Kabushiki Kaisha Toshiba

Nec Corporation

The Japan Atomic Power Company

Fuji Electric Co., Ltd.

Babcock-hitachi Kabushiki Kaisha

Teikyo University

Takao Hayashi

Yasunobu Onishi

Kazuo Sato

Kenji Chiba

Rumiko Hayase

Hirokazu Niki

Naohiko Oyasato

Hiromitsu Wakabayashi

Masanobu Arai

Masataka Miyamura

Masao Yamada

Kakeru Sasaki

Takashi Shinozuka

Yasuo Osawa

An eye movement analysis system includes an image-capturing unit configured to capture a moving image including at least one of a right eye and a left eye of a subject and a comparison target on a surface of a face of the subject, and an analysis unit configured to analyze a movement of an eyeball of the at least one of the right eye and the left eye of the subject, based on a relationship between the at least one of the right eye and the left eye of the subject and the comparison target on the moving image captured by the image-capturing unit.

Eye movement analysis system, eye movement analysis method and program

There is provided a photosensitive composition suitable for a resist material. This photosensitive composition has a high sensitivity and a high resolution with respect to a light source having a short wavelength, does not cause a phase separation in a film state, and makes it possible to stably form fine resist patterns. The photosensitive composition contains a polymer obtained by protecting an alkali-soluble group of an alkali-soluble polymer by a group which is unstable with respect to an acid, a compound which generates an acid upon being irradiated with light, at least one compound which is selected from the group consisting of an imidazole compound, an alanine compound, an adenine compound, an adenosine compound, and a quaternary ammonium salt compound, and which increases miscibility in a resist film, and a phenol compound.

Photosensitive composition having uniform concentration distribution of components and pattern formation method using the same

A resist composition for forming a pattern, which comprises (a) a compound represented by the following formula (1) and satisfying the following inequalities, ##STR1## wherein R.sup.1 is hydrogen atom or methyl group, R.sup.2 is a monovalent organic group, m is 0 or a positive integer, n is a positive integer, and m and n satisfying a condition of 0.03.ltoreq.n/(m+n).ltoreq.1, (b) a compound capable of generating an acid when irradiated with light, and (c) 4-phenylpyridine, wherein a weight-average molecular weight, Mw and a number-average molecular weight, Mn satisfy the following inequality, 4,000.ltoreq.Mw.ltoreq.50,000, 1.10.ltoreq.Mw/Mn.ltoreq.2.50 (Mw and Mn respectively represent value converted in styrene).

Resist composition for forming a pattern and method of forming a pattern

A resist composition for forming a pattern, which comprises (a) a compound represented by the following formula (1) and satisfying the following inequalities, ##STR1## wherein R.sup.1 is hydrogen atom or methyl group, R.sup.2 is a monovalent organic group, m is 0 or a positive integer, n is a positive integer, and m and n satisfying a condition of 0.03.ltoreq.n/(m+n).ltoreq.1, (b) a compound capable of generating an acid when irradiated with light, and (c) a nitrogen-containing compound, wherein a weight-average molecular weight, Mw and a number-average molecular weight, Mn satisfy the following inequality, 4,000.ltoreq.Mw.ltoreq.50,000, 1.10.ltoreq.Mw/Mn.ltoreq.2.50 (Mw and Mn respectively represent value converted in styrene).

Resist composition for forming a pattern comprising a pyridinium

Disclosed is a method of checking a test program in a duplex processing apparatus including two processors connected to each other through a failure acknowledge line and an interprocessor communication line and constituting an active system and a standby system, main memories connected to the two processors through buses, respectively, a queue connected to the buses which connect the processors to the main memories, and bus arbitors for controlling contention of a bus occupy right on the buses. In this method, normality of the test program is checked from an execution address of the test program executed by the standby processor under the control of the active processor.

Method of checking test program in duplex processing apparatus

A high temperature reactor has a downflow type nuclear reactor provided at the top portion thereof with a gas inlet and a plurality of steam generators provided around the nuclear reactor. The steam generator has a heat insulation tube provided vertically from the bottom portion of the nuclear reactor to a level higher than the top gas inlet of the reactor, a heat exchanger provided in a descending gas flow path formed around the heat insulation tube, and a gas circulator provided at the bottom portion thereof for feeding a gas coolant to the gas inlet of the nuclear reactor, whereby said gas coolant, after being used for cooling the reactor core, delivered from the bottom portion of the reactor, flows into the heat insulation tube, flows upward to the top portion of the tube, is reversed in direction at the top end of the tube, then flows downward through the descending gas flow where the heat exchanger is provided, and is then recycled to the gas inlet flow path of the reactor by the gas circulator.

High temperature reactor having an improved fluid coolant circulation

A multi-region reactor core pebble bed high temperature gas reactor comprises a pebble bed reactor core housed within a pressure vessel and charged with spherical fuel. The reactor core is surrounded by a reflector wall comprising a partition wall which partitions the reactor core into a plurality of reactor core sub-regions. The reflector wall comprises a plurality of layers of reflector blocks, adjacent blocks of a layer being secured against one another by removable tapered keys wedged therein between.

Multi-region reactor core pebble bed high temperature gas reactor

In a subscriber line interface circuit of a telephone switching system, a differential amplifier (1) is coupled through the line terminals (T, R) of a two-wire subscriber line for detecting a voltage difference developed thereacross. First and second resistances (8, 9) of equal values are coupled at their first ends to the line terminals, respectively. Tip and ring drivers (2, 3) are connected to the other end of first and second resistances for driving the load impedance of the subscriber line. First, second and third feedback loops (f.sub.1, f.sub.2, f.sub.3) are