Tokyo Electron Limited

Nichias Corporation

Tokyo Electron Sagami Limited

Tokyo Electron Kabushiki Kaisha

Tokyo Electron Tohoku Kabushiki Kaisha

Tokyo Electron Tohoku Limited

Takashi Tanahashi

Syuji Moriya

Toshiro Nakano

Kenichi Yamaga

Katsuhiro Yamashita

Katsumi Ishii

Takenobu Matsuo

Takanobu Asano

Kazunari Sakata

Motoki Akimoto

Seiichi Yoshida

Akihiro Imai

Akira Onodera

Ken Nakao

Wataru Okase

Masaji Kurosawa

Tsuyoshi Wakabayashi

Hirotsugu Shiraiwa

Takashi Taniguchi

Masaharu Abe

Hiroshi Motono

Satoshi Minobe

An air filter sheet comprising particles of a functional agent with an average particle diameter of 0.1 to 30 &#x3bc;m and fibrils of a polytetrafluoroethylene resin with a number average molecular weight of 3,000,000 to 50,000,000, the ratio by weight of the functional agent to the fibrils of the polytetrafluoroethylene resin being from 1 to 99. According to the present invention, an air filter sheet comprising fibrils of polytetrafluoroethylene resin with a functional agent carried thereon, possessing excellent formability, and being free from a lubricant, a process for manufacturing the air filter sheet, and an air filter free from contamination of outgas with a lubricant are provided.

Air filter sheet, process for manufacturing same, and air filter

An adsorption filter includes at least one thin plate honeycomb filtering medium carrying a gas-adsorbing medium thereon and a filter case housing the honeycomb filtering medium therein. The thin plate honeycomb filtering medium is disposed in the filter case in such a manner as to make a series of V configurations with respect to a ventilation direction.

Adsorption filter and manufacturing method thereof

The chemical filter supporting an ion-exchange resin comprising a fiber supporting body containing ion-exchange fiber and ion-exchange resin powder which is supported on the fiber supporting body is provided. The chemical filter possesses a large ion-exchange capacity per unit volume and exhibits high initial performance of eliminating ionized gaseous pollutants and excellent durability of the elimination performance.

Chemical filter and method for manufacturing same

A dehumidifying system supplies a gas free of organic substances. The dehumidifying system includes a holding case, and a rotor rotatably held in the holding case and bearing an adsorbent. The interior of the holding case is divided into an adsorbing zone and a regenerating zone by partition plates attached to the holding case. A process gas is supplied into the adsorbing zone. The process gas processed in the adsorbing zone is supplied into an objective space. A regenerating gas is supplied into the regenerating zone to eliminate moisture and organic substances adsorbed by the adsorbent in the adsorbing zone from the adsorbent.

Dehumidification system and dehumidification method

Two rotorseach housing a honeycomb structurecarrying an absorbent is driven for rotation by a common motor. Partitioning membersdefine an absorbing zone S and a recovery zone U in the rotor depending on the angular positional relationship between the partitioning membersand the rotor corresponding thereto. In the absorbing zone S, the absorbent removes moisture and organic matters from air passing therethrough. In the recovery zone U, recovery of the absorbent deteriorated by absorbing the moisture and the organic matters is preformed by using heated dry air. Air sucked from a transfer spaceof the processing system sequentially passes through the absorbing zones of both the rotors via a circulation passage, thereafter returned to the transfer space. A part of clean dry air having passed through the absorbing zones of both the rotors is supplied into an exhaust passage, and is heated by a heater, and passes through the recovery zones of both the rotors.

Dry air-supplying apparatus and treating apparatus

When carrying workpieces from a loading area in which the workpieces are handled into a heat treatment furnace to make the workpieces subjected to a heat treatment process using a predetermined process gas, the loading area is evacuated and controlled at a predetermined low negative pressure. An exhaust for evacuating the loading area is connected to the loading area, and a controller controls the exhaust so that the loading area is maintained at the predetermined low negative pressure. A specific gas and particles contained in a gas discharged from the loading area are removed by filters.

