Gigaphoton Inc.

Komatsu Corporation

Takashi Suganuma

Osamu Wakabayashi

Tamotsu Abe

Masato Moriya

Akira Sumitani

Hiroshi Someya

Akira Endo

Takayuki Yabu

Krzysztof Nowak

Hideo Hoshino

Yoshiaki Kurosawa

Hakaru Mizoguchi

Tatsuya Ariga

Taisuke Miura

Kouji Kakizaki

Toru Suzuki

Yoshifumi Ueno

Yasufumi Kawasuji

Takashi Saito

Seiji Nogiwa

Hidenobu Kameda

Akihiro Takayama

Takahiro Tatsumi

A beam delivery system according to an aspect of the present disclosure is used for an extreme ultraviolet light generation apparatus and includes a propagation mirror disposed on an optical path between a laser apparatus and a condensation optical system and configured to change the propagation direction of a pulse laser beam, and a curvature mirror disposed on an optical path between the propagation mirror and the condensation optical system and having a concave reflective surface configured to convert the pulse laser beam to be incident on the condensation optical system into a convergent beam. The curvature mirror has a focal length selected so that the beam spread angle of the pulse laser beam from the curvature mirror is constant irrespective of thermal deformation of the propagation mirror or constant with change in a predetermined allowable range irrespective of thermal deformation of the propagation mirror.

Beam delivery system, focal length selecting method, and electronic device manufacturing method

A laser device includes at least one amplification unit configured to amplify laser light emitted from a laser oscillator, and an amplification control unit configured to control the amplification unit. The amplification unit includes an incident-side optical adjustment unit including a wavefront adjustment unit configured to adjust a wavefront of the laser light and a first direction adjustment unit configured to adjust an optical axis thereof, an amplifier configured to amplify the laser light, an emission-side optical adjustment unit including a second direction adjustment unit configured to adjust an optical axis of the laser light, and a measurement unit configured to measure the laser light and acquire information on at least one of an optical axis, a wavefront and energy of the laser light. The amplification control unit controls the incident-side optical adjustment unit and/or the emission-side optical adjustment unit, based on a measurement result of the measurement unit.

Laser device, and extreme ultraviolet light generation system

A laser apparatus according to one aspect of the present disclosure includes a master oscillator configured to output laser light, a plurality of amplifiers each configured to include carbon dioxide as a laser medium and amplify the laser light, a first optical path pipe configured to cover a laser optical path between the amplifiers, a gas supply port configured to supply, into the first optical path pipe, gas having lower carbon dioxide concentration than that of the air, a first carbon dioxide densitometer configured to measure carbon dioxide concentration in the first optical path pipe, and an alarm device configured to issue an alarm when the carbon dioxide concentration measured by the first carbon dioxide densitometer exceeds a preset prescribed value.

Laser apparatus and extreme ultraviolet light generation system

A beam dump apparatus may include: an attenuator module; a beam dump module; and a control unit. The attenuator module includes: a first beam splitter provided inclined with respect to the optical axis of a laser beam at a first angle; a second beam splitter provided inclined with respect to the optical axis at a second angle; a first beam dumper provided such that the laser beam from the first beam splitter enters thereinto; a second beam dumper provided such that the laser beam from the second beam splitter enters thereinto; and a first stage that causes the beam splitters to advance into and retreat from the optical path. The beam dump module includes: a mirror; a third beam dumper provided such that the laser beam from the mirror enters thereinto; and a second stage that causes the mirror to advance into and retreat from the optical path.

Beam dump apparatus, laser apparatus equipped with the beam dump apparatus, and extreme ultraviolet light generating apparatus

A beam adjusting apparatus of an extreme ultraviolet light generating apparatus may include: a first pair of mirrors constituted by a first concave mirror and a first convex mirror, provided along the optical path of the pulsed laser beam; a second pair of mirrors constituted by a second concave mirror and a second convex mirror, which are arranged in an order reversed from the order of arrangement of the first concave mirror and the first convex mirror, provided along the optical path of the pulsed laser beam downstream from the first pair of mirrors; and a moving apparatus configured to simultaneously increase or simultaneously decrease the distance between the first concave mirror and the first convex mirror and the distance between the second concave mirror and the second convex mirror.

Extreme ultraviolet light generating apparatus

A beam delivery system may include: beam adjusters configured to adjust a divergence angle of a pulse laser beam; a beam sampler configured to separate a part of the pulse laser beam outputted from a first beam adjuster provided at the most downstream among the beam adjusters to acquire a sample beam; a beam monitor configured to receive the sample beam and output a monitored diameter; and a beam delivery controller configured to control the beam adjusters based on the monitored diameter. The beam delivery controller may adjust each of beam adjusters other than the first beam adjuster selected one after another from the most upstream so that the monitored diameter at the beam monitor becomes a predetermined value specific to the beam adjuster, and adjust the first beam adjuster so that the pulse laser beam becomes focused at a position downstream of a target position.

