Sumitomo Chemical Company, Limited

Sekisui Chemical Co., Ltd.

Panasonic Corporation

Panasonic Intellectual Property Management Co., Ltd.

Panasonic Automotive Systems Co., Ltd.

Takashi Nishimura

Koji Ichikawa

Masako Sugihara

Masahiko Shimada

Junji Nakanishi

Tatsushi Hayashi

Susumu Baba

Takashi Watanabe

Akihiko Inoue

Hiromu Sakamoto

Hiroyuki Morishita

Akira Kamabuchi

Mitsuyoshi Ochiai

Mitsuru Tanikawa

Kazuhiro Nomura

Hyungjoo Kim

Shota Nakano

Yuko Mukai

An inference execution method includes: selecting an inference neural network from among a plurality of inference neural network candidates generated from one training neural network that has been trained; sequentially obtaining data; sequentially executing, on the data sequentially obtained, inference using the inference neural network; sequentially outputting results of the inference sequentially executed; and selecting a new inference neural network from among the plurality of inference neural network candidates and switching the inference neural network to be used in the execution of the inference to the new inference neural network during an inference execution period in which the data is sequentially obtained, the inference is sequentially executed, and the results of the inference are sequentially output.

Inference execution method for candidate neural networks and switching neural networks

Provided is an interlayer insulating material that can enhance the adhesion between an insulating layer and a metal layer, and can reduce the surface roughness on a surface of the insulating layer. The present invention is an interlayer insulating material used for a multilayer printed wiring board, which contains an epoxy compound, a curing agent, a silica, and a polyimide, and in which the polymide is a reactant of a tetracarboxylic anhydride and a dimer acid diamine, a content of the silica is 30% by weight or more and 90% by weight or less in 100% by weight of components excluding a solvent in the interlayer insulating material, and the total content of the epoxy compound and the curing agent in 100% by weight of components excluding the silica and a solvent in the interlayer insulating material is 65% by weight or more.

Interlayer insulating material and multilayer printed wiring board

A photoresist composition comprising: a resin which has a structural unit represented by formula (I): wherein Rrepresents a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group which optionally has a halogen atom, and Rrepresents a C1 to C42 hydrocarbon group which optionally has a substituent; an alkali-soluble resin; an acid generator; and a solvent.

Photoresist composition

The present invention provides a resist composition which has sufficient resistant to a plating treatment and is capable of forming a resist pattern with high accuracy. The present invention also provides a method for producing a resist pattern using the resist composition, and a method for producing a plated molded article using the resist pattern. The present invention relates to a resist composition comprising a compound (I) having a quinone diazide sulfonyl group, a resin comprising a structural unit having an acid-labile group (A1), an alkali-soluble resin (A2) and an acid generator (B); a method for producing a resist pattern using the resist composition; and a method for producing a plated molded article using the resist pattern.

Resist composition and method for producing resist pattern, and method for producing plated molded article

Provided is a cured body that can enhance the adhesion between an insulating layer and a metal layer, and can reduce the surface roughness on a surface of the insulating layer. The cured body according to the present invention is a cured body of a resin composition that includes an epoxy compound, a curing agent, an inorganic filler, and a polyimide, in which the content of the inorganic filler is 30% by weight or more and 90% by weight or less in 100% by weight of the cured body, the cured body has a sea-island structure having a sea part and an island part, the island part has an average long diameter of 5 &#x3bc;m or less, and the island part contains the polyimide.

Cured body and multilayered substrate

A salt represented by formula (I): wherein Qand Qindependently represent a fluorine atom or a Cto Cperfluoroalkyl group, Rand Rin each occurrence independently represent a hydrogen atom, a fluorine atom or a Cto Cperfluoroalkyl group, z represents an integer of 0 to 6, Xrepresents *&#x2014;CO&#x2014;O&#x2014;, *&#x2014;O&#x2014;CO&#x2014; or &#x2014;O&#x2014;, * represents a binding position to C(R)(R) or C(Q)(Q), Arepresents a Cto Chydrocarbon group having a Cto Cdivalent alicyclic hydrocarbon moiety, Arepresents a Cto Cdivalent hydrocarbon group, Rand Rindependently represent a hydrogen atom or a Cto Cmonovalent saturated hydrocarbon group, Rrepresents a hydrogen atom, a fluorine atom, or a Cto Calkyl group where a hydrogen atom may be replaced by a fluorine atom, and Zrepresents an organic cation.

Salt, acid generator, resin, resist composition and method for producing resist pattern

A resist composition contains: a resin having a structural unit represented by formula (I), an alkali-soluble resin, an acid generator, and a solvent: wherein Rrepresents a hydrogen atom or a methyl group, Rand Reach independently represent a hydrogen atom or a Cto Chydrocarbon group, Rrepresents a Cto Calicyclic hydrocarbon group, Rrepresents a Cto Calkyl group or a Cto Calkoxy group, and 'p' represents an integer of 0 to 4.

