Canon Kabushiki Kaisha

Takashi Meguro

Yoshikazu Miyajima

Kazunori Iwamoto

Yukio Takabayashi

Tomohiro Harayama

Yasuyo Muto

An apparatus including an original stage that holds an original, a substrate stage that holds a substrate, and a projection optical system that projects a pattern of the original onto the substrate, and being configured to scan and expose the substrate during a period in which the speeds of the original stage and the substrate stage change, comprises a controller configured to correct, a distortion generated in an image transferred onto the substrate due to at least one of deformation of the original stage in response to a change in speed of the original stage and deformation of the substrate stage in response to a change in speed of the substrate stage, based on a correction value determined by an acceleration of the substrate stage.

Scanning exposure apparatus and device manufacturing method

An exposure apparatus for illuminating an original through an illumination system and for transferring a pattern of the original onto a substrate. The apparatus includes a movable element having a blade, the blade being provided in the illumination system and blocking at least a portion of illumination light, a stator configured to relatively move the movable element, and a resilient supporting member configured to resiliently support the stator without contacting the stator.

Exposure apparatus, and device manufacturing method

An exposure apparatus for projecting, by exposure, a pattern of an original onto a substrate. The apparatus includes a light blocking device for blocking at least a portion of exposure light. The light blocking device includes two plate-like members which are disposed in a vertical direction with a clearance kept therebetween, and two plate-like members which are disposed in a horizontal direction with a clearance kept therebetween. The apparatus further includes a driving member for moving the light blocking device, wherein the driving member includes the stator, and a reaction force absorbing device for absorbing a drive reaction force of the driving member. The reaction force absorbing device absorbs the reaction force by moving the stator of the driving member.

A stage apparatus has a substrate holding unit which chucks and holds a substrate, and includes a flat surface having a recess where the substrate holding unit is to be mounted. A fixing member fixes a projection support provided to the substrate holding unit onto the flat surface. The substrate holding unit is supported by the fixing member while a distal end of the projection support is in contact with the recess of the flat surface and the remaining portion of the substrate holding unit is not in contact with the flat surface.

Growing community of inventors

Utsunomiya, Japan

Takashi Meguro