Jsr Corporation

Nitto Kohki Co., Ltd.

Tdk Corporation

Nitto Kohki Kabushiki Kaisha

Takashi Chiba

Atsushi Nakamura

Toru Kimura

Tomohiro Utaka

Toshio Mikiya

Hiroki Nakagawa

Hiroshi Ikeda

Hirokazu Sakakibara

Yukio Nishimura

Hiroaki Nemoto

Keisuke Shimada

Kenji Ohtsuka

Munenori Yamaguchi

Hiroshi Dougauchi

Atsushi Miura

Masaaki Togashi

Keiichi Murakami

Sunao Masuda

Hiromitsu Nakashima

Taisuke Ahiko

Yasuo Kazama

Eiji Yoneda

Kuniaki Shibuya

Takayoshi Abe

Noboru Saitou

An immersion upper layer film composition includes a resin and a solvent. The resin forms a water-stable film during irradiation and is dissolved in a subsequent developer. The solvent contains a monovalent alcohol having 6 or less carbon atoms. The composition is to be applied to form a coat on a photoresist film in an immersion exposure process in which the photoresist film is irradiated through water provided between a lens and the photoresist film.

Immersion upper layer film forming composition and method of forming photoresist pattern

A resin composition which, in forming a fine pattern by a heat treatment of a resist pattern formed by using a photoresist, can be applied onto the resist pattern, can cause the resist pattern to smoothly shrink by heat treatment, and can be easily washed away by a treatment with an alkaline aqueous solution, and a method for efficiently forming a fine resist pattern using the resin composition are provided. The resin composition comprises a resin containing a hydroxyl group, a crosslinking component, and an alcohol solvent containing water in an amount of 10 wt % or less for the total solvent, wherein the alcohol in the alcohol solvent is a monovalent alcohol having 1 to 8 carbon atoms.

Resin composition for forming fine pattern and method for forming fine pattern

A radiation-sensitive resin composition excelling in basic properties as a resist such as sensitivity, resolution, and the like, having a wide depth of focus (DOF) to both a line-and-space pattern and an isolated space pattern, and exhibiting a minimal line width change due to fluctuation of a bake temperature, and having a small line width limit in which the line pattern destroying phenomenon does not occur, and a lactone-containing copolymer useful as a resin component of the composition are provided. The lactone-containing copolymer is represented by a copolymer of the following compounds (1-1), (2-1), and (3-1).  The radiation-sensitive resin composition comprises (a) the lactone-containing copolymer and (b) a photoacid generator.

Lactone copolymer and radiation-sensitive resin composition

A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000. 

Copolymer and top coating composition

An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of &#x3b1;-position.

Upper layer film forming composition for liquid immersion and method of forming photoresist pattern

A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which comprises at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000, wherein at least one of Rand Ris a fluoroalkyl group having 1 to 4 carbon atoms and Rin the formula (2) represents a fluoroalkyl group having 1 to 20 carbon atoms.

A chip type electronic component for test is provided with an element body, and four or more terminal electrodes placed on the exterior of the element body. The element body has a plurality of laminated insulator layers, and a plurality of internal electrodes arranged to be opposed to each other with the insulator layer in between. Each of the internal electrodes is connected to at least one same terminal electrode out of the four or more terminal electrodes and connected to any one terminal electrode except for the at least one same terminal electrode.

Chip type electronic component for test, and mounted state test method

An electric drill apparatus having a low profile is provided which comprises an annular cutter, a motor for rotating the annular cutter, a rotary shaft assembly for rotating the annular cutter attached to its leading end about a rotating, a rotation reduction mechanism disposed between the motor and rotary shaft assembly for transmitting a driving force of the motor to the annular cutter through the rotary shaft assembly, a feed mechanism responsive to an operation of a manual handle, for moving the rotary shaft assembly along with a straight line to advance or retract the annular cutter attached to the rotary shaft assembly with respect to a workpiece, and an adhesion base for securing the electric drill apparatus to the workpiece. The annular cutter has a plurality of cutting blades comprised of cemented carbide tips fixed on its lower end, thereby it is capable of rotating at a high speed. The rotary shaft assembly has a rotating shaft which rotates in a direction different from that of a rotating shaft of the motor, thereby the drill apparatus has a low profile.

Electric drill apparatus

A rotary cutting apparatus comprises a rotary shaft assembly having an axis and adapted to hold a cutting tool coaxial with the axis and, a feed mechanism for moving the cutting tool held by the rotary shaft assembly along the axis of the rotary shaft assembly. The rotary shaft assembly comprises a proximal rotary shaft, an intermediate, a distal rotary shaft which are successively telescopically connected, and a cylindrical housing rotatably holding the distal rotary shaft and movable along the axis together with the distal rotary shaft. The feed mechanism comprises a first rack mounted on the cylindrical housing and extending in parallel with the axis of the rotary shaft assembly, a second rack securely mounted on the body in parallel with the first rack; and, a pinion positioned between and engaged with the first and second racks.

Rotary cutting apparatus

A hand-held endless belt abrading machine comprises a base portion and a main portion, which portion is rotatable relative to the base portion around an axis extending in a forward and rearward direction of the abrading machine. The main portion comprises an air motor having a rotational shaft extending in a direction transverse to the abrading machine and projecting from the left end of the air motor, so that an abrading endless belt assembly drivingly connected to the output shaft is positioned to the left relative to the motor and the base portion which is held by a hand of an operator. When a left-handed person uses the abrading machine, the main portion is turned 180&#xb0; relative to the base portion to shift the abrading endless belt assembly to the right relative to the base portion, thereby enabling the operator to readily observe the abrading belt assembly in operation.

Hand-held endless belt abrading machine

Air-driving belt sander

Loop cutter

Portable belt sander

Growing community of inventors

Tokyo, Japan

Takashi Chiba