Toshiba Memory Corporation

Kioxia Corporation

Takao Sueyama

Tomoko Fujiwara

Keiko Kaneda

Yosuke Komori

Michiko Ego

Michiko Tsumura

A semiconductor device according to the present embodiment comprises a first metallic line. The first metallic line is provided above a substrate and extends in a first direction with a first width. At least one second metallic line is connected to the first metallic line and extends in a second direction from the first metallic line with a second width that is smaller than the first width. A dummy metallic line is arranged adjacently to the at least one second metallic line, connected to the first metallic line, and extends in the second direction from the first metallic line. The dummy metallic line is not electrically connected to lines other than the first metallic line.

Semiconductor device

A testing apparatus according to an embodiment includes a chamber, a probe card including probes exposed in the chamber, a stage supporting a test target object in the chamber, a moving mechanism to move the stage between a testing position where the test target object is in contact with the probes and a cleaning position where the test target object is arranged away from the probes in a horizontal direction, and an air tube introducing first dry air into the chamber through the probe card when the stage is placed at the cleaning position.

Testing apparatus

A semiconductor memory device includes an n-type source/drain formed in a surface region of a p-type active region, and a gate. The semiconductor memory device also includes a withstand voltage improvement layer provided with a preset distance maintained from at least one end of the source/drain. N-type impurities are diffused in the withstand voltage improvement layer, and a withstand voltage improvement voltage is applied to the withstand voltage improvement layer to expand a depletion layer to reach the source/drain, so that the maximum withstand voltage value of a transistor is increased.

A probe card includes a probe; and a probe card substrate which includes a first member and a second member, the first member having a first surface provided with the probe and the second member having a second surface surrounding the first surface, wherein a direction of the first surface is different from a direction of the second surface.

Growing community of inventors

Yokohama, Japan

Takao Sueyama