Organo Corporation

Other

Nec Corporation

Alps Electric Co., Ltd.

Frontec Incorporated

Takasago Netsugaku Kogyo Kabushiki Kaisha

Tadahiro Ohmi and Organo Corporation

Takashi Imaoka

Koji Yamanaka

Yasuhiko Kasama

Kenichi Mitsumori

Yukinari Yamashita

Takashi Futatsuki

Tadahiro Ohmi

Hiroshi Morita

Masaki Hirayama

Hidemitsu Aoki

Tadashi Shibata

Masayuki Toda

Akira Abe

Takeo Yamashita

Oh Eui Yeol

Masakazu Nakamura

Hisayuki Shimada

Mizuho Morita

Hidetoshi Wakamatsu

Isamu Sugiyama

Eui-Yeol Oh

Nobuhiro Konishi

Jinzo Watanabe

Shintaro Aoyama

Masaharu Nakamori

The wet treatment liquid feed nozzle of the invention comprises an introducing pathhaving an introducing porta discharging pathhaving a discharging porta crossing sectionformed by causing the introducing pathand the discharging pathto cross at the other ends thereof, a nozzle assemblyhaving an opening sectionopening to an object to be treatedprovided at the crossing sectionand pressure control meansfor controlling the difference between the pressure of the wet treatment liquid in contact with the object to be treatedand the atmospheric pressure provided at least on the discharging pathside so that the wet treatment liquid having been in contact with the object to be treatedvia the opening sectiondoes not flow to outside the discharging path

Liquid feed nozzle, wet treatment, apparatus and wet treatment method

The wet treatment liquid feed nozzle of the invention comprises an introducing path having an introducing port, a discharging path having a discharging port, a crossing section formed by causing the introducing path and the discharging path to cross at the other ends thereof, a nozzle assembly having an opening section opening to an object to be treated, provided at the crossing section, and pressure control means, for controlling the difference between the pressure of the wet treatment liquid in contact with the object to be treated and the atmospheric pressure provided at least on the discharging path side so that the wet treatment liquid having been in contact with the object to be treated via the opening section does not flow to outside the discharging path.

Liquid feed nozzle, wet treatment apparatus and wet treatment method

A method of forming an oxide film having high insularity capability is performed within an ultra clean environment, using charged particles.

Oxide film forming method

A heat exchange cooling system for cooling an object of heat exchange such as machinery, air, or liquid is provided. The system includes a heat exchanger, a cooling water supply device, cooling water circulation piping, a flow rate adjustment valve, a cooling water supply system, and a controller for controlling the flow rate of cooling water. The system includes separate loops for the circulation piping and the cooling supply system. The separate loops are coupled to one another at an inlet and an outlet of the system.

Reductive heat exchange water and heat exchange system using such water

Deionized water from a deionized water source ( ) for electrolysis is supplied by a pressurizing pump ( ) to an electrolyzer ( ) to obtain a hydrogen gas and ozone gas by means of electrolysis. The pressures of these gasses are maintained at not less than the atmospheric pressure. These gasses at a pressure of the atmospheric pressure or more are dissolved in high-purity water in gas dissolving units ( ) to obtain ozone water and hydrogen water respectively. These ozone water and hydrogen water are introduced into mixer ( ) to adjust pH respectively. In this way, highly-concentrated, gas dissolved cleaning solution is prepared in a short period of time.

Method for preparing cleaning solution

Heat exchange water for cooling an object of heat exchange such as machinery, air, or liquid, which serves to prevent oxidation and deterioration of metal materials used in pipes for supplying/circulating the heat exchange water or in the liquid ends of the heat exchanger, to suppress growth of algae and microorganisms, and to reduce influence on the environment. The heat exchange water is reductive water having zero or negative standard oxidation-reduction potential as determined on the basis of the hydrogen electrode standard.

An electronic parts members, or the like, such as the silicon wafer, etc., is washed with wash water. The wash water is prepared by dissolving a hydrogen gas or ozone gas in ultra pure water and has a negative or positive oxidation-reduction potential. This wash water has remarkably improved detergency for electronic parts. In addition, when the pH of the wash water is adjusted, the electronic parts members can be washed more effectively.

