Tokyo Ohka Kogyo Co., Ltd.

Toyko Ohka Kogyo Co., Ltd.

Takashi Kamizono

Toshiro Morita

Tatsuya Fujii

Takahiro Senzaki

Masahito Yahagi

Yuki Fukumura

Toshikazu Takayama

Issei Suzuki

Yoshitaka Komuro

Taku Hirayama

Daisuke Kawana

Shogo Matsumaru

Motoki Takahashi

Kenta Suzuki

Masatoshi Arai

Takashi Fujimoto

Tomotaka Yamada

Katsuya Tanitsu

Kazuaki Ebisawa

Atsushi Murota

Takuya Noguchi

Takaaki Hirai

Provided are: a surface treatment liquid with which it is possible to conduct a surface treatment of an object to be treated, so that water, upon contact with the treated surface, rapidly spreads on and wets the surface; a surface treatment method for treating an object using the surface treatment liquid; and a method for producing a roll-shaped sheet which has been surface-treated by the surface treatment method. The surface treatment liquid comprises a polymer (A) and a solvent(S), wherein the polymer (A) comprises a constituent unit (a1) which is derived from a monomer having a log P value of 0.5 or less and which has a hydrophilic group and a constituent unit (a2) derived from a monomer that gives a homopolymer having a glass transition temperature (Tg) of 120° C. or higher, and the polymer (A) has a weight-average molecular weight of 500-20,000.

Surface treatment liquid, surface treatment method, and method for producing surface-treated roll-shaped sheet

A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group, Vais a divalent hydrocarbon group, nrepresents an integer of 0 to 2, Yais a carbon atom, Xais a group forming a monocyclic aliphatic hydrocarbon group together with Ya, and Rais an aromatic hydrocarbon group or a specific unsaturated hydrocarbon group. In general formula (b1), Rrepresents a cyclic hydrocarbon group, Yrepresents a divalent linking group containing an ester bond, Vrepresents an alkylene group, a fluorinated alkylene group, or a single bond, and Mis an m-valent organic cation. 

Resist composition and method for forming resist pattern

To provide a surface treatment liquid capable of making a base material including polyorganosiloxane on at least a part of a surface thereof hydrophilic stably over a long period of time, and provide a surface treatment method using the surface treatment liquid. In a surface treatment liquid including (A) resin and a (B) solvent, as the (A) resin, resin having a functional group I that is a hydroxyl group and/or a cyano group is used, and a functional group II that is a hydrophilic group other than the functional group I, and a ratio of a structural unit having an anionic group to total structural units of the (A) resin is 5 mol % or less, or resin including a cationic group including an anion moiety and a cation moiety that can be bonded to the (A) resin is used.

Surface treatment liquid and surface treatment method

A method for manufacturing a flow path device internally provided with a flow path for allowing a liquid to flow by compression bonding two or more members to each other, in which the hydrophilic property of a surface of the flow path can be maintained for a long period of time. A flow path device is manufactured by forming a hydrophilic coating film using a treatment liquid including a hydrophilizing agent in at least one member, the coating film covering a surface of the member at a side to be joined to another member, then irradiating only a joining surface of the coating film with ultraviolet rays or plasma derived from an oxygen-containing gas in the member having the coating film, and irradiating at least the joining surface with ultraviolet rays or plasma derived from an oxygen-containing gas in a member having no coating film, and compression bonding the two or more members.

Method for manufacturing flow path device

An object is to provide a surface treatment liquid which can firmly bond, while coating the surface of a treatment target with an extremely thin film, a coating whose hydrophilicity is unlikely to be lowered even when the coating is brought into contact with fats and the like to the surface of the treatment target and a surface treatment method using the surface treatment liquid described above. In a surface treatment liquid containing a resin (A) and a solvent (S), as the resin (A), a resin is used which includes a constituent unit (a1) that includes an organic group including a quaternary ammonium cation group and having a sulfonic acid anion group at a terminal and that is derived from an N-substituted (meth) acrylamide, and includes a reactive silyl group in at least one of molecular chain terminals, the concentration of the resin (A) in the surface treatment liquid is less than 2 mass % and the pH of the surface treatment liquid is 4 or less.

Surface treatment liquid and hydrophilic treatment method

An object is to provide a hydrophilic treatment method which can firmly bond, while coating the surface of a treatment target with an extremely thin film, the coating to the surface of the treatment target and a surface treatment liquid which can be suitably used in the hydrophilic treatment method. In a hydrophilic treatment method using a surface treatment liquid containing a resin (A) and a solvent (S), the surface treatment liquid which includes, as the resin (A), a constituent unit (a1) derived from an N-substituted (meth) acrylamide having a hydrophilic group, which contains, in at least one of molecular chain terminals, a resin including a reactive silyl group and pH of the liquid is 4 or less is used, and thus a coating is formed on the surface of a treatment target.

