Growing community of inventors

Kumagaya, Japan

Takashi Horiuchi

Average Co-Inventor Count = 2.09

ph-index = 5

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 69

Takashi HoriuchiHiroaki Takaiwa (6 patents)Takashi HoriuchiAtsushi Ohta (5 patents)Takashi HoriuchiNobuyoshi Tanno (2 patents)Takashi HoriuchiHironori Takano (1 patent)Takashi HoriuchiShinji Yasuno (1 patent)Takashi HoriuchiMasayuki Shimada (1 patent)Takashi HoriuchiAtsuro Kinbara (1 patent)Takashi HoriuchiHiroyuki Suginaka (1 patent)Takashi HoriuchiKei Sato (1 patent)Takashi HoriuchiTakashi Horiuchi (15 patents)Hiroaki TakaiwaHiroaki Takaiwa (32 patents)Atsushi OhtaAtsushi Ohta (5 patents)Nobuyoshi TannoNobuyoshi Tanno (3 patents)Hironori TakanoHironori Takano (8 patents)Shinji YasunoShinji Yasuno (5 patents)Masayuki ShimadaMasayuki Shimada (2 patents)Atsuro KinbaraAtsuro Kinbara (1 patent)Hiroyuki SuginakaHiroyuki Suginaka (1 patent)Kei SatoKei Sato (1 patent)
..
Inventor’s number of patents
..
Strength of working relationships

Company Filing History:

1. Nikon Corporation (14 from 8,889 patents)

2. Zao Nikon Co., Ltd. (6 from 6 patents)

3. Miyagi Nikon Precision Co., Ltd. (2 from 2 patents)

4. Honda Motor Co., Ltd. (1 from 21,831 patents)


15 patents:

1. 12138990 - Input reception system and control method of input reception system

2. 10151983 - Exposure apparatus and device manufacturing method

3. 9110381 - Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method

4. 9097986 - Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method

5. 9041906 - Immersion exposure apparatus and method that detects liquid adhered to rear surface of substrate

6. 8767168 - Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table after exposure

7. 8755025 - Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method

8. 8488101 - Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table on way from exposure position to unload position

9. 8345216 - Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method

10. 8107055 - Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method

11. 7995186 - Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method

12. 7990516 - Immersion exposure apparatus and device manufacturing method with liquid detection apparatus

13. 7990517 - Immersion exposure apparatus and device manufacturing method with residual liquid detector

14. 7898645 - Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method

15. 7515249 - Substrate carrying apparatus, exposure apparatus, and device manufacturing method

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as of
12/5/2025
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