Adeka Corporation

Takashi Higashino

Atsushi Sakurai

Hiroki Sato

Kazuhisa Onozawa

Senji Wada

Masako Shimizu

Tetsuji Abe

Ryusaku Fujimoto

Kunio Osasawara

A metal alkoxide compound represented by the following general formula (1),  wherein each of Rto Ris independently a hydrogen atom or a methyl group; M is a titanium, a zirconium or a hafnium atom.

Metal alkoxide compound, material for forming thin film, and method for producing thin film

A composition containing 100 parts by mass of a siloxane compound having &#x2014;HSiRO&#x2014; (wherein R is a hydrogen atom, a hydrocarbon group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms or a phenoxy group) and 0.0001 to 1 part by mass of at least one phenol compound of general formula (1) or (2) as a stabilizer. wherein a and b are each an integer of 0 to 4; m is 0 or 1; p and q are each 1 or 2; R, R, R, and Rare each an alkyl group having 1 to 4 carbon atoms; Xand Xeach represent an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms or a halogen atom; Y is an alkanediyl group having 1 to 4 carbon atoms; and a plurality of Rs, Rs, Rs, Rs, Xs, Xs or Ys, where present per molecule, may be the same or different.

Composition containing siloxane compound and phenol compound

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Tokyo, Japan

Takashi Higashino