Sanyo Electric Co., Ltd.

Sumitomo Metal Industries, Inc.

Hitachi Zosen Corporation

Takashi Fujita

Keiji Ito

Yukihiro Terada

Takenori Abe

Masafumi Goto

Kunio Nomoto

Kenichi Kikuchi

Hideto Hayashi

Shigeaki Yamamoto

Motoyuki Ohara

Yuzo Kozai

An electronic apparatus () includes a microphone (). Sound is captured by the microphone (), and a key operation is detected by a sub microcomputer (). The processes according to outputs from the microphone () and the sub microcomputer () are executed by a main microcomputer (). The main microcomputer () outputs a sound effect from a speaker () in response to the key operation. Besides, output setting of the sound effect is changed between active state and inactive state. The main microcomputer () changes an extraction characteristic of sound according to the setting state of sound effect output.

Sound-controlled electronic apparatus

A positioning system wherein radio waves from a GPS satellite () are received by a reference station (), the absolute position of which is already known, and a plurality of mobile stations () to perform relative positioning among particular stations, thereby determining the positions of the mobile stations (). At least one of the mobile stations () is disposed such that a baseline limit length allowing relative positioning relative to the reference station () is exceeded, and the intervals between particular mobile stations () are shorter than the baseline limit length allowing relative positioning. Each of the stations () is equipped with a GPS receiver () that receives the radio waves from the GPS satellite (), and further equipped with a wireless communication apparatus () that transmits/receives data to/from a particular station. There are provided a relative position calculation part () for calculating the relative position between the particular stations; and an absolute position calculation part () for determining, based on an absolute position of one station that performs a relative positioning, an absolute position of the other station.

Relative position measurement method and relative position measurement system using satellites

A measuring system wherein radio waves from a GPS satellite () are received by a reference station () and a plurality of mobile stations () to perform relative measuring among particular stations, thereby measuring the shift amounts of the mobile stations (). At least one of the mobile stations () is disposed such that a baseline limit length allowing relative measuring relative to the reference station () is exceeded, and the intervals between particular mobile stations () are shorter than the baseline limit length allowing relative measuring. Each of the stations () is equipped with a GPS receiver () that receives the radio waves from the GPS satellite (), and further equipped with a wireless communication apparatus () that transmits/receives data to/from a particular station. There are provided a relative shift amount calculation part () for calculating the relative shift amount between the particular stations; and a reference relative-shift-amount calculation part () for determining, based on a reference relative-shift-amount of one station that performs a relative measuring, a reference relative-shift-amount of the other station.

Relative measurement method and relative measurement system using satellite

A position measurement system for measuring displacement of an observation station viewed from a reference station by receiving radio waves from satellites by these stations, and performing relative position measurement between the stations, having: a short period displacement measurement section for measuring a short period displacement component in each of the stations through independent position measurement; a relative position computing section for performing relative position measurement between said stations; a long period position computing section for inputting a short period displacement component measured by the short period displacement measurement section, a relative position determined by the relative position computing section and an absolute position from the reference station, and determining the absolute position including a long period displacement component by removing the short period displacement component measured by each of the stations; and a radio communication device installed on each of the stations, for transmitting/receiving data to/from another station.

Relative position measurement system using satellite

A digital camera includes an LCD to display a photographic image. If an operator manipulates a menu button during displaying a memory-reproduced photographic image on the LCD, a menu icon is displayed by superposition on the photographic image being displayed. Simultaneously, the photographic image is reduced in luminance. If the operator operates an image switching button, the photographic image being displayed is renewed by a desired photographic image. During renewal, the icon is suspended of display and the photographic image is increased in luminance. When the renewal is completed, the photographic image is reduced in luminance again and the icon is redisplayed.

Digital camera

A digital camera includes a CPU. When a memory card is attached to the digital camera, the CPU determines as to a format formed on the memory card. If the format is a normal format, the CPU changes the normal format to an optimal format. However, where an image file is already stored in the memory card or a directory for a file other than the image file is formed, the CPU does not change the format.

A polishing method characterized by measuring the thickness of a film of a monitoring piece to be polished which is to be used exclusively for monitoring polishing amount, and obtaining polishing amount on the basis of the results of measurement, and judging, on the basis of the resulting polishing amount, setting/change of polishing condition of a polishing object, whether it is necessary or not to replace a polishing pad, and/or completion of run-in polishing after replacement of the polishing pad, and an apparatus to be used for practicing same.

Polishing system

An apparatus for polishing a semiconductor wafer includes a polishing pad to be in contact with the semiconductor wafer; a turn table which rotates the polishing pad; and an elastic member which is arranged between the turn table and the polishing pad. The polishing pad includes a polishing layer which is made of a material having a good characteristic of slurry holding; and a support layer which is made of a rigid material having an optimum thickness to prevent the polishing layer from loosening. The polishing pad is attached to the turn table by a stretch-holding technique without adhesive bonding.

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Osaka, Japan

Takashi Fujita