Edwards Japan Limited

Seiko Instruments Inc

Boc Edwards Technologies Limited

Seiko Seiki Kabushiki Kaisha

Arisawa Mfg. Co., Ltd.

Boc Edwards Japan Limited

Takashi Kabasawa

Manabu Nonaka

Yoshiyuki Sakaguchi

Tooru Miwata

Satoshi Okudera

Takashi Okada

Kengo Saegusa

Hirotaka Namiki

Hideki Omori

Yohei Ogawa

Yuichi Kawai

Yoshihiro Yamashita

Akihiko Wada

Hideki Enosawa

Haruki Suzuki

Takahiro Iiyoshi

Masaki Hori

Koichi Ichihara

Yasushi Tateno

Togru Miwata

Kazushi Yamamoto

A cleaning apparatus for a vacuum exhaust system capable of preventing redeposition of deposits on a downstream side of a vacuum pump is provided. A cold trap capable of causing deposits to be formed by cooling gas containing a sublimation component, at least one first vacuum pump disposed upstream of the cold trap, at least one first piping connecting the first vacuum pump to the cold trap, at least one second vacuum pump disposed downstream of the cold trap, and at least one second piping connecting the second vacuum pump to the cold trap are provided. At least a part of the first vacuum pump or the first piping is configured to be heated to higher than or equal to a sublimation temperature of the sublimation component. The cold trap is configured to be cooled to less than or equal to the sublimation temperature of the sublimation component.

Cleaning apparatus for vacuum exhaust system

A vacuum pump includes a heater, purge gas introduction ports, a purge gas valve, and an exhaust valve. In a cleaning operation mode, at least one of the heater, the purge gas valve, and the exhaust valve is controlled, and a pressure in at least a part of an interior of the turbomolecular pump is increased to a pressure region with which a temperature is greater than or equal to a sublimation temperature of the deposits in the turbomolecular pump and that causes an intermediate flow or a viscous flow.

Vacuum pump and vacuum exhaust apparatus

An exhausting system capable of preventing gas condensation and early overheat in a vacuum pump without causing an increase in the costs of the entire exhausting system and suitable for relaxing the operable conditions of the entire exhausting system including a flow rate at which gas is successively exhausted. An exhausting system is predicated on a constitution including: at least a first vacuum pump and a second vacuum pump connected in series; and a connecting portion disposed therebetween, the exhausting system exhausting gas containing a condensable gas via the vacuum pumps and the connecting portion. In the exhausting system, an environment inside the connecting portion is set to an environment having a vapor phase region below a vapor pressure curve of the condensable gas flowing through an inside of the connecting portion by providing the second vacuum pump near the first vacuum pump.

Integrated connector between first and second vacuum pumps creating a vapor phase region environment

A vacuum pump and a vacuum pump rotor blade that can effectively limit deposition of reaction products are provided. The vacuum pump includes a rotating shaft held rotationally, a drive mechanism for the rotating shaft, a first rotor blade made of a first material, a second rotor blade made of a second material having higher heat resistance than the first material, and disposed further toward a downstream side than the first rotor blade, and a casing enclosing the rotating shaft, the first rotor blade, and the second rotor blade. The second rotor blade is disposed, via a heat insulating portion, on the first rotor blade.

Vacuum pump and vacuum pump rotor blade

A vacuum pump is provided that can remove deposits without overhauling and also detect completion of removal of deposits. A cleaning function portion for a cleaning function that performs cleaning of a deposit in a vacuum pump and a deposition sensor for a deposition detection function that detects the deposit are provided. A reading circuit portion and a cleaning completion determination circuit portion for a cleaning completion determination function that determines completion of cleaning are provided. The cleaning completion determination circuit portion outputs a cleaning completion signal indicating completion of the cleaning, based on a detection result of the deposition sensor.

Vacuum pump

A vacuum pump and a stator column wherein partition walls from an outer peripheral surface of the stator column toward an inner periphery of a rotor blade are provided at two spots, and a groove-shaped channel in a circumferential direction is provided. A sectional area of the channel changes in the circumferential direction. As a result, the pressure difference between a front and a rear of the partition wall on a downstream side is made uniform regardless of a location, and a flowrate of the gas passing through a gap between the partition wall on the downstream side and the inner peripheral surface of the rotor blade is made uniform regardless of the location. The change in the sectional area is achieved either by changing a depth of the groove-shaped channel or by changing an interval between the partition walls at the two spots.

Vacuum pump and stator column

A deposited material sensor is arranged, in a flow path of a gas from an inlet port to an outlet port, on an upstream side or a downstream side of a predetermined flow path position where a cause of disruption to operation of the vacuum pump is to occur. In addition, the deposited material sensor detects a presence or absence of deposited material at the arrangement position of the deposited material sensor, and the arrangement position of the deposited material sensor is a position where a thickness of the deposited material at the predetermined flow path position assumes a predetermined thickness that corresponds to a maintenance time of maintenance for suppressing the cause when a detection state of the deposited material sensor changes from deposited material absent to deposited material present.