Hydrophilic treatment method and surface treatment liquid

A resist composition which generates an acid upon exposure and changes a solubility in a developing solution under an action of the acid, the resist composition containing a base material component whose solubility in the developing solution changes under the action of an acid and an acid generator represented by general formula (b1). In general formula (b-1), Rrepresents an aromatic hydrocarbon group having at least one alkyl group having 3 or more carbon atoms as a substituent, Yrepresents a divalent linking group containing an ester bond (&#x2014;C(&#x2550;O)&#x2014;O&#x2014; or &#x2014;O&#x2014;C(&#x2550;O)&#x2014;), Vrepresents an alkylene group, a fluorinated alkylene group, or a single bond, m is an integer of 1 or more, and Mrepresents an m-valent organic cation.R&#x2014;Y&#x2014;V&#x2014;CF&#x2014;SO(M)&#x2003;&#x2003;(b1)

Resist composition, method for forming resist pattern, compound, and acid generator

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component which exhibits changed solubility in a developing solution under action of acid and an acid diffusion control agent, the base component including a structural unit represented by general formula (a0-1) shown below in which R represents H, C1-C5 alkyl group or C1-C5 halogenated alkyl group; Ya represents C; Xa represents a group which forms a divalent cyclic hydrocarbon group with Ya; Rato Rarepresents H, C1-C10 monovalent saturated chain hydrocarbon group or C3-C20 monovalent saturated cyclic hydrocarbon group; the acid diffusion control agent containing an acid which exhibits an acid dissociation constant of 1.5 or more. 

Resist composition and method of forming resist pattern

A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid, including a base material including a copolymer having a structural unit represented by general formula (a9-1) or a structural unit represented by general formula (a9-2), 30 mol % or more of a structural unit represented by general formula (a10-1) and 45 mol % or more of a structural unit having an acid-decomposable group which increases a polarity under the action of an acid. In each formula, Rs is a hydrogen atom or the like; Yaand Yaare a single bond or a divalent linking group; Ris a hydrocarbon group having 1 to 20 carbon atoms or the like; Ris an oxygen atom or the like; j and nare integers of 1 to 3; Wais a (n+1)-valent aromatic hydrocarbon group. 

A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group. Vais a divalent hydrocarbon group. nrepresents an integer of 0 to 2. Ra'and Ra&#x2032;are a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Ra&#x2032;is a phenyl group, a naphthyl group, or an anthryl group. In general formula (b1), Rrepresents a cyclic hydrocarbon group. Yrepresents a divalent linking group containing an ester bond. Vrepresents an alkylene group, a fluorinated alkylene group, or a single bond. m is an integer of 1 or more, and Mis an m-valent organic cation. 

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid generator (B) which generates acid upon exposure, the base component (A) including a resin component having a structural unit (a0) represented by general formula (a0-1) shown below, and the acid generator component (B) containing a compound having a cation moiety having an electron withdrawing group (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Ya represents a carbon atom; Xa represents an atomic group required to form an alicyclic hydrocarbon group with Ya; and Rarepresents an aromatic hydrocarbon group optionally having a substituent). 

A diffusing agent composition including a condensation product and an impurity diffusion component. The condensation product is a reaction product resulting from hydrolysis of an alkoxysilane. The impurity diffusion component is a monoester or diester of phosphoric acid, or a mixture thereof.

Method for forming an impurity diffusion layer by applying a diffusing agent composition

A diffusing agent composition of an aspect of the invention contains: a condensation product (A) made from a starting material that is an alkoxysilane represented by the following general formula (1): [Chemical Formula 1]RSi(OR)&#x2003;&#x2003;(1)where Rand Rare an organic group, a plurality of Rs and Rs included in condensation product are identical or different, and m is 0, 1 or 2, the condensation product including an alkoxysilane where m=0 also including at least one alkoxysilane where m is 1 or 2; an impurity diffusion component (C); and an organic solvent (D).

Paintable diffusing agent composition

A method of diffusing an impurity-diffusing component including forming a first diffusing agent layer containing a first conductivity type impurity-diffusing component on the surface of a semiconductor substrate; calcining the first diffusing agent layer; forming a second diffusing agent layer containing a second conductivity type impurity-diffusing component on the surface of the semiconductor substrate excluding the region where the first diffusing agent layer is formed; and heating the semiconductor substrate at a temperature higher than the calcination temperature to diffuse the first and second conductivity type impurity-diffusing components to the semiconductor substrate.

Method of diffusing impurity-diffusing component and method of manufacturing solar cell

A diffusion-agent composition including a borate ester (A); a polyhydric alcohol (B) represented by general formula (1); and an alkoxysilane compound (C). In general formula (), k represents an integer from 0 to 3, m represents an integer of 1 or more, and Rand Reach independently represent a hydrogen atom, a hydroxyl group, a Calkyl group, or a Chydroxyalkyl group. When there are a plurality of Rs and Rs, the plurality of Rs and Rs may be the same as or different from one another. When k is 2 or more, the plurality of Rs and Rs always include at least one or more hydroxyl groups or Chydroxyalkyl groups having 1 to 5 carbon atoms. Rand Reach independently represent a hydrogen atom or a Calkyl group. 

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Kawasaki, Japan

Takashi Kamizono