Fuji Photo Film Company, Limited

Toyota Jidosha Kogyo Kabushiki Kaisha

Takao Masuda

Shinpei Ikenoue

Nobuyoshi Sekikawa

Kenji Sashihara

Yasuhiro Noguchi

Nobuo Suzuki

Toshinao Ukai

Keiichi Adachi

Tadao Shishido

Isamu Itoh

Harumi Katsuyama

Yoshiaki Suzuki

Hideo Sato

Ken Kawata

Akira Ogawa

Akira Sato

Masato Satomura

Yuji Mihara

Hiroshi Yamashita

Nobuo Sakai

Toshiharu Tanaka

Yoshimasa Aotani

Itsuo Fujiwara

Yuzo Iwata

Kinji Ohkubo

Tomoyuki Kobayashi

Shinichi Sakawaki

Shinpei Ikenque

Shinpei Ikienoue

Misao Awata

A heat-developable photosensitive material is disclosed having a high image sharpness. The material is comprised of a heat-developable photosensitive layer which includes an organic silver salt, a photocatalyst, and a reducing agent. An antihalation layer is provided on the opposite face of the material with respect to the side intended for imagewise exposure. The antihalation layer contains a photosensitive halogen-containing compound which reduces the pH of the antihalation layer by photolysis and is colored with a dye which causes a change of color when the pH of the antihalation layer is reduced.

Heat-developable photosensitive material with antihalation layer

A heat-developable photosensitive material is described comprising a heat-developable photosensitive layer containing at least an organic silver salt, a photocatalyst, and a reducing agent, wherein the improvement is an antihalation layer comprising a light bleachable colored composition composed of at least (1) a photosensitive halogen-containing compound, and (2) a merocyanine dye, provided on the opposite side of said heat-developable photosensitive layer with respect to the side intended for imagewise exposure.

Heat developable photosensitive material

A thermally developable light-sensitive material comprising a support having provided therein or thereon at least one layer containing at least (a) an organic silver salt, (b) light-sensitive silver halide or a component capable of forming a light-sensitive silver halide, and (c) a reducing agent, the support further having provided therein or thereon at least one layer containing (d) at least one thiosulfonic acid. In a highly preferred embodiment, (e) one or more benzotriazoles are also present.

Thermally developable light-sensitive materials

A thermally developable light-sensitive element comprising a support having in one or more layers thereon at least (a0) an organic silver salt, (b) light-sensitive silver halide grains and (c) a reducing agent, wherein the average grain size of the light-sensitive silver halide grains is not less than about 0.05 .mu. and the support is gas permeable and, in addition, carries thereon a subbing layer composed of at least one copolymer selected from the group consisting of a vinyl chloride type copolymer in which vinyl chloride is present in the copolymer in an amount of about 50 molar % or higher and a vinylidene chloride type copolymer in which vinylidine chloride is present in the copolymer in an amount of about 50 molar % or higher. The thermally-developable light-sensitive element of the invention is highly sensitive and in addition, has a good storage stability retaining on storage the properties possessed by the 'fresh' photosensitive element even under high humidity and/or high temperature conditions.

Thermally-developable light-sensitive elements

A thermally developable light sensitive material which comprises: (a) an organic silver salt; (b) a photocatalyst and (c) a reducing agent in a support or in one or more layers provided on the support additionally comprises (d) at least one cerium compound selected from trivalent and/or tetravalent cerium compounds in the support and/or in one or more of the above layers. An improvement in various characteristics such as a long green shelf life, a high degree of whiteness, low thermal fog, high sensitivity and so on is obtained.

Thermally developable light sensitive material using trivalent and

A heat-developable light-sensitive material comprising on a support at least one layer containing (a) an organic silver salt; (b) a light-sensitive silver halide; (c) a reducing agent; and (d) a binder; wherein the light-sensitive silver halide component (b) comprises the reaction product obtained by decomposing an N-halo compound in the presence of the organic silver salt (a) for reaction with the organic silver salt (a) before applying the layer on the support and an embodiment includes a heat-developable light-sensitive material in which the N-halo compound is decomposed in the presence of an alcohol to form the light-sensitive silver halide component (b).

Heat-developable light-sensitive material

In a process for producing thermally developable light-sensitive composition which comprises heating a composition containing (a) an organic silver salt and (b) a light-sensitive silver halide, the improvement wherein the heating is conducted in the presence of (c) a sulfur-containing compound.

