Raytex Corporation

Takashi Kanno

Kimihiro Eguchi

Kazuyuki Hiramoto

A wafer rotating deviceis provided with at least three rollersrotatably provided about axes arranged at parallel intervals and which rotate over the circumferential surface of a disk-shaped wafer, a rotation drive mechanismthat rotates and drives at least one of the rollers, an interval adjustment mechanismcapable of adjusting the dimensions of the intervals of the rollers, a load control devicethat controls the load applied from the rollersto the waferin the radial direction of the waferwhen the waferis clamped between rollers. As a result, a silicon wafer can be rotated without contacting the top and bottom surfaces of the silicon wafer.

Wafer rotation device and edge flaw inspection apparataus having the device

This device is provided with an elliptical mirror , a light source that radiates coherent light towards an inspected edge arranged near the location of its first focal point, a light blocking member that blocks diffracted light of a low order that is radiated from light source and reflected by inspected edge , and a photo detector arranged at the location of a second focal point of the elliptical mirror . The light blocking member is composed of a light absorbing member arranged on the mirrored surface of elliptical mirror reached by the low order diffracted right.

Growing community of inventors

Koshigaya, Japan

Takashi Kanno