Canon Kabushiki Kaisha

Takashi Shibayama

Takamitsu Komaki

Hiroyuki Sekiguchi

Ryo Nawata

Takao Ukaji

Takehiko Mayama

Yuma Onizawa

A control apparatus which controls a force applied to an object, includes a driver configured to apply the force to the object, an estimator configured to estimate, based on information related to a state of the object, an estimated value of a disturbance force to be applied to the object, a corrector configured to correct, based on the estimated value, a command value provided to the driver so as to reduce an influence of the disturbance force, and a determiner configured to execute processing for determining a plurality of parameter values to be used by the estimator to obtain the estimated value based on the information.

Control apparatus, imprint apparatus, and method of manufacturing article

In an alignment apparatus, a measurement device includes an illuminator that illuminates a first original-side mark and a second original-side mark arranged in an original and a first substrate-side mark and second substrate-side mark arranged in a substrate. The measurement device performs coarse measurement based on light beams from the first original-side mark and the first substrate-side mark by causing the illuminator to illuminate the first original-side mark and the first substrate-side mark under a first condition, and performs fine measurement based on light beams from the second original-side mark and the second substrate-side mark by causing the illuminator to illuminate the second original-side mark and the second substrate-side mark under a second condition.

Alignment apparatus, alignment method, lithography apparatus, and method of manufacturing article

The present invention provides a detection apparatus for detecting a plurality of marks provided on a substrate, comprising: an optical system; an illumination unit configured to selectively illuminate the plurality of marks with a plurality of light beams via the optical system such that each of the plurality of marks is illuminated with at least one light beam; and an image capturing device configured to capture an image of the plurality of marks via the optical system, wherein the illumination unit includes a change unit configured to individually change an incident angle of each of the plurality of light beams on a pupil plane of the optical system, thereby changing an irradiated position of each of the plurality of light beams on the substrate.

Detection apparatus, lithography apparatus, and method of manufacturing article

An exposure apparatus, which forms a latent image pattern on a substrate using an exposure beam, includes a first structure which supports a projection unit which projects an exposure beam onto a substrate, a first supporting leg which includes a first actuator and supports the first structure, a first state detector which detects a state of the first structure, a second structure which supports a substrate stage which aligns the substrate, a second supporting leg which includes a second actuator and supports the second structure, a second state detector which detects a state of the second structure, and a control unit which controls, on the basis of a signal from the first state detector and a signal from the second state detector, the first actuator and the second actuator so as to synchronize the first structure and the second structure with each other.

Exposure apparatus

A vibration isolation device which dampens vibration of an object. The device includes a vibration isolation unit that can be activated in a plurality of vibration isolation modes, an acquisition unit that acquires estimate information associated with vibration of a floor, in which the acquisition unit receives data associated with an influence degree of seismic vibration and an influence time zone of the seismic vibration from an external device, and a control unit that selects a vibration isolation mode from the plurality of vibration isolation modes, in accordance with the estimate information acquired by the acquisition unit, and activates the vibration isolation unit in the selected vibration isolation mode. The control unit switches between the vibration isolation modes of the vibration isolation unit in accordance with the influence degree and the influence time zone.

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Utsunomiya, Japan

Takashi Shibayama