Tokyo Ohka Kogyo Co., Ltd.

Takashi Nagamine

Tsuyoshi Nakamura

Masatoshi Arai

Hideto Nito

Yoshitaka Komuro

Kotaro Endo

Daichi Takaki

Kazuishi Tanno

Junichi Miyakawa

Masafumi Fujisaki

Miki Shinomiya

Yoshiyuki Utsumi

Takahiro Kojima

Junichi Tsuchiya

Takaya Maehashi

Takuya Ikeda

Tatsuya Fujii

Issei Suzuki

Yuta Iwasawa

KhanhTin Nguyen

Yuki Fukumura

Emi Uchida

Kyo Hatakeyama

A resist composition that generates an acid upon exposure is soluble in a developing solution, and is changed by action of an acid. The resist composition contains a resin component having solubility in a developing solution, which is changed by action of an acid, and has a constitutional unit represented by General Formula (a01-1) and a constitutional unit derived from a compound represented by General Formula (a02-1). In General Formula (a01-1), R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Yaxrepresents a single bond or a linking group; Ax represents a sulfonyl group or a sulfoxide group; and Raxrepresents an alkyl group, an alkoxy group, a halogen atom, or a halogenated alkyl group. In General Formula (a02-1), W represents a polymerizable group-containing group, Warepresents a cyclic group having an (n+1)-valent aromaticity, which may have a substituent, Wamay form a condensed ring with W, and nrepresents an integer of 1 to 3 

Resist composition and method of forming resist pattern

A resist composition that generates an acid upon exposure and has solubility in a developing solution, which is changed by action of an acid, the resist composition containing a resin component having a constitutional unit represented by General Formula (a01-1) and a constitutional unit represented by General Formula (a02-1). In General Formula (a01-1), R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Yaxrepresents a linking group; Ax represents a sulfonyl group or a sulfoxide group; Raxrepresents an alkyl group, an alkoxy group, a halogen atom, or a halogenated alkyl group; s0 and v0 represent an integer of 0 to 6; and 1&#x2264;s0+v0&#x2264;6 and u0&#x2264;s0+v0. In General Formula (a02-1), Rarepresents an acid-dissociable group represented by General Formula (a02-r2-1) 

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a polymeric compound having a structural unit represented by general formula (a0-1) (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Varepresents a divalent hydrocarbon group; nrepresents an integer of 0 to 2; Rarepresents an acid dissociable group represented by general formula (a0-r1-1); Raand Rarepresents a hydrocarbon group; Raand Ramay be mutually bonded to form a ring; Yarepresents a quaternary carbon atom; Ra, Raand Raeach independently represents a hydrocarbon group, provided that at least one of Ra, Raand Rais a hydrocarbon group having a polar group). 

Resist composition, method of forming resist pattern, polymeric compound, and copolymer

A resist composition containing a polymer compound which has a constitutional unit (a0) represented by Formula (a0-1); and an acid generator which is formed of a compound represented by Formula (b1) (in the formulae, Rarepresents an acid dissociable group represented by Formula (a0-r1-1); Ra, Ra, Ra, Ra, and Rarepresent a hydrocarbon group; Yarepresents a quaternary carbon atom; Rrepresents a hydrocarbon group which has a steroid skeleton containing at least one hydroxyl group; Yrepresents a divalent linking group having a single bond or a hetero atom; Vrepresents a single bond, an alkylene group, or a fluorinated alkylene group; and Rrepresents a hydrogen atom, a fluorine atom, or a fluorinated alkyl group). 

A resist composition containing a compound (B1) represented by Formula (b1) in which Rrepresents a monovalent hydrocarbon group which has a steroid skeleton and 17 to 50 carbon atoms, Yand Yeach independently represent a divalent linking group having a hetero atom, Vrepresents a divalent linking group containing a cyclic aliphatic hydrocarbon group, Vrepresents an alkylene group, a fluorinated alkylene group, or a single bond, Rrepresents a hydrogen atom, a fluorine atom, or a fluorinated alkyl group having 1 to 5 carbon atoms, m represents an integer of 1 or greater, and Mrepresents an m-valent organic cation 

