Kuraray Co., Ltd.

Takashi Fukumoto

Daiki Noguchi

Osamu Nakayama

Junko Sato

Yoshin Tamai

Katsuji Ujita

Rensuke Ikarashi

Yuki Nishijima

Toshiki Mori

Kenji Suzuki

Shuji Matsunaga

Keiji Kubo

Ichihiro Aratani

Kozo Nakao

Akinobu Takeda

Miki Tsuruta

Hiroshi Ozawa

Atsuhiro Nakahara

Masahiro Torihara

Hideki Matsuda

Toru Abe

Fumihiko Okabe

Nobutaka Hiraoka

Toshiki Endo

Jyunko Sato

Issei Oida

Naoya Kato

Kenji Watanabe

To provide a metal particle composition having excellent oxidation resistance, which does not require a transition metal catalyst and can be applied to existing metal particles, a method for producing the metal particle composition, and a paste. The metal particle composition contains, with respect to 100 parts by mass of metal particles, 0.1 to 5 parts by mass of a compound (A) having a structure represented by the following general formula (I):

Metal particle composition, method for producing metal particle composition, and paste

A polymer represented by the following general formula (I): wherein X, X, and Xeach represent a chalcogen atom, Rand Reach independently represent any one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, and an aralkyl group, Rand Reach independently represent any one selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group, Rand Reach independently represent any one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group, Rrepresents a hydrogen atom or a methyl group, Rrepresents any one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group, n is any integer, and none of R, R, R, and Rare bonded to each other to form a ring structure.

Polymer, oxygen absorber using same, and curable composition

A curable composition contains 79.0 to 99.0% by mass of a polymerizable monomer (a), 0.1 to 10.0% by mass of a photopolymerization initiator (b), and 0.01 to 20.0% by mass of a compound represented by the following general formula (I) as a polyfunctional polymerizable compound (c): wherein Rand Reach independently represent at least one kind selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group; Rrepresents at least one kind of a polymerizable functional group selected from the group consisting of a (meth)acryloyl group, a 4-vinylphenyl group, and an alkenyl group having 2 to 5 carbon atoms; and n represents an arbitrary integer of 0 to 5.

Curable composition and stereolithographic resin composition comprising same

A polymer comprising a structural unit derived from a compound (A) represented by formula (I):

Polymer, and oxygen absorbent and resin composition using same

To provide a curable composition that is readily modeled with low viscosity and excellent curing capability in modeling by stereolithography, and provides a cured article excellent in toughness and water resistance, and a resin composition for stereolithography prepared therefrom. To provide a resin composition for stereolithography that is favorable particularly for a dental mouthpiece and a denture base material. A curable composition containing 79.0 to 99.0% by mass of a polymerizable monomer (a), 0.1 to 10.0% by mass of a photopolymerization initiator (b), and 0.01 to 20.0% by mass of a compound (c) represented by the following general formula (I):

Curable composition, and resin composition for stereolithography prepared therefrom

The present invention relates to a composition containing a compound (A) represented by the following general formula (I) and a compound having two or more polymerizable functional groups (B) in a molecule (except for compound (A)), wherein a mass ratio ((A)/(B)) of the compound (A) to the compound having two or more polymerizable functional groups (B) in a multi-molecule is 30/70 to 50/50: wherein, Rand Reach independently represent any one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group; Rrepresents any one selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group; Rrepresents any one selected from the group consisting of a (meth)acryloyl group, a styryl group, and an alkenyl group having 2 to 6 carbon atoms; and n represents any integer of 1 to 5.

Composition having excellent coating properties

Provided is an unsaturated double bond-containing compound capable of sufficiently advancing a crosslinking reaction or a curing reaction when used for a coating material or the like and having oxygen absorption performance. The present invention also provides an oxygen absorbent containing the unsaturated double bond-containing compound and a resin composition containing the same. Provided are an unsaturated double bond-containing compound represented by general formula (I), an oxygen absorbent containing the same, and a resin composition.

