Average Co-Inventor Count = 3.32
ph-index = 3
The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.
Company Filing History:
1. Mitsubishi Gas Chemical Company, Inc. (19 from 2,248 patents)
19 patents:
1. 12134596 - Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin
2. 11747728 - Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin
3. 11572430 - Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method
4. 11243467 - Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method
5. 11143962 - Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method
6. 11137686 - Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method
7. 10747112 - Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method
8. 10745372 - Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method
9. 10577323 - Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying compound or resin
10. 10364314 - Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method
11. 10359701 - Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method
12. 10338471 - Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method
13. 10310377 - Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method
14. 10294183 - Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resin
15. 9920024 - Method for purifying compound or resin