Nippon Zeon Company, Ltd.

Takao Suzuki

Fusayoshi Sakurai

Haruo Ueno

Tatsuo Usui

Tomohiro Shibuya

Ichiro Konishi

Atsuhiro Kanzaki

A photosensitive composition is provided, which comprises (A) 20-65 wt. parts of an elastomer, (B) 35-80 wt. parts of a hydrophilic copolymer consisting essentially of, based on the weight of the copolymer, (1) 1-30 wt. % of units of a phosphorus-, boron- or sulfur-containing monoethylenically unsaturated monomer, (2) 0.5-25 wt. % of units of a phosphorus-, boron- or sulfur-containing diethylenically unsaturated monomer, (3) 40-90 wt. % of units of a conjugated diene monomer, and (4) 0-58.5 wt. % of units of other copolymerizable monomer; the total amount of the elastomer (A) and the hydrophilic copolymer (B) being 100 wt. parts, (C) 5-100 wt. parts of a photopolymerizable ethylenically unsaturated monomer, and (D) 0.1-10 wt. parts of a photopolymerization initiator. The photosensitive composition is useful for the preparation of a flexographic printing plate.

Photosensitive composition from copolymers of ethylenic phosphorous

A photosensitive composition which comprises

Photosensitive composition and photosensitive rubber plate

Photosensitive elastomer composition and photosensitive rubber plate

Photosensitive composition, photosensitive rubber plate and process for

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Narashino, Japan

Takao Suzuki