Screen Holdings Co., Ltd.

Kyoto University

Ono Pharmaceutical Co., Ltd.

Other

Tasuku Honjo

Takashi Shinohara

Junichi Ishii

Kazuki Nakamura

Nobuaki Okita

Yoshifumi Okada

Tomoyuki Shinohara

Takuma Takahashi

Mito Shinohara

Yasumasa Ishida

Hiroshi Kato

Jun Shibukawa

Nobuyasu Hiraoka

Wataru Yano

Katsunori Tanaka

Ryohei Hokaku

An upper holding device holds a substrate in a horizontal attitude without rotating the substrate. A lower holding device rotates a substrate while holding the substrate by suction. A substrate held by the upper holding device is cleaned with use of a cleaning liquid, and a substrate held by the lower holding device is cleaned with use of a cleaning liquid. Gas in a processing space is exhausted by exhaust equipment of a factory through an exhaust system. When a substrate is held by the upper holding device, gas in the processing space is not exhausted or gas in the processing space is exhausted at a first flow rate. Gas in the processing space is exhausted at a second or third flow rate that is higher than the first flow rate when the substrate is held by the lower holding device.

Substrate cleaning device, substrate cleaning system, substrate processing system, substrate cleaning method and substrate processing method

A substrate cleaning device includes a substrate holder, a lower-surface brush, a first liquid nozzle and a second liquid nozzle. The substrate holder holds a substrate in a horizontal attitude. The lower-surface brush is configured to be movable between a processing position for cleaning of the substrate and a waiting position that overlaps with the substrate held by the substrate holder in an up-and-down direction. Further, the lower-surface brush is configured to be rotatable about an axis extending in the up-and-down direction. The lower-surface brush cleans a lower surface of the substrate by coming into contact with the lower surface of the substrate. The first liquid nozzle discharges a cleaning liquid to a center portion of the lower-surface brush, at a waiting position. The second liquid nozzle discharges a cleaning liquid to an end portion of the lower-surface brush, at the waiting position.

Substrate cleaning device

A cleaner comes into contact with a lower-surface center region of a substrate held by a first holder, so that the lower-surface center region is cleaned. The cleaner comes into contact with a lower-surface outer region of the substrate rotated by a second holder, so that the lower-surface outer region of the substrate is cleaned. During cleaning of the lower-surface center region, the second holder is rotated about a vertical axis while not holding the substrate. Alternatively, during cleaning of the lower-surface center region, the gas injector arranged between the cleaner and the second holder injects gas toward the substrate from a first height spaced apart from the substrate by a predetermined distance. Further, during drying of the lower-surface center region, the gas injector injects gas toward the substrate from a second height closer to the substrate than the first height.

Substrate cleaning device and substrate cleaning method

A lower-surface center region of a substrate held by a first holder is cleaned by a cleaner. A lower-surface outer region of the substrate rotated by a second holder is cleaned by the cleaner. A mobile base provided with the second holder and the cleaner is moved in a horizontal plane such that a reference position of the first holder coincides with a center axis of the second holder in a plan view when the substrate is received and transferred between the first holder and the second holder, and is moved in the horizontal plane such that the cleaner overlaps with the lower-surface center region of the substrate held by the first holder and a center axis of the cleaner coincides with a first portion different from a center of the substrate in the plan view when the lower-surface center region is cleaned.

A lower-surface brush includes a base portion, a first cleaning portion and a second cleaning portion. The first cleaning portion is provided on an upper surface of the base portion to project upwardly from the upper surface of the base portion and extend in one direction through a geometric center of the base portion in a plan view. The second cleaning portion is provided on the upper surface of the base portion to project upwardly from the upper surface of the base portion and extend along an outer edge of the base portion. Alternatively, one or a plurality of pairs of second cleaning portions may be provided on the upper surface of the base portion to project upwardly from the upper surface of the base portion and be opposite to each other with the first cleaning portion interposed therebetween.

Lower-surface brush, brush base and substrate cleaning device

A substrate cleaning brush for cleaning a wafer includes a brush main body, a brush holding unit, and a main flow path forming body. The brush main body has a liquid permeable structure and includes a lower surface that comes into contact with a substrate. The brush holding unit holds the brush main body while exposing a distal end portion in a vertical direction of the brush main body to the outside. The main flow path forming body includes a main flow path and a plurality of sub flow paths. The main flow path is formed to allow a processing liquid supplied from the outside to pass therethrough. The plurality of sub flow paths branch off from the main flow path, extend outward in a width direction perpendicular to the vertical direction of the brush main body, and are connected to an upper surface of the brush main body.

Substrate cleaning brush and substrate cleaning apparatus

While a substrate is being rotated, the lower surface of a brush is moved along the upper surface of the substrate. The brush and a spray nozzle are moved upward from a takeoff position to a lower non-contact position so as to separate the lower surface of the brush from the upper surface of the substrate. The spray nozzle generates the droplets in a state where the brush and the spray nozzle are located in the lower non-contact position so as to make the droplets collide with the upper surface of the substrate, and then the droplets colliding with the upper surface of the substrate are discharged from a gap between the lower surface of the brush and the upper surface of the substrate while the droplets are being supplied to the lower surface of the brush.

Substrate processing method and substrate processing apparatus

Provided is a technique which can properly invert a plurality of substrates at a time. To achieve this object, a substrate inverting apparatus includes: a support mechanism which supports a plurality of substrates in a state where the substrates are stacked vertically in a spaced-apart manner in a horizontal posture; and a clamping and inverting mechanism which clamps the plurality of substrates supported by the support mechanism respectively and inverts the plurality of substrates at a time. In the support mechanism, support members which support the substrate are moved to a standby position from a support position while being moved downward away from the center of the substrate as viewed in the vertical direction. On the other hand, in the clamping and inverting mechanism, clamping members which clamp the substrate are moved to a near position from a remote position by a clamping member drive part and are elastically biased by an elastic member toward side surfaces of the substrate at the near position.

Substrate inverting apparatus and substrate processing apparatus

The present invention provides a method of producing a non-human vertebrate that harbours germ cells having a desired gene transferred thereto, comprising injecting the desired gene to the testis of a non-human vertebrate wherein no tight junction exists between Sertoli cells to transfer the desired gene to germ cells, so as to obtain a non-human vertebrate that harbours the germ cells having the desired gene transferred thereto. Using the method of the present invention, even in animal species and lines for which in vitro transduction has been difficult to date, it is possible to obtain an individual harbouring germ cells, particularly spermatogonial stem cells, having a desired gene transferred thereto, at extremely high efficiency. Also, the fertility of the male to receive an injection of the gene is retained, compared to in vitro transduction of germ cells, because gene transfer is achieved without reducing the number of spermatogonial stem cells in the testis and transgenic sperms and transgenic animals can easily be prepared.

Method of gene introduction in in-vivo spermatogenic cell

The present invention provides a method of growing spermatogonial stem cells of mammals and the like in vitro, which is characterized in that glial cell-derived neurotrophic factor (GDNF) or an equivalent thereto, and leukemia inhibitory factor (LIF) are contained in a medium (culture broth) for culturing spermatogonial stem cells. According to the method of the present invention, spermatogonial stem cells can be grown in vitro to the extent that enables use thereof for developmental engineering.

Method of growing sperm stem cells in vitro, sperm stem cells grown by the method, and medium additive kit to be used in growing sperm stem cells in vitro

A membrane protein related to human programmed cell death (PD-1) and DNA encoding the said protein is provided. PD-1 protein may be useful for the treatment of various infections, immunological depression or acceleration, or tumors etc.

Growing community of inventors

Kyoto, Japan

Takashi Shinohara