Method and device for washing electronic parts member, or the like

Vacuum processing equipment capable of preventing particles from sticking to objects to be processed in vacuum vessels. The vacuum equipment comprises a series of vacuum vessels separated by doors, and the pressure in the vessels are reducible respectively. The vessels are so configured that objects to be processed are movable among them, and there is provided light projection means for projecting ultra rays on gases introduced to at least of the vessels.

A cleaning solution preparation device includes a deionized water supply source, a gas supply source, a gas-dissolving unit, and a gas supply pressure controller. The gas supply source supplies any of an oxidative gas, a reductive gas, an inert gas, a mixed gas of an oxidative gas and an inert gas, or a mixed gas of a reductive gas and an inert gas. The gas-dissolving unit dissolves the gas supplied from the gas supply source in deionized water supplied from the deionized water supply source to supply a gas-dissolved cleaning solution to objects to be cleaned. The gas supply pressure controller controls the pressure of the supplied gas at a value exceeding the atmospheric pressure when dissolving the gas in the deionized water.

Method and device for preparing cleaning solution

The present invention provides an apparatus and a method for producing ionic water which are capable of producing ionic water containing a low concentration of electrolyte with high reproducibility. The present invention also provides an apparatus and a method for producing electrolytic ionic water capable of producing electrolytic ionic water having stable characteristics. The ionic water producing apparatus has at least a gas-liquid mixing device for mixing raw water and a gas, and an ultrasonic exciting device for applying ultrasonic waves to the gas-liquid mixture obtained by the gas-liquid mixing device to generate ions.

Apparatus and method for producing ionic water and system and method for

A surfactant is added to anodic or cathodic water obtained by electrolyzing deionized water or high-purity water. Then, an object of treatment is treated with the anodic or cathodic water containing the surfactant. The object of treatment may be treated, in this way, while irradiating it with an ultrasonic wave having a frequency between 30 kHz and 3 MHz. Furthermore, the anodic or cathodic water is continuously jetted or dropped onto the object of treatment from a nozzle, while irradiating an ultrasonic wave at least at a part in the feed pipe of the anodic or cathodic water.

Wet treatment method

A high-purity water producing equipment comprises a primary purification treatment system, a primary deionized water tank, a secondary purification treatment system for producing high-purity water from a primary deionized water, a circulatory system pipe for returning the produced high-purity water to a primary deionized water tank and a branch water feed system branched off from the circulatory system for feeding the high-purity water to a use point. An electrolytic unit for producing the anolyte EIW (electrolytic ionized water) to be catholyte EIW from the electrolysis of the high-purity water is provided as a bypass midway along the circulatory system. The anolyte EIW is added to the circulatory pipe downstream of the branching point toward the use point, when cleaning of units is necessary.

Equipment and process for producing high-purity water

Electric parts including semiconductor substrates, glass substrates and the like are washed with various cleaning solutions. After the cleaning, said parts are cleaned with either anolyte or catholyte electrolytic ionized water (EIW) produced from deionized water.

Method and apparatus for cleaning electronic parts

An electrolytic ionized water (EIW) producing apparatus comprises an anode, a cathode, an electrolyzer which includes an anode chamber, a cathode chamber and an intermediate chamber, inlet lines for supplying an influent water to the three chambers, and outlet lines for discharging effluent water from the chambers. Further, an acidic electrolyte supplying unit is connected to the outlet line from the anode chamber, and an alkaline electrolyte supplying unit is connected to the outlet line from the cathode chamber. The electrolyte supplying units can selectively control at least the dosage level of elelctrolyte(s) to be supplied, the composition and concentration of the electrolyte(s) or pH of EIW after the addition of the electrolyte(s).

Electrolytic ionized water producing apparatus

In an electrolytic ionized water (EIW) producing apparatus, a three-chamber electrolyzer includes an anode chamber, a cathode chamber and an intermediate chamber. An influent such as deionized water is supplied to these chamber via inlet lines. Further an electrolyte supplying units are connected to the inlet lines of the anode chamber and the inlet line of the cathode chamber.

Growing community of inventors

Tokyo, Japan

Takashi Imaoka