Resist composition and method for producing resist pattern

A resist composition contains: a resin having an acid-labile group, a resin having a structural unit represented by formula (I), an acid generator, and a solvent; wherein Rrepresents a hydrogen atom or a methyl group, Rrepresents a Cto Chydrocarbon group that may be substituted with a hydroxy group, a Cto Cacyl group or a hydrogen atom, Rin each occurrence independently represents a Cto Calkyl group or a Cto Calkoxy group, 'p' represents an integer of 0 to 4, Z represents a divalent Cto Chydrocarbon group having a group represented by formula (Ia), and a methylene group contained in the hydrocarbon group may be replaced by an oxygen atom, a sulfur atom or a carbonyl group, *&#x2014;[(CH)&#x2014;O]&#x2014; (Ia): wherein 'w' and &#x201c;r&#x201d; each independently represents an integer of 1 to 10, and * represent a bonding position.

Resin, resist composition and method for producing resist pattern

A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic carbonate and a structural unit represented by formula (I), the resin has no acid-labile group; (A2) a resin which has an acid-labile group; and an acid generator: wherein Rrepresents a hydrogen atom or a methyl group, Rrepresents a Cto Csaturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group, Rrepresents a hydrogen atom or a methyl group, and Lrepresents a single bond or a Cto Cdivalent saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and Rrepresents a Cto Calicyclic hydrocarbon group where a hydrogen atom may be replaced by a Cto Caliphatic hydrocarbon group or a hydroxy group, provided that the carbon atom directly bonded to Lhas no aliphatic hydrocarbon group by which a hydrogen atom has been replaced.

A salt represented by the formula (I); wherein Qand Qeach independently represent a fluorine atom or a Cto Cperfluoroalkyl group, Lrepresents a single bond or a divalent Cto Csaturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom may be replaced by a hydroxyl group or a fluorine atom, and Y represents a hydrogen atom, a fluorine atom, or an optionally substituted Cto Calicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group; and Ar represents a divalent Cto Caromatic hydrocarbon group, and Zrepresents an organic sulfonium cation or an organic iodonium cation.

Salt, resin, resist composition and method for producing resist pattern

1. A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), and a structural unit having a sulfonyl group, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator. wherein Rrepresents a hydrogen atom or a methyl group, and Rrepresents a Cto Csaturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.

The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein Trepresents a C4-C34 sultone ring group optionally having one or more substituents, Xrepresents &#x2014;O&#x2014; or &#x2014;N(R)&#x2014;, Rrepresents a hydrogen atom or a C1-C6 alkyl group, Zrepresents *-X&#x2014;, *-X&#x2014;X&#x2014;CO&#x2014;X&#x2014;, or *-X&#x2014;CO&#x2014;X&#x2014;X&#x2014;, Xand Xindependently each represent a C1-C6 alkanediyl group, Xrepresents &#x2014;O&#x2014; or &#x2014;N(R)&#x2014;, * represents a binding position to X, and Rrepresents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.

Resin and photoresist composition comprising the same

The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein Trepresents a C4-C34 sultone ring group optionally having one or more substituents, Xrepresents &#x2014;O&#x2014; or &#x2014;N(R)&#x2014;, Rrepresents a hydrogen atom or a C1-C6 alkyl group, when Xis &#x2014;O&#x2014;, Zrepresents *&#x2014;X&#x2014;, *&#x2014;X&#x2014;CO&#x2014;O&#x2014;X&#x2014;, *&#x2014;X&#x2014;CO&#x2014;N(R)&#x2014;X&#x2014;, *&#x2014;X&#x2014;O&#x2014;CO&#x2014;X&#x2014; or *&#x2014;X&#x2014;N(R)&#x2014;CO&#x2014;X&#x2014;, when Xis &#x2014;N(R)&#x2014;, Zrepresents *&#x2014;X&#x2014;, *&#x2014;X&#x2014;O&#x2014;X&#x2014;, *&#x2014;X&#x2014;CO&#x2014;, *&#x2014;X&#x2014;X&#x2014;CO&#x2014;X&#x2014;, *&#x2014;X&#x2014;CO&#x2014;X&#x2014;X&#x2014;, *&#x2014;X&#x2014;X&#x2014;CO&#x2014;X&#x2014;CO&#x2014; or *&#x2014;X&#x2014;CO&#x2014;X&#x2014;X&#x2014;CO&#x2014;, Xand Xindependently each represent a C1-C6 divalent aliphatic hydrocarbon group, Xrepresents &#x2014;O&#x2014; or &#x2014;N(R)&#x2014;, * represents a binding position to X, and Rrepresents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.

A transposition operation device includes: a register group storing a matrix of data such that elements are readable one at a time; an output data rearrangement unit rearranging elements in each row of the matrix so that elements in a same column of the matrix are in different columns of the matrix after rearrangement; a register access unit writing the matrix after rearrangement to the register group and reading the elements in the same column by using column position information indicating positions in the register group at which the elements in the same column are stored; an input data rearrangement unit rearranging the read elements; an operation unit performing an operation on the rearranged elements; and a transposition control unit generating rearrangement information and the column position information to control rearrangement, and performs transposition at high speed by performing rearrangement at the time of storing/reading data in/from the register group.

Growing community of inventors

Osaka, Japan

Takashi Nishimura