Tokyo Electron Limited

Daiichi Sankyo Company, Limited

Nec Corporation

Takao Horiuchi

Yoshifumi Tahara

Izumi Arai

Jun Watanabe

Keisuke Suzuki

Akira Nakao

Yoshito Hamada

Osamu Kanno

Daisuke Honma

Nobuaki Adachi

Tomonori Yamasaki

Keiji Nakamura

Katsuhiro Kawakami

Sadayuki Takahashi

Kunio Yamada

Hiroshi Takeshita

Junichi Kuroyanagi

Syozo Kobayashi

Yuichi Sugimoto

Issei Achiwa

Atsushi Hara

Kazuo Kanai

The present invention provides a compound having a particular chemical structure or a pharmacologically acceptable salt thereof which has an excellent inhibitory effect on EZH1 and/or EZH2 activity. The present invention provides a compound having a 1, 3-benzodioxole structure represented by the general formula (I) or a pharmacologically acceptable salt thereof, or a pharmaceutical composition comprising the compound (wherein R, R, R, R, R, R, and V in the formula (I) are each as defined in the present specification). 

1,3-benzodioxole derivative

The present invention provides a compound having a particular chemical structure or a pharmacologically acceptable salt thereof which has an excellent inhibitory effect on EZH1 and/or EZH2 activity. The present invention provides a compound having a 1,3-benzodioxole structure represented by the general formula (I) or a pharmacologically acceptable salt thereof, or a pharmaceutical composition comprising the compound (wherein R, R, R, R, R, R, and V in the formula (I) are each as defined in the present specification). 

A 1,6-&#x3b2;-glucan synthetase inhibitor is provided, having potent growth inhibition and having excellent safety. A compound is provided, capable of expressing in a wide spectral range and specifically or selectively, an antifungal effect based on its functional mechanism of 1,6-&#x3b2;-glucan synthesis inhibition. Also provided is a drug, a salt or hydrate thereof, especially an antifungal that contains the compound. Concretely, provided is a compound of the following formula (I), its salt or hydrate, and a drug or antifungal containing, as the active ingredient, the compound, its salt or hydrate: 

Antifungal bicyclic hetero ring compounds

An etching method comprises the steps of setting a substrate to be processed above the surface of a first electrode opposed to a second electrode within a vacuum container, with a clearance formed between the surface of the first electrode and the substrate, supplying a cooling gas to the electrodes with a predetermined flow rate and a pressure, supplying a process gas into the vacuum container, changing the process gas to a plasma, by applying a predetermined electric power across the electrodes, and etching the substrate by means of the plasma of the process gas.

Method for cooling a plasma electrode system for an etching apparatus

An etching apparatus has a method for stopping the generation of plasma responsive to the detection of poor cooling of a block electrode, which is provided with an electrode, to prevent the electrode from being cracked because of the thermal expansion of both electrodes so as to reduce the times of electrode exchange. The present invention also provides an etching method including a process of controlling the flow rate and pressure of a cooling gas supplied to a clearance between a substrate to be processed and a block electrode on which the substrate is mounted, so as to enable uniform etching to be applied to the substrate.

Cooling of a plasma electrode system for an etching apparatus

A mounting surface of an electrode for mounting an object to be processed thereon is projected to be a curved surface identical to a curved surface obtained by deforming the object to be processed by a uniform load, and etching of the object to be processed is performed. Etching of the object to be processed can be easily and stably performed, thereby improving yield and productivity.

Etching method and etching apparatus

In a device of the type of an Inchworm Translator as called by Burleigh Instruments, Inc., N.Y., an electromechanical driver for a shaft of the device comprises a plurality of electrostrictive layers stacked longitudinally of the driver with internal electrodes interposed. Preferably, each gripper or clamper for the shaft is of a like structure and comprises a pair of external electrodes on an outer peripheral surface thereof. More preferably, the gripper comprises either an electrically insulating and abrasion resistive or an electrically insulating and vibration damping film which defines a cylindrical inner peripheral surface of the gripper. The film is preferably divided into a plurality of film portions. The electrostrictive layers are preferably of a composition of a formula of (1-x)Pb(Mg.sub.1/3 Nb.sub.2/3)O.sub.3.xPbTiO.sub.3 where x is about 0.35. The electrically insulating and abrasion resistive film may be of either a plastic or a ceramic material. The electrically insulating and vibration damping film may be of a ferrite composition having a logarithmic damping factor between 0.04 and 0.06.

Electromechanical translation device comprising an electrostrictive

Growing community of inventors

Tokyo, Japan

Takao Horiuchi