Resist composition, method of forming resist pattern, and compound

A resist composition which generates an acid upon exposure and whose solubility in a developing solution is changed due to an action of the acid, the resist composition including a base material component whose solubility in a developing solution is changed due to the action of an acid; and a compound represented by Formula (d1) in which Rand Reach independently represents &#x2014;COO, &#x2014;COOH, or a hydroxyl group, where at least one of Rand Rrepresents &#x2014;COO, R, R, and Reach independently represents a hydroxyl group or a halogen atom, Rto Reach independently represents an alkyl group, nbrepresents an integer of 0 to 4, nband nbeach independently represents an integer of 0 to 2, nbto nbeach independently represents an integer of 0 to 5, m represents 1 or 2, and q represents an integer of 0 to 3.) 

Resist composition, method of forming resist pattern, compound, and acid diffusion control agent

A resist composition including a polymeric compound having a structural unit represented by formula (a0-1) and an acid generator consisting of a compound represented by general formula (b1-1) in which Rarepresents an acid dissociable group represented by general formula (a0-r1-1); Ra, Ra, Ra, Raand Rarepresent a hydrocarbon; Yarepresents a quaternary carbon atom; Rrepresents a hydrocarbon group having at least 1 hydroxy group as a substituent; Yrepresents a single bond or a divalent linking group containing an oxygen atom; and Vrepresents a single bond, an alkylene group or a fluorinated alkylene group). 

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and a compound represented by general formula (d1) in which Rand Reach independently represents a cyclic group which may have a substituent, a chain alkyl group which may have a substituent or a chain alkenyl group which may have a substituent; or Rand Rmay be mutually bonded to form a condensed ring; m represents an integer of 1 or more; and Mrepresents an organic cation having a valency of m. 

A resist composition which includes a polymer compound including a structural unit which is derived from an acrylic ester in which the hydrogen atom bonded to an &#x3b1;-position carbon atom may be substituted with a substituent and which has a lactone-containing cyclic group containing other electron withdrawing groups such as a cyano group at a side chain terminal, and a compound whose a conjugate acid has an acid dissociation constant (pKa) of less than 3.

Resist composition and method for forming resist pattern

A resist composition including a polymeric compound having 0 to 20 mol % of a structural unit containing a polar group-containing aliphatic hydrocarbon group, and an acid generator compound represented by general formula (b1-1) in which Rrepresents a hydrocarbon group having at least 1 hydroxy group as a substituent; Yrepresents a single bond or a divalent linking group containing an oxygen atom; Vrepresents a single bond, an alkylene group or a fluorinated alkylene group; Rrepresents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms; M'represents an organic cation having a valency of m. 

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a compound (D1) represented by general formula (d1), wherein Zrepresents an anion having an aromatic ring containing a hydroxybenzoic acid skeleton, provided that at least one hydrogen atom of the aromatic ring has been substituted with a halogen atom; m represents an integer of 1 or more; and Mrepresents an organic cation having a valency of m.Z(M)&#x2003;&#x2003;(d1)

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component which exhibits changed solubility in a developing solution under action of acid and an acid-generator component including a compound (B0-1) represented by general formula (b0) shown below in which Rarepresents an aromatic ring; Rarepresents an alkyl group of 5 or more carbon atoms optionally having a substituent; Raand Raeach independently represents an alkyl group of 1 to 10 carbon atoms optionally having a substituent; n1 represents an integer of 1 to 5; n2 represents an integer of 0 to 2; n3 represents an integer of 0 to 4; and Xrepresents a counteranion. 

Resist composition, method of forming resist pattern, acid generator, photoreactive quencher, and compound

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including a compound (B0-1) represented by general formula (b0) shown below (in the formula, Yxrepresents a divalent linking group; n represents an integer of 1 to 3; and M'represents an organic cation having a valency of m. 

Resist composition, method for forming resist pattern, acid generator and compound

A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid. The composition includes a base material component whose solubility in a developing solution changes under the action of an acid; an acid generator component which generates an acid upon exposure; and a photo-reactive quencher which contains a compound represented by the general formula shown below: in which Rarepresents an alkyl group having 1 to 10 carbon atoms which may have a substituent; and Raand Raeach independently represent an alkyl group having 1 to 10 carbon atoms which may have a substituent. Xrepresents a counter anion.

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Kawasaki, Japan

Takashi Nagamine