Beam delivery system and control method therefor

There is provided a laser unit that may include: a master oscillator configured to output a linear-polarized laser light beam; a first polarization device disposed in a light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a polarization direction of the linearly-polarized incident laser light beam; a second polarization device disposed in the light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a direction of the polarization axis of the first polarization device; and a laser amplifier disposed between the first polarization device and the second polarization device in the light path of the linear-polarized laser light beam and including a pair of discharge electrodes disposed to oppose each other, an opposing direction of the pair of discharge electrodes being substantially aligned with the direction of the polarization axis of the first polarization device.

Laser unit and extreme ultraviolet light generating system

There may be provided a laser amplifier including: a chamber containing a laser medium; a first window provided on the chamber, and configured to allow a laser light beam inputted from outside of the chamber to enter the chamber; an excitation unit configured to amplify, by exciting the laser medium, the laser light beam that has entered the chamber; a second window provided on the chamber, and configured to allow the laser light beam that has been amplified by the excitation unit to exit from the chamber to the outside; a mirror provided on a laser light path between the first window and the second window; and a wavelength selection film provided on one or more of the first window, the second window, and the mirror, and configured to suppress propagation of light beams of one or more suppression target wavelengths different from a desired wavelength.

Laser amplifier, laser apparatus, and extreme ultraviolet light generating system

There is provided a slab amplifier including an optical system () provided in a chamber () to allow a seed beam having entered from a first window into the space between a pair of electrodes () to be repeatedly reflected between the space so that the seed beam is amplified to be an amplified beam; a first aperture plate () provided between the first window and the electrodes, and having an opening of a dimension equal to or greater than a cross-section of the seed beam and equal to or smaller than a dimension of the first window; and a second aperture plate () provided between the second window and the electrodes, and having an opening of a dimension equal to or greater than a cross-section of the amplified beam and equal to or smaller than a dimension of the second window.

Slab amplifier, and laser apparatus and extreme ultraviolet light generation apparatus including slab amplifier

There may be included: a master oscillator configured to output pulsed laser light; two or more power amplifiers disposed in an optical path of the pulsed laser light to amplify the pulsed laser light; and an optical isolator provided between adjacent two of the power amplifiers in the optical path of the pulsed laser light, and configured to suppress transmission of light traveling from the power amplifiers to a side where the master oscillator is provided.

There is provided a laser unit that may include a master oscillator, a laser amplifier, and an adjuster. The master oscillator may be configured to output a laser light beam. The laser amplifier may be disposed in a light path of the laser light beam outputted from the master oscillator. The adjuster may be disposed in the light path of the laser light beam, and may be configured to adjust a beam cross-sectional shape of the laser light beam amplified by the laser amplifier to be a substantially circular shape. The beam cross-sectional shape may be at a beam waist of the laser light beam or in the vicinity of the beam waist of the laser light beam, and may be in a plane orthogonal to a light path axis.

An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit.

Optical device, laser apparatus, and extreme ultraviolet light generation system

A laser apparatus may include a master oscillator, an optical unit provided in a beam path of a laser beam from the master oscillator, a beam adjusting unit provided upstream from the optical unit in a beam path of the laser beam and configured for adjusting at least one of a beam path and a wavefront of the laser beam, a first detection unit provided between the beam adjusting unit and the optical unit in a beam path of the laser beam and configured for detecting the laser beam, a second detection unit provided downstream from the optical unit in a beam path of the laser beam and configured for detecting the laser beam, and a controller configured for controlling the beam adjusting unit based on outputs from the first and second detection units.

A regenerative amplifier according to one aspect of this disclosure is used in combination with a laser device, and the regenerative amplifier may include: a pair of resonator mirrors constituting an optical resonator; a slab amplifier provided between the pair of the resonator mirrors for amplifying a laser beam with a predetermined wavelength outputted from the laser device; and an optical system disposed to configure a multipass optical path along which the laser beam is reciprocated inside the slab amplifier, the optical system transferring an optical image of the laser beam at a first position as an optical image of the laser beam at a second position.

Regenerative amplifier, laser apparatus, and extreme ultraviolet light generation system

An EUV light generation system includes a driver laser comprising a master oscillator such as a semiconductor laser, a spatial filter, gas slab amplification devices, relay optical systems, and high-speed axial-flow amplifiers. The slab amplification devices include beam adjusting optical units disposed, respectively, at input and output sides of the slab amplifiers SA to convert the beam profile and/or polarization direction and/or an elongated direction of the beam profile with the slab amplifiers is parallel to a free space axis AF of the slab waveguides, i.e. parallel to the discharge electrodes.

Growing community of inventors

Oyama, Japan

Takashi Suganuma