Denka Company Limited

Takashi Aizawa

Shogo Hagiwara

Uichiro Yamagishi

Naoki Kobayashi

Yuhei Ishigaki

Wataru Nishino

Suguru Onuki

Kosuke Fujimoto

To provide a block copolymer that includes an aromatic vinyl compound polymer and a chloroprene polymer, has a number average molecular weight of 100,000 or more, is preferred for a rubber composition and an adhesive composition, and is suitable for industrial production. A block copolymer includes at least one aromatic vinyl compound polymer block and at least one chloroprene polymer block, has a functional group with a structure represented by Chemical Formula (1) or (2), and has a number average molecular weight of 100,000 or more. The chloroprene polymer block has a number average molecular weight of 80,000 or more in total. (In Chemical Formula (1), Ris hydrogen, chlorine, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclyl group.)

Block copolymer and method for producing block copolymer

Growing community of inventors

Itoigawa, Japan

Takashi Aizawa