal terminal and the monitor line, a selector terminal, and a first diode connected between the signal terminal and the selector terminal so that a cathode of the first diode is connected to a selector terminal side.

Inspection apparatus, inspection system, inspection method of semiconductor devices, and manufacturing method of inspected semiconductor devices

An oscillating device includes an oscillator, an elastic supporting member for movably supporting the oscillator, a first supporting frame for supporting the elastic supporting member, and a second supporting frame extending along the elastic supporting member with a spacing maintained therebetween, the second supporting member extending from the first supporting frame, wherein the second supporting frame is provided in a cantilever shape relative to the first supporting frame.

Oscillator and optical deflector having oscillator

There is provided an image forming apparatus and method capable of reducing a measurement error in a measurement result of the surface potential of an electrostatic latent image formed on the surface of an image bearing member. The measurement error occurs under the influence of an electric field generated from a pre-exposed area. Consequently, miniaturization of an image forming apparatus and consistent print quality can be achieved. The image forming apparatus includes an image forming control section for determining an error correction value corresponding to the charge state of a latent image on the basis of relationships between charge states of the latent image and error correction values which have been prepared in advance, computing an error corrected potential measurement value using the error correction value and a potential measurement value, and controlling the image forming apparatus on the basis of the error corrected potential measurement value.

Image forming apparatus and image forming method with error corrected potential measurements

A beam having a base material of silicon monocrystal and at least one projection which is integrally formed so as to be supported at least at one end thereof and which has two surfaces having an orientation plane (111), includes a bottom surface in a plane which is common with a plane of the base material; a groove penetrating from the bottom surface to a top of the projection; and a protecting member having a resistance property against a crystal anisotropic etching liquid and covering an inner wall of the groove.

Beam, ink jet recording head having beams, and method for manufacturing ink jet recording head having beams

A potential measurement apparatus for measuring a surface potential of an object of measurement detects a change in electric charge induced at a detection electrode due to electrostatic induction by changing a distance between the detection electrode and the object of measurement in accordance with a predetermined period, using a neutral distance as reference, as a signal representing a change in electric current. The potential measurement apparatus includes a first detection unit for detecting a signal representing a fundamental period of the change in electric current and a signal representing a second harmonic period, a second detection unit for detecting information representing a capacitance between the detection electrode at the neutral distance and the object of measurement and an arithmetic unit for computationally obtaining information on the surface potential of the object of measurement, with eliminating an influence of the neutral distance and the capacitance, according to an outcome of detection of the first detection unit and an outcome of detection of the second detection unit.

Potential measurement apparatus and image forming apparatus

An oscillator device includes an oscillator, a resilient support member configured to support the oscillator for oscillatory motion about an oscillation central axis, a magnetic member provided on the oscillator, and a magnetic-field generating member disposed opposed to the oscillator, wherein the oscillator has a through-hole extending through the oscillator from its top surface to its bottom surface, and wherein the magnetic member is provided in the through-hole.

Oscillator device, optical deflector and optical instrument using the same

An electric potential measuring apparatus including a substrate disposed facing a measurement object, a detecting electrode provided insulated from the substrate, and a capacity modulating unit for modulating a coupling capacity between the detecting electrode and the measurement object. In the electric potential measuring apparatus, a region with a dielectric constant less than a dielectric constant of the substrate is formed in the substrate to achieve an increase in resistivity of a portion of the substrate between detecting electrodes, or a decrease in a stray capacity between the detecting electrode and the substrate.

Electric potential measuring apparatus, and image forming apparatus

A potential measuring apparatus has a detection electrode on which an electric charge is induced according to a potential of a detection object, and a modulator for altering the generated quantity of the electric charge. The detection electrode has at least one depressed portion on a surface opposite to the detection object.

Potential measuring apparatus

A potential measurement apparatus is provided which can suitably maintain the oscillation state of an oscillator including a detection electrode and stably measure the potential of a measurement object. The potential measurement apparatus includes a bearing part, an elastic supporting part supported by the bearing part, an oscillator movably supported by the elastic supporting part, detection electrodes installed in the oscillator, a drive mechanism driving the oscillator and a signal detection unit. The signal detection unit is connected to the detection electrodes to detect electrical signals appearing in the detected electrodes. A stress detecting element for generating an electric signal according to the stress of the elastic suspension partis provided.

A method for fabricating a mold for a microlens having a desired radius (R) of curvature by electroplating. In this method, a minimum radius (R) of curvature is utilized to achieve the desired curvature radius.

Method for fabricating a mold for a microlens

A potential sensor is provided in which the adhesion of toner particles to the potential sensor is reduced or prevented from occurring, reducing or preventing the occurrence of a situation that accurate detection cannot be performed. The potential sensor has a movable member, detecting electrodes formed on the movable member, a support which movably supports the movable member, a driving mechanism which drives the movable member, and a stationary member which supports the support. Between the movable member and the stationary member, a first gap is so formed as to make the movable membermovable. The first gap has a part that is not larger in width than the maximum size of toner particles when the movable member is not elastically deformed and is at a neutral position.

Growing community of inventors

Yokohama, Japan

Takashi Ushijima