Tokyo Electron Limited

Takashi Sasa

Toshinobu Furusho

Kousuke Yoshihara

Yuichi Terashita

Koji Takayanagi

Daisuke Ishimaru

Hirofumi Takeguchi

Katsunori Ichino

Katsuhiro Tsuchiya

Daiki Shibata

Katsuya Hashimoto

Yuichi Yoshida

Hideo Shite

Takahiro Okubo

Shinya Wakamizu

Takahiro Ookubo

Tsuyoshi Nogami

Tomohiko Muta

Kazuhiko Kimura

Takeshi Ohto

Yukie Minekawa

Tomoyuki Yumoto

Disclosed is a processing liquid supplying apparatus. The apparatus includes: a processing liquid supply source configured to supply a processing liquid for processing a substrate to be processed; an ejection unit configured to eject the processing liquid to the substrate to be processed; a filter device configured to remove foreign matters in the processing liquid; a supply pump and an ejection pump which are provided in the supply path at a primary side and a secondary side of the filter device, respectively; and a control unit configured to output a control signal to decompress and degas the processing liquid supplied from the processing liquid supply source by using one of the supply pump and the ejection pump, and subsequently, pass the degassed processing liquid through the filter device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump.

Processing liquid supplying apparatus and processing liquid supplying method

A filtration efficiency, which is similar to the filtration efficiency obtained when a plurality of filters are provided, can be obtained by one filter, and decrease in throughput can be prevented. Based on a control signal from a control unit, a resist liquid L is sucked into a pumpthrough a filter. A part of the resist liquid sucked in the pump is discharged from a discharge nozzle. The remaining resist liquid is returned to a supply conduiton a primary side of the filter. A process is synthesized by adding a replenishment amount equal to the discharge amount to the return amount. The discharge of the synthesized process liquid and the filtration thereof by the filter are performed the number of times corresponding to a rate between the discharge amount and the return amount.

Liquid processing apparatus, liquid processing method, and storage medium for liquid process

A stay of a liquid can be suppressed. A pumpincludes a tube, having elasticity, in which a liquid as a target to be delivered flows; a tube housingwhich covers an outside of the tubeand keeps a gas in an inner space V between an outer surface of the tubeand the tube housing; and an electropneumatic regulator RE configured to supply the gas into the inner space V and discharge the gas from the inner space V.

Pump, pump device, and liquid supply system

A treatment solution supply apparatus for supplying a treatment solution to a treatment solution discharge unit that discharges the treatment solution to a treatment body, includes: a temporary storage apparatus that temporarily stores the treatment solution supplied from a treatment solution supply source that stores the treatment solution; a filter that removes a foreign substance in the treatment solution from the temporary storage apparatus; and a pump that sends the treatment solution from which the foreign substance has been removed by the filter to the treatment solution discharge unit, wherein the temporary storage apparatus has a pressure-feeding function of pressure-feeding the treatment solution stored in the temporary storage apparatus.

Treatment solution supply apparatus

A liquid can be delivered with a simple configuration. A liquid delivery method includes allowing a liquid to flow in a tube having elasticity depending on a pressure of a gas filled in an inner space between a tube housing covering an outside of the tube and an outer surface of the tube; obtaining a magnitude of a pressure of the liquid flowing in the tube as a first value; obtaining a magnitude of the pressure of the gas filled in the inner space as a second value; calculating a difference between the first value and the second value as a third value; and detecting a status of the tube on the basis of the third value.

Liquid delivery method, liquid delivery system, and computer-readable storage medium

A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the pump is returned to a processing liquid source side of a mixing section; and a replenishing step in which the processing liquid returned to the processing liquid source side is suctioned into the pump together with the processing liquid replenished from the processing liquid source. The processing liquid passes through the filter device in at least one of the returning step and the replenishing step. The amount of the processing liquid returned to the processing liquid source side in the returning step is larger than the amount of the processing liquid ejected from the ejecting part in the ejecting step.

Processing liquid supplying apparatus and method of supplying processing liquid

In one embodiment, a feed pump of a tube pump type is used for supplying a processing liquid. The tube pump has a squeezing member that moves from a first axial position of a tube at which the squeezing member starts pinching of the tube, to a second axial position at which the squeezing member leaves the tube after feeding the processing liquid toward an ejecting part such as a nozzle. Only one pinched part pinched between the squeezing member and a guide member is formed between the first axial position and the second axial position of the tube, and the only one pinched part moves along the axial direction of the tube, during feeding of a dose of the processing liquid toward the ejecting part.

Processing liquid supplying apparatus, processing liquid supplying method and storage medium

A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.

Solution treatment apparatus and solution treatment method

A processing liquid supplying apparatus supplies a processing liquid to a process object via a discharging part. In one embodiment, the apparatus includes: a processing liquid source that supplies a processing liquid; an intermediate tank connected to the processing liquid source via a transport line; a feed line provided between the intermediate tank and the discharging part; an evacuating unit that evacuates an interior of the intermediate tank to transport the processing liquid from the processing liquid source to the intermediate tank through the transport line; and a pressure adjusting unit that supplies a gas into the intermediate tank to return a pressure in the evacuated intermediate tank from a reduced pressure to a normal pressure, thereby to place the intermediate tank ready for feeding the processing liquid, having been transported into the intermediate tank, into the feed line.

A processing-liquid supply apparatus includes a source, a discharge device, a supply channel connecting the source and discharge device, a filter device positioned in the channel to form first side having the source and second side having the discharge device, a pump device positioned in the channel, and a control device which controls suction and discharge by the pump device. The control device controls the pump device such that the liquid is discharged from the discharge device, that remaining of the liquid on the second side is suctioned to be returned to the first side and that the remaining of the liquid returned to the first side flows from the first toward second side together with refill of the liquid from the source, and the control device is set such that return amount of the liquid to the filter device is equal to or greater than amount of the discharge.

Processing-liquid supply apparatus and processing-liquid supply method

The pressure sensor detects a pressure in the operation chamber when the first opening/closing valve is opened at a time of starting a replenishment of the chemical liquid into the chemical liquid pump. The flow rate sensor detects an exhaust flow rate exhausted from the operation chamber.

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Koshi, Japan

Takashi Sasa