Process for producing heat developable light-sensitive compositions and

In a method of producing a composition for use in thermally developable light-sensitive photographic elements comprising mixing: a composition comprising (a) an organic silver salt and (b) a light-sensitive silver halide, and (c) a reducing agent; the improvement wherein (b) is prepared by allowing a light-sensitive silver halide-yielding component to react with (a) in the presence of (d) an imino compound. The elements so produced are also described.

Method of producing light-sensitive composition for use in thermally

A heat developable light-sensitive material comprising a support carrying at least one layer containing at least (a) an organic silver salt, (b) a light-sensitive halide or a light-sensitive silver halide-forming component, (c) a reducing agent and (d) phthalazinone, and which further has on another surface of the support opposite the above layer one layer containing a compound comprising a ##STR1## moiety, wherein M represents a hydrogen atom or a monovalent metal atom. The material shows improved retention of its as manufactured properties, especially in the superposed state.

Heat developable light-sensitive materials

A process for preparing a composition for use in a thermally developable light-sensitive material which comprises reacting (a) an organic silver salt with (b) a halogen atom-releasing compound to form a mixture of the organic silver salt and a silver halide wherein the reaction of components (a) and (b) is carried out while controlling the oxidation-reduction potential of the reaction solution. Silver halide grains of a uniform grain size and a narrow grain size distribution can be obtained, and, after (c) a reducing agent is added to the composition, the resulting composition can be used to produce a thermally developable light-sensitive material having superior sensitivity and contrast.

Process for preparing a composition for a thermally developable

A thermally developable light-sensitive material wherein heat fog is prevented comprising a support having therein or in one or more layers thereon (a) an organic silver salt, (b) a photo catalyst and (c) a reducing agent and containing (d) a phthalimide having at least one electron-attracting substituent, such as a halogen atom or an acyl group.

Thermally developable light-sensitive material having reduced fog

A thermally developable light-sensitive material comprising a support having therein or in at least one layer thereon (a) an organic silver salt, (b) a photocatalyst, and (c) a reducing agent, and additionally (d) at least one 1,2,4-triazole compound.

Thermally developable light-sensitive material

A process for preparing slightly soluble silver salt grains by mixing a solution or dispersion of a silver salt forming agent as a first liquid with a solution or dispersion of a silver ion-providing agent as a second liquid while controlling the electrode potential of the mixture of the first liquid and the second liquid using a measuring electrode and a reference electrode to produce the slightly soluble silver halide grains of specific characteristics depending upon the control of the electrode potential, the improvement which comprises the reference electrode comprising an internal electrode of a metal immersed in an internal solution of a metal salt of the metal of the internal electrode and an electrolyte, which metal salt and electrolyte do not release halide ions in the same liquid present as the major component in either of the first liquid or the second liquid.

Process for preparing slightly soluble silver salt grains

A heat-developable photosensitive material which comprises a support having thereon at least one layer containing (a) an organic silver salt, (b) a catalytic amount of a photosensitive silver halide or a compound which forms a photosensitive silver halide, (c) a reducing agent, and (d) at least one sensitizer selected from the group consisting of compounds represented by the formulae (I) and (II): ##STR1## wherein R represents an unsubstituted or substituted alkyl group having 1 to 4 carbon atoms or an aryl group; and Q represents a group of atoms necessary to complete a rhodanine nucleus, a thiohydantoin nucleus or a 2-thio-2,4-oxazolidine-dione nucleus and wherein said compound represented by the formulae (I) and (II) include at least one carboxyl group as a substituent, and (e) a binder.

Heat-developable photosensitive materials

A thermally developable light-sensitive material with improved storage stability and a minimized thermal fog without an increase in both light discoloration and dark discoloration which comprises a support and having therein or in at least one layer thereon at least (a) an organic carboxylic acid silver salt comprising about 50 mol% or more of silver behenate, (b) a photocatalyst and (c) a reducing agent, and with the material containing (d) at least one compound (1) represented by the following general formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3, which may be the same or different, each represents a hydrogen atom or a substituent selected from the group consisting of a nitro group, a cyano group and a halogen atom, with the proviso that R.sub.1, R.sub.2 and R.sub.3 are not all simultaneously a hydrogen atom, and (2) having a half-neutralization point of from about 40 mV to about 140 mV above the half-neutralization point of benzoic acid in isopropanol.

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Asaka, Japan

Takao Masuda