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Tokyo Electron Limited

Takashi Kameoka

Kazutaka Yanagita

Ryohei Matsui

Toshiyuki Nakagawa

Terumasa Koura

Tomoko Yanagita

Kazuma Suzuki

Shingo Okubo

Kohei Tarutani

Yasunori Kumagai

Ikuo Suzuki

Kouki Morimoto

Yuki Kumamoto

Mikio Goto

Koji Ishida

Koji Matsumoto

Supply system include a first vessel containing the precursor, a second vessel, a first gas conduit fluidically connecting the first vessel to the second vessel, wherein a pressure reduction device and a flow control device are fluidically mounted therein, a second gas conduit fluidically connecting the second vessel to a point of use, and a pressure gauge downstream the pressure reduction device for measuring a partial pressure of the precursor in the second vessel, wherein the partial pressure of the precursor in the second vessel is at a pressure lower than the saturated vapor pressure of the precursor at the temperature of the second vessel and higher than an inlet pressure requirement of the flow control device at the point of use. Methods for using the supply system are also disclosed.

Supply system for low volatility precursors

The present invention provides a supply system enabling a precursor of a solid material or a precursor of a liquid material to be supplied to a latter process at no higher concentration than required and also at or above a predetermined concentration. A supply systemcomprises: a vesselfor receiving a precursor material; a vessel heating unit for heating the vessel at a set temperature; a carrier gas heating unit which is disposed in an introduction line Land heats a carrier gas; a main measurement unit which is disposed in an outward conduction line Land obtains data relating to a gas of the precursor; and a carrier gas temperature control unit for controlling the temperature of the carrier gas heating unit in accordance with a measurement result of the main measurement unit.

Precursor supply system and precursors supply method

A method for producing a highly pure PMDA comprises at least the following steps: (1) a step of preparing a raw material solution by dissolving a raw material of a pyromellitic dianhydride in an acetic acid solvent, (2) a step of preparing a precursor pyromellitic dianhydride by recrystallizing the pyromellitic dianhydride in the prepared raw material solution and separating the acetic acid solvent, (3) a step of performing a degassing treatment on the precursor pyromellitic dianhydride by stirring the precursor pyromellitic dianhydride in a fluidized state while heating under reduced-pressure conditions, and (4) a step of taking out the pyromellitic dianhydride subjected to the degassing treatment.

Method for producing pyromellitic dianhydride, pyromellitic dianhydride produced by the method, and apparatus therefor

Disclosed is a film formation method, including vaporizing a plurality of raw material monomers in respective corresponding vaporizers, supplying the plurality of raw material monomers into a film formation apparatus, causing vapor deposition polymerization of the plurality of raw material monomers in the film formation apparatus to form an organic film on a substrate, and removing an impurity contained in at least one raw material monomer among the plurality of raw material monomers before the vapor deposition polymerization.

Film formation method and film formation apparatus

An apparatus and method to remove water content in organic solvents characterized in that it comprises treatment tankto which organic solvent is introduced, solvent inlet sectionthat introduces the organic solvent, solvent outlet sectionfrom which the treated organic solvent is discharged, inert gas inlet sectionfrom which inert gas is introduced, treatment gas outlet sectionfrom which gas is discharged, cooling treatment tankin which the treatment gas is cooled and the gas and liquid are separated, treatment gas inlet sectionfrom which the treatment gas is introduced, recovered liquid outlet sectionfrom which the separated liquid organic solvent is discharged, and waste gas outlet sectionfrom which the separated gas is discharged, and that the water content in the organic solvent is removed by having the inert gas flow over the entire liquid surface of the organic solvent inside treatment tank

Apparatus and method for removing water content from organic solvents

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Tokyo, Japan

Takashi Kameoka