Sumitomo Chemical Company, Limited

Matsushita Electric Industrial Co., Ltd.

Panasonic Corporation

Takashi Hiraoka

Koji Ichikawa

Sadayoshi Azuma

Hiroyuki Matsumoto

Hiromu Sakamoto

Kenji Tagawa

Mitsuyoshi Ochiai

Akio Ohno

Tatsuro Masuyama

Kazuhiko Hashimoto

Ichiki Takemoto

Satoshi Yamaguchi

Masako Sugihara

Masahiko Shimada

Yoshiyuki Takata

Shigeyuki Takao

Shingo Fujita

Tetsuya Kaneshiro

Katsuhiko Yamamoto

Akihiro Nishimura

Kazuhiro Ueda

Kairi Eguchi

Soon Shin Kim

Sakae Nakamoto

Keishirou Yamamoto

Hidenori Miyazawa

Kunihiko Kaneda

Yoshiaki Iida

A photoresist composition comprising an acid generator and a resin comprising a structural unit derived from a monomer represented by the formula (1):  

Photoresist composition

A resist composition contains; (A1) a resin having a structural unit represented by the formula (aa) and at least one structural unit selected from the group consisting of a structural unit represented by the formula (a1-1) and a structural unit represented by the formula (a1-2); (A2) a resin which does not have the structural unit represented by the formula (aa) and which is insoluble or poorly soluble in aqueous alkali solution, but becomes soluble in aqueous alkali solution by the action of acid; and (B) an acid generator, wherein R, A, R, L, L, R, R, R, R, m1, n1 and n1' are defined in the specification.

Resist composition and method for producing resist pattern

A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, 

The present invention is a salt represented by the formula (I) wherein Rand Rindependently represent a fluorine atom or a Cto Cperfluoroalkyl group; Lrepresents a Cto Cdivalent saturated hydrocarbon group, a &#x2014;CH&#x2014; contained in the saturated hydrocarbon group may be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;; ring Wrepresents a Cto Cheterocycle; Rrepresents a hydrogen atom or a Cto Chydrocarbon group, a &#x2014;CH&#x2014; contained in the hydrocarbon group may be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;; Rin each occurrence independently represent a Cto Chydrocarbon group, a &#x2014;CH&#x2014; contained in the hydrocarbon group may be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;; m represents an integer of 0 to 6; and Zrepresents an organic cation.

Salt, acid generator and resist composition

The present invention provides a resist composition giving a resist pattern excellent in CD uniformity and focus margin. A chemically amplified photoresist composition comprises a resin (A) and an acid generator (B), and the resin (A) contains, as a part or an entirety thereof, a copolymer (A1) which is obtained by polymerizing at least: a (meth)acrylic monomer (a1) having Calicyclic hydrocarbon group which becomes soluble in an aqueous alkali solution by the action of an acid; a (meth)acrylic monomer (a2) having a hydroxy group-containing adamantyl group; and a (meth)acrylic monomer (a3) having a lactone ring, and the copolymer (A1) has a weight-average molecular weight of 2500 or more and 5000 or less, and a content of the copolymer (A1) is not less than 50 parts by mass with respect to 100 parts by mass of the resin (A).

Chemically amplified photoresist composition and method for forming resist pattern

A mobile phonewith music reproduction function comprising a reproduction unitthat reproduces music data and a ring tone which are recorded in a music data recording mediumand a ring tone, a communication unitthat detects an incoming call from outside and a control unitthat instructs the reproduction unitto perform a fade-out process of reproducing music data and to perform a fade-in process of outputting a ring tone when the communication unitdetects an incoming call while the reproduction unitis reproducing music data.

Mobile phone with music reproduction function, music data reproduction method by mobile phone with music reproduction function, and the program thereof

A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), 

The present invention provides a salt represented by the formula (I): wherein Qand Qindependently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, Lrepresents a C1-C17 divalent saturated hydrocarbon group in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, ring W represents a C3-C36 aliphatic ring in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014;, &#x2014;S&#x2014;, &#x2014;CO&#x2014; or &#x2014;SO&#x2014; and in which one or more hydrogen atoms can be replaced by a hydroxyl group, a C1-C12 alkyl group, a C1-C12 alkoxy group, a C3-C12 alicyclic hydrocarbon group or a C6-C10 aromatic hydrocarbon group, Ris independently in each occurrence a fluorine atom or a C1-C6 fluorinated alkyl group, n represents an integer of 1 to 10, and Zrepresents an organic counter ion.

Salt and photoresist composition comprising the same

An imide compound represented by the formula (I): wherein Rrepresents a C1-C20 aliphatic hydrocarbon group etc., Wrepresents &#x2014;CO&#x2014;O&#x2014; etc., Qand Qeach independently represent a fluorine atom etc., and A represents a group represented by the formula (I-1): wherein Arepresents &#x2014;CH&#x2014;CH&#x2014; etc., and a chemically amplified resist composition containing the same.

Imide compound and chemically amplified resist composition containing the same

An oxime compound represented by the formula (I): wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, Rrepresents a C1-C30 aliphatic hydrocarbon group etc., Rrepresents a linear or branched chain C1-C20 aliphatic hydrocarbon group etc., W represents &#x2014;CO&#x2014;O&#x2014; etc., Qand Qeach independently represent a fluorine atom etc., Z represents a C1-C20 halogenated aliphatic hydrocarbon group etc, and the resist composition containing the same.

Oxime compound and resist composition containing the same

The present invention provides a chemically amplified positive composition comprising: a resin comprising a structural unit represented by the formula (I): wherein Rrepresents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or &#x2014;(CH)&#x2014;CO&#x2014;X&#x2014;, k represents an integer of 1 to 4, X, X, Xand Xeach independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and an acid generator.

Growing community of inventors

Osaka, Japan

Takashi Hiraoka