Victor Company of Japan, Limited

Takashi Moroboshi

Tetsuji Suzuki

Shigeo Shimizu

Masanobu Shigeta

Nozomu Ohkouchi

Masahiro Matsumaru

Tatsushi Nakanishi

Masami Sonda

Nobuyasu Katayama

Takeshi Hosoya

Yasuo Ishizaka

Manabu Endou

Shunsuke Izawa

A projection type display device is provided to display high quality images. In the device, a WB-PBSWis inclined to liquid crystal display devicesand has wire gridsparallel with a first substrate. One of directions of projection lines obtained by projecting the wire gridson a second substratevertically, the one direction being directed to a direction where one extension surface of the polarization spectroscopic surface intersects with another extension surface of the second substrate when the one direction is turned in the counterclockwise direction by 90&#xb0;, is defined as X-axis. If the liquid crystal display devicesare a type of first twist (normal twist), device reference line vectors are located at 225&#xb0;&#xb1;10&#xb0; in the counterclockwise direction in view from the first substrate. In case of a second twist (reverse twist) type, the device reference line vectors are located at 315&#xb0;&#xb1;10&#xb0; in the counterclockwise direction in view from the first substrate

Projection type display device

A reflective liquid crystal display device combined with an optical system with a wire grid is provided for light modulation by a liquid crystal layer. This layer, made of nematic liquid crystal having negative dielectric anisotropy, is formed such that first and second orientation directions on first and second substrates are rotated by '60&#xb1;&#x3b1;' and '60&#xb1;&#x3b2;' degrees in first and second rotating directions starting from a reference direction, respectively. The first and second rotating directions are mutually opposite, the reference direction is parallel to the first and second substrates and within in an angular range defined by a central angle plus &#xb1;5 degrees wherein the central angle is &#xb1;45 degrees from an oscillation direction of incident polarized light, and a relationship of |&#x3b1;|+|&#x3b2;|&#x2266;10 (&#x3b1; and &#x3b2; are zero or positive integers) is fulfilled.

Reflective liquid crystal display device and projection display apparatus using the same

An alignment layer to be used for liquid crystal displays each having at least two substrates with liquid crystals sealed therebetween is formed as follows. The substrates placed on each of several substrate trays are heated in a first load-lock chamber. At least one of the two substrates is irradiated with evaporated particles of oxide silicon (SiOx: 1.0&lE;&times;&lE;2.0) by vacuum deposition at an angle in the range from 45&deg; to 60&deg; from a direction of the normal line on the substrate surface to form an alignment layer thereon while the substrate trays are being moved in a layer-deposition chamber intermittently or sequentially. The substrate trays are cooled in a second load-lock chamber, thus producing substrates each formed the alignment layer thereon. The deposition chamber may be set under a requirement 0&lE;&Dgr;&thgr;&lE;3&deg; in &Dgr;&thgr;&equals;tan )dcos &thgr;/(D&plus;d sin &thgr;)), &ldquo;d&rdquo; a distance from the substrate center to the center of a substrate edge, &ldquo;D&rdquo; a distance from the substrate center to the center of an evaporation source containing the oxide silicon, and &thgr; an angle formed between a direction in which the normal line extends on the substrate center and another direction in which evaporated particles of oxide silicon are deposited on the substrate center from the evaporation source. The alignment layer may be formed at an angle of layer deposition in the range from 3&deg; to 10&deg;.

Apparatus and method of producing alignment layer for liquid crystal display

An alignment layer to be used for liquid crystal displays each having at least two substrates with liquid crystals sealed therebetween is formed as follows: The substrates placed on each of several substrate trays are heated in a first load-lock chamber. At least one of the two substrates is irradiated with evaporated particles of oxide silicon (SiOx: 1.0&lE;&times;&lE;2.0) by vacuum deposition at an angle in the range from 45&deg; to 60&deg; from a direction of the normal line on the substrate surface to form an alignment layer thereon while the substrate trays are being moved in a layer-deposition chamber intermittently or sequentially. The substrate trays are cooled in a second load-lock chamber, thus producing substrates each formed the alignment layer thereon. The deposition chamber may be set under a requirement 0&lE;&Dgr;&thgr;&lE;3&deg; in &Dgr;&thgr;&equals;tan (d cos &thgr;/(D&plus;d sin &thgr;)), &ldquo;d&rdquo; a distance from the substrate center to the center of a substrate edge, &ldquo;D&rdquo; a distance from the substrate center to the center of an evaporation source containing the oxide silicon, and &thgr; an angle formed between a direction in which the normal line extends on the substrate center and another direction in which evaporated particles of oxide silicon are deposited on the substrate center from the evaporation source. The alignment layer may be formed at an angle of layer deposition in the range from 3&deg; to 10&deg;.

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Kanagawa-ken, Japan

Takashi Moroboshi