Kabushiki Kaisha Toshiba

Takashi Jonai

Satoshi Saito

Toru Ushirogouchi

Naoko Kihara

Tsukasa Tada

Hirokazu Niki

Takuya Naito

Osamu Sasaki

On a substrate a protective layer is formed which can suppress the diffusion of a contaminant from the substrate. On the protective layer, thus formed, a resin layer is formed. The resin layer comprises a photosensitive composition containing a compound which has a substituent group capable of being decomposed or cross-linked in the presence of an acid, and a compound which can generate an acid when exposed to light. The resin layer is pattern-exposed to light and then baked at a predetermined temperature. The resin layer is developed, whereby the exposed portions of the resin layer are removed or left, thus forming a pattern comprising lines and spaces each having a predetermined width. Each of the lines of the pattern has a cross-section having neither sloped profile nor undercut profile, and the pattern therefore has an improved resolution.

Pattern forming method

Growing community of inventors

Yokohama, Japan

Takashi Jonai