Provided is a vacuum pump regarding which compression can be improved at low costs. Included is a plurality of Siegbahn exhaust mechanisms in which a helical groove is provided to a stator disc. The Siegbahn exhaust mechanisms are provided on both faces of an upstream side and a downstream side of the stator disc. An end portion of the helical groove provided on the upstream side and a start portion of the helical groove provided on the downstream side are situated at least partially overlapping in a circumferential direction. A width of a channel of a switchback portion of the upstream side and the downstream side is equivalent or less than a depth of a channel of the Siegbahn exhaust mechanisms.

Vacuum pump and vacuum pump component part

A pressure difference of liquid is generated between an upper end and a lower end of a thread groove by the action of a thread groove pump formed between the thread groove and a lower end wall portion of a rotating rotor shaft. As a result, liquid of a bottom space is sucked up and passes through a hollow hole and is discharged to the outside of the rotor shaft through communication holes. The discharged liquid passes through the inside of a hub of a rotating body and reaches an extension member where it is sprayed radially in the form of droplets from a protrusion. The droplets are received by a partition wall. Due to the presence of a protrusion in an upper portion of the partition wall, the droplets cannot cross over the partition wall. The accumulated liquid drops through a communication hole to the bottom space.

Vacuum pump including levitated magnetic bearing

A vacuum pump capable of removing side reaction products without overhaul is provided. The vacuum pump includes A motor for rotating a rotor, a heater capable of raising a temperature, a base spacer for holding the heater, a controller capable of controlling the heater by switching an operation mode between a normal operation mode and a cleaning operation mode, and a storage portion storing information on a set temperature relating to the heater, the storage portion stores at least first temperature information for the normal operation mode, or more specifically, set temperature information capable of using the pump without nonconformity, second temperature information for the cleaning operation mode, or more specifically, set temperature information capable of re-gasifying side reaction products generated during the normal operation mode, and the temperature represented by the second temperature information is higher than the temperature represented by the first temperature information.

Vacuum pump and vacuum pump system

To provide a vacuum pump suited for removal of a product deposited in a flow path of the vacuum pump, and a stator component, a discharge port, and control means that are used in the vacuum pump. A vacuum pump includes a flow path through which a gas is transferred from an inlet port toward an outlet port and removing means that removes a product deposited on an inner wall surface of the flow path. The removing means has injection holes with one ends opened at the inner wall surface of the flow path and injects the removing gas into the flow path through the injection holes.

Vacuum pump, and stator component, discharge port, and control means used therein

In a vacuum pump, an outer diameter of a spiral plate disposed on a downstream side is set smaller than an outer diameter of a spiral plate disposed on an upstream side. Specifically, a stepped portion is provided by setting a blade length of the spiral plate disposed on the downstream side shorter than a blade length of the spiral plate disposed on the upstream side. In addition, in a spacer provided in the stepped portion, a relief formation portion is provided to allow a contact surface in contact with an upstream spacer (i.e., spacer opposed to the spiral plate having the unreduced outer diameter) and a contact surface in contact with a downstream spacer (i.e., spacer opposed to the spiral plate having the reduced outer diameter) in the stepped portion to have an equal inner diameter.

Vacuum pump and spiral plate, spacer, and rotating cylindrical body each included vacuum pump

The present invention provides a vacuum pump that measures the temperature of a rotating portion accurately and at low cost, a stator column of the vacuum pump, a base, and an exhaust system of the vacuum pump at low cost. The vacuum pump according to the present embodiment, the thread groove-type seal for causing some of the purge gas to flow back toward the temperature sensor unit is provided on the downstream side of the purge gas flow path in which the temperature sensor unit is disposed, thereby increasing the pressure of the purge gas in the vicinity of the temperature sensor unit. Thus, with the small amount of purge gas, the gas pressure around the temperature sensor unit can create an intermediate flow or a viscous flow. Consequently, the total amount of purge gas to be supplied can be saved, resulting in cost reduction.

Vacuum pump, stator column, base, and exhaust system of vacuum pump

A vacuum pump exhaust system and an exhausting method of the vacuum pump supply a purge gas to the vacuum pump such that an amount of the purge gas satisfies one of following conditions: an amount of the purge gas flowing at a higher velocity than a backflow velocity of gas exhausted by the vacuum pump on at least a part of a downstream side of the temperature sensor unit, and an amount of the purge gas having a pressure of one of an intermediate flow and a viscous flow around the temperature sensor unit. The exhaust system further includes a purge gas supply unit capable of controlling a flow rate of purge gas introduced into the vacuum pump. This configuration can prevent process gas from flowing backward so as to change the composition around the temperature sensor unit, thereby accurately measuring the temperature of the rotating portion.

Vacuum pump exhaust system, vacuum pump provided for vacuum pump exhaust system, purge gas supply unit, temperature sensor unit, and exhausting method of vacuum pump

A vacuum pump includes: a rotating portion and a stator portion between which an internal flow path is formed; an exhaust mechanism which sends gas from a suction port toward an outlet port through the internal flow path; and a main sensor for detecting that a deposited material has reached a prescribed thickness at a detection object position of the internal flow path, wherein the main sensor includes at least a pair of electrodes disposed in the internal flow path at an interval corresponding to the prescribed thickness, and a capacitance detection circuit which is connected to the pair of electrodes and which detects a capacitance between the pair of electrodes, and the capacitance detection circuit detects that a deposited material in the internal flow path has reached the prescribed thickness on the basis of a drop in an increase rate of the capacitance.

Growing community of inventors

Chiba, Japan

Takashi Kabasawa