Gigaphoton Inc.

Fujitsu Corporation

Ushio Denki Kabushiki Kaisha

Takashi Saito

Osamu Wakabayashi

Takayuki Yabu

Atsushi Ueda

Yoshifumi Ueno

Shinji Nagai

Tsukasa Hori

Fumio Iwamoto

Georg Soumagne

Koji Kakizaki

Hakaru Mizoguchi

Tamotsu Abe

Takashi Suganuma

Takanobu Ishihara

Yutaka Shiraishi

Yasufumi Kawasuji

Hirokazu Hosoda

Krzysztof Nowak

Naoki Kataoka

Shuichiro Yamada

Naoyoshi Imachi

Hidenori Watanabe

Takehiko Shimizu

Tsuyoshi Kato

An EUV light generation apparatus includes: a chamber; an EUV light condensing mirror positioned inside the chamber and having a reflective surface that determines a first focal point and a second focal point, the reflective surface and the second focal point being positioned on respective sides of a first surface; at least one magnet configured to generate a magnetic field at and around the first focal point; a first gas supply unit configured to supply first gas to the reflective surface in the chamber and opened near an outer peripheral part of the reflective surface; a second gas supply unit configured to supply second gas into the chamber and opened at a position between the first surface and the second focal point; and a discharge device configured to discharge gas inside the chamber and opened at a position between the first focal point and the at least one magnet.

Extreme ultraviolet light generation apparatus and extreme ultraviolet light generation apparatus controlling method

An extreme ultraviolet light generation device configured to generate extreme ultraviolet light by irradiating a target containing tin with a pulse laser beam includes a chamber container, a hydrogen gas supply unit configured to supply hydrogen gas into the chamber container, a heat shield disposed between the chamber container and a predetermined region in which the target is irradiated with the pulse laser beam inside the chamber container, a first cooling medium flow path disposed in the chamber container, a second cooling medium flow path disposed in the heat shield, and a cooling device configured to supply a first cooling medium to the first cooling medium flow path and supply a second cooling medium to the second cooling medium flow path so that a temperature of the heat shield becomes lower than a temperature of the chamber container.

Extreme ultraviolet light generation device and electronic device manufacturing method

The extreme ultraviolet light generation device includes a chamber having a first through-hole that allows a pulse laser beam to enter the chamber, a target supply unit held by the chamber and configured to output a target toward a predetermined region in the chamber, a shield member surrounding the predetermined region in the chamber and having a target path that allows the target outputted from the target supply unit to pass toward the predetermined region, and a tubular member surrounding at least a part of an upstream portion of the trajectory of the target outputted from the target supply unit toward the predetermined region, the upstream portion being upstream from the target path of the shield member.

Extreme ultraviolet light generation device

An extreme ultraviolet light generating device may include a chamber, an EUV light focusing mirror provided therein, including a reflection surface having a concave curved shape and an outer peripheral portion around an outer edge of the reflection surface, and configured to focus EUV light radiated from plasma generated when a target is irradiated with laser light, a gas supplying device including peripheral heads provided on or along the outer peripheral portion; and a discharge device including a discharge path forming a discharge port near the outer peripheral portion, and configured to discharge an ion or a particle from the discharge port. The peripheral heads each may blow out a gas flow from the outer peripheral portion or a vicinity thereof along the reflection surface, and allow gas flows to join on the reflection surface to thereby form a gas flow along the reflection surface toward the discharge port.

Extreme ultraviolet light generating device

A chamber device may include a chamber, and a target generation device assembled into the chamber and configured to supply a target material into the chamber, the target generation device including a tank configured to store the target material, a temperature variable device configured to vary temperature of the target material in the tank, and a nozzle section in which a nozzle hole configured to output the target material in a liquid form is formed, and the chamber device may further include a gas nozzle having an inlet port facing the nozzle section and configured to introduce gas into the chamber, a gas supply source configured to supply gas containing hydrogen to the gas nozzle to supply the gas containing the hydrogen to at least periphery of the nozzle section, and a moisture remover configured to remove moisture at least in the periphery of the nozzle section in the chamber.

Chamber device, target generation method, and extreme ultraviolet light generation system

An extreme ultraviolet light generation apparatus includes a target supplier configured to output a target into a chamber as a droplet, the target generating extreme ultraviolet light when being irradiated with a laser beam in the chamber; a droplet measurement unit configured to measure a parameter for a state of the droplet outputted into the chamber; a pressure regulator configured to regulate a pressure in the target supplier in which the target is accommodated; and a target generation controller configured to control the pressure regulator, based on the parameter measured by the droplet measurement unit.