Compound containing unsaturated double bond, oxygen absorber comprising same, and resin composition

An unsaturated double bond-containing compound represented by the general formula (I) or the general formula (II), an oxygen absorbent containing the compound, and a resin composition. 

Compound containing unsaturated double bond, oxygen absorbent using same and resin composition

An oxygen absorbing agent containing a compound (A) of formula (I): 

Oxygen absorbing agent

Provided are a break-resistant copolymer having high transparency and heat resistance and also having a high tensile strain at break, and a molded article. A copolymer contains 80% by mass to 98% by mass of structural units derived from a methacrylic ester monomer and 2% to 10% by mass of ester structural units derived from a cyclic ketene acetal monomer. The copolymer has a weight average molecular weight of 80,000 or more and a molecular weight distribution of 1.75 to 3.80.

Copolymer, and molded article

Provided is an acrylic acid ester derivative which, when used as a constituent unit of a polymer which is included in a photoresist composition for a semiconductor, exhibits excellent lithography characteristics such as LWR and the like. Specifically, provided is an acrylic acid ester derivative represented by the following general formula (1). Furthermore, provided are an intermediate of the acrylic acid ester derivative and a process for producing the same; a polymer containing the acrylic acid ester derivative as a constituent unit; and a photoresist composition for a semiconductor containing the polymer. 

Acrylic acid ester derivative and method for producing same, intermediate and method for producing same, high-molecular-weight compound, and photoresist composition

Provided are N-acyl-&#x3b2;-lactam derivatives represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is obtained; a polymer obtained by polymerizing the N-acyl-&#x3b2;-lactam derivative represented by the following general formula as one of starting materials; and a photoresist composition containing the polymer, where the structural variables are as defined herein.

N-acyl-&#x3b2;-lactam derivative, macromolecular compound, and photoresist composition

Disclosed are an N-acyl-&#x3b2;-lactam derivative represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is obtained; a polymer obtained by polymerizing the N-acyl-&#x3b2;-lactam derivative represented by the following general formula as one of starting materials; and a photoresist composition containing the polymer.  In the formula, Rrepresents a hydrogen atom, a methyl group, or a trifluoromethyl group; W represents an alkylene group or a cycloalkylene group; n represents 0 or 1; and each of R, R, R, and Rindependently represents a hydrogen atom, an alkyl group, a cyclic hydrocarbon group, or an acyloxy group, provided that 1) Rand R, or Rand R, may be connected to each other to form a substituted or unsubstituted ring which may have an oxygen atom at an arbitrary position, 2) Rand Rmay be connected to each other to form a substituted or unsubstituted ring which may have an oxygen atom at an arbitrary position, and 3) all of R, R, R, and Rare not a hydrogen atom at the same time.

Provided are 1) a production process for an acrylic ester derivative capable of being a raw material of a polymer for obtaining a photoresist composition capable of forming a photoresist film which is excellent in a reactivity to acid and a heat stability and is less swollen in developing and which has a refractive index of preferably 1.72 or more in 193 nm and can be patterned, 2) an acrylic ester derivative obtained by the above production process and 3) alcohol and ester which are synthetic intermediates for the above acrylic ester derivative.

Method for producing acrylate derivative, acrylate derivative, and intermediate thereof

A polymer compound for a photoresist composition (a) having a high dissolution rate in a developing solution after exposure and (b) exhibiting little swelling during development. A tertiary alcohol derivative that is a raw material for the polymer compound. A tertiary alcohol that is an intermediate of the tertiary alcohol derivative. The tertiary alcohol is represented by formula (3): wherein Rand Rindividually represent a linear, branched or cyclic alkylene group having 2 to 9 carbon atoms, which may contain an oxygen atom, and wherein Rand Rmay together form a ring with a carbon atom to which Rand Rare bonded.

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Niigata, Japan

Takashi Fukumoto