Kokusai Electric Corporation

Takashi Tsukamoto

Sadayoshi Horii

Daisuke Hara

Hideto Tateno

Takuya Joda

Akinori Tanaka

Masahisa Okuno

Toru Kakuda

A substrate processing apparatus, includes: a process chamber accommodating a substrate; a vaporizer vaporizing a liquid precursor to generate reaction gas and deliver a processing gas containing the reaction gas and a carrier gas, the vaporizer including: a vaporization vessel; and a heater heating the liquid precursor introduced into the vessel; a carrier gas flow rate controller controlling flow rate of the carrier gas supplied to the vaporizer; a liquid precursor flow rate controller controlling flow rate of the liquid precursor; a processing gas supply pipe introducing the processing gas delivered from the vaporizer into the process chamber; and a gas concentration sensor detecting a gas concentration of the reaction gas contained in the processing gas delivered from the vaporizer into the processing gas supply pipe.

Substrate processing apparatus

Growing community of inventors

Toyama, Japan

Takashi Tsukamoto