Heat treatment method that includes a low negative pressure

Heat treatment method and heat treatment apparatus

A circulation duct with a blow fan and a shutter is provided to form gas flows in a transfer chamber below a heat treatment furnace, and a dust removing filter unit is provided in a blowout port of the circulation gas passage. Three, for example, gas supply pipes with a number of blowout holes are provided on the front side of the filter unit at set heights, and a clean air source is connected to the proximal end of the air supply pipes through an opening/closing valve. Clean gas is fed into the transfer chamber from the clean air source from the start of an unloading of the wafers to the time of the dismounting of the wafers from a wafer boat with the circulation of gas flows in the circulation gas passage stopped. A filter material of the dust removing filter is PTFE, which can reduce the amount of impurities scattered from the dust removing filter that attach on the wafers.

Vertical heat treatment apparatus with a circulation gas passage

An air cleaning apparatus includes an air passage chamber having a suction port, from which air is sucked, and a discharge port from which the air sucked from the suction port is discharged, an air blower, provided in the air passage chamber, for sucking the air from the suction port into the air passage chamber and discharging the sucked air from the discharge port, and a particle removing mechanism for removing particles contained in the air sucked from the suction port, the entire body of the particle removing mechanism being formed of a material which generates little impurity gas detrimental to processing in a processing space.

Air cleaning apparatus

An air cleaning apparatus according to the present invention includes an apparatus body having a suction port through which air in a processing space is sucked and a discharge port through which the air sucked through the suction port is discharged into the processing space. A blower is provided in the apparatus body for sucking the air from the processing space into the apparatus body through the suction port and discharging the sucked air into the processing space through the discharge port. In addition an impurity gas removing device in the apparatus body is provided for removing impurity gases contained in the air sucked through the suction port and harmful to processing in the processing space, and a particle removing device is provided on the exhaust side of the impurity gas removing device for removing particles in the sucked air cleared of the impurity gases by impurity gas removing device.

A heat-treating apparatus has a reaction vessel being adapted for performing a heat process for a workpiece to be treated and having a joint pipe portion and an outer pipe jointed to the joint pipe portion and of the reaction vessel. A sealing member is disposed between the outer pipe and the joint pipe portion. The sealing member has a relatively soft core member and a film harder than the core member. The film is disposed on the surface of the core member and has a heat resistance and a chemical resistance. Since the core member of the sealing portion has flexibility, it easily deforms corresponding to the shape of the sealing portion. The film provided on the core member prevents the sealing member from thermally adhering to the sealing portion and from thermally deteriorating.

Heat-treating apparatus

A stock unit for storing carriers has a stock unit body, a plurality of carrier mounting shelves provided in a side wall of the stock unit body at predetermined spaces in a vertical direction, a carrier station, provided in the lower portion of the stock unit body, receiving and sending a carrier between the stock unit and a carrier part provided in the outside of the stock unit body, a carrier transport device, provided in the lower portion of the stock unit body, for transporting the carrier from the inside of the stock unit body to wafer transfer device provided in the outside of the stock unit body, and a carrier arm mechanism gripping at least one carrier, receiving and sending the carrier between the carrier station and the carrier transport device, and between the carrier mounting shelves and the carrier transport device regardless of the operation of the carrier transport device.

Stock unit for storing carriers

A clean air apparatus includes a housing having an opening through which a carrier housing semiconductor wafers is supplied into the housing and an I/O port for supporting the carrier and a furnace for treating the wafer, provided in the upper portion of the housing. The carriers are at the same time supported by a first carrier stage provided in the upper portion of the housing and supported by a second carrier stage provided in the lower portion of the housing. The carrier or carriers are selectively moved between the I/O port and the first stage, between the I/O port and the second stage, and between the first stage and the second stage. A clean air is applied to the wafers in the carriers supported by the I/O port, the first stage and the second stage.

Clean air apparatus

A clean air apparatus comprises a body in which clean air is supplied, an I/O port having an opening for carrying a carrier housing objects to be treated in/out of the body, a door which opens/closes the opening, and dust preventing device for preventing dusts from entering the body from the outside through the opening, when the door is opened.

Growing community of inventors

Sagamihara, Japan

Takashi Tanahashi