Jsr Corporation

Takashi Miyamatsu

Yong Wang

Hiroaki Nemoto

Satoshi Ebata

Hirokazu Niwata

An immersion exposure liquid which exhibits a high refractive index, prevents elution and dissolution of a photoresist film or its upper layer film component, and reduces defects during formation of a resist pattern when used in an immersion exposure method, and an immersion exposure method using the immersion exposure liquid. The immersion exposure liquid is used for an immersion exposure device or an immersion exposure method in which a substrate is exposed through a liquid provided between a lens of a projection optical system and the substrate, the immersion exposure liquid being liquid in an operating temperature range of the immersion exposure device and including an alicyclic hydrocarbon compound or a cyclic hydrocarbon compound containing a silicon atom in the ring structure.

Liquid for immersion exposure and immersion exposure method

A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator. The sulfonium salt compound is shown by the following formula (I), wherein Rrepresents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or &#x2014;ORgroup, wherein Ris a monovalent alicyclic hydrocarbon group, Rrepresents a (substituted)-alkyl group or two or more Rgroups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and Xindicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.

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Tokyo, Japan

Takashi Miyamatsu