Extreme UV light generation apparatus and method

An extreme ultraviolet light generation apparatus may be configured to generate extreme ultraviolet light by irradiating a target with a pulse laser beam outputted from a laser apparatus to generate plasma. The extreme ultraviolet light generation apparatus may include a chamber; a target supply device configured to supply a target to a plasma generation region inside the chamber; a target sensor located between the target supply device and the plasma generation region and configured to detect the target passing through a detection region; and a shield cover disposed between the detection region and the target supply device, having a through-hole that allows the target to pass through, and configured to reduce pressure waves that reach the target supply device from the plasma generation region.

Extreme ultraviolet light generation apparatus

An aspect of the present disclosure may include a gas lock cover secured to a nozzle holder and provided downstream of a nozzle. The gas lock cover may cover a periphery of an exit of the nozzle and be structured to guide gas supplied from a gas supply unit. The gas lock cover may include a hollow cylindrical part provided downstream of the nozzle and having an exit opening for outputting droplets that are outputted from the nozzle and pass through an internal cavity of the cylindrical part. The gas lock cover may include a channel for transmitting the gas supplied from the gas supply unit, the channel being structured to orient a flow of the transmitted gas so as to flow to the exit opening of the cylindrical part through the internal cavity of the cylindrical part.

Target producing apparatus

There is provided a slab amplifier including an optical system () provided in a chamber () to allow a seed beam having entered from a first window into the space between a pair of electrodes () to be repeatedly reflected between the space so that the seed beam is amplified to be an amplified beam; a first aperture plate () provided between the first window and the electrodes, and having an opening of a dimension equal to or greater than a cross-section of the seed beam and equal to or smaller than a dimension of the first window; and a second aperture plate () provided between the second window and the electrodes, and having an opening of a dimension equal to or greater than a cross-section of the amplified beam and equal to or smaller than a dimension of the second window.

Slab amplifier, and laser apparatus and extreme ultraviolet light generation apparatus including slab amplifier

An extreme ultraviolet light generation apparatus may include: a chamber; a target supply unit configured to output a target toward a predetermined region inside the chamber; a first gas supply unit configured to blow out gas in a first direction toward a trajectory of the target between the target supply unit and the predetermined region; and a focusing optical system configured to concentrate a pulse laser beam to the predetermined region.

Extreme ultraviolet light generation apparatus with a gas supply toward a trajectory of a target

A chamber for an extreme ultraviolet light generation apparatus is a chamber into which droplets are sequentially outputted, and may include an image capturing unit configured to repeatedly capture images of the droplets during an image capturing time set so that images of two adjacent droplets that have been outputted do not overlap.

Chamber for extreme ultraviolet light generation apparatus, and extreme ultraviolet light generation apparatus

There is provided an extreme ultraviolet light generating system. The extreme ultraviolet light generating system may include: a laser apparatus configured to provide pulsed laser light inside a chamber in which EUV light is generated; an optical shutter disposed on an optical path of the pulsed laser light; and a controller configured to open or close the optical shutter, based on a generation signal supplied from an external unit, the generation signal instructing generation of the EUV light.

Extreme ultraviolet light generating system

The oscillation pulse width is extended in a gas laser apparatus emitting ultraviolet radiation by a high-repetition rate oscillating operation. The gas laser apparatus has a pair of laser discharge electrodes connected to the output terminals of a magnetic pulse compression circuit and disposed in a laser chamber. The pulse width is extended by determining circuit constants so that the period of the oscillating current flowing between the discharge electrodes is shortened and, at the same time, the peak value of the current is increased, whereby the laser gas is continuously excited even during at least one half-cycle subsequent to the first half-cycle of the oscillating current to sustain the laser oscillating operation.

Gas laser apparatus emitting ultraviolet radiation

A pulse oscillating gas laser device, which can reduce an influence of a shock wave caused by primary discharge and perform stable laser oscillation is provided. To this end, the device is a pulse oscillating gas laser device for exciting a laser gas by causing primary discharge in a pulse form between a pair of discharge electrodes ( ) opposing each other and oscillating laser light, in which a rib portion ( ) with insulating properties for preventing creeping discharge is provided on a cathode base ( ) with insulating properties, to which the discharge electrode ( ) at a high voltage side is fixed, and a damping material ( ) for attenuating a shock wave ( ) caused by the primary discharge is inserted in an inside of a groove portion ( ) between a raised portion ( ) of the rib portion ( ) and the high-voltage side discharge electrode ( ).

Pulse oscillating gas laser device

A data library, a CPU and a memory store a design aid program which designs power supply circuit diagrams based on the data library in accordance with given conditions for a power supply circuit. Therefore, design errors associated with an increased design scale are prevented and the design time is shortened. The given conditions are taken as the respective vertical and horizontal intervals between power portions having first pins for connecting to a power supply and second pins for connecting to earth, and the number of rows and the number of steps of the power portions. Then, multiple available power portions are arranged according to the given conditions by a design aid program and the multiple arranged power portions are wired to a power supply symbol and an earth symbol, respectively.

Growing community of inventors

Oyama, Japan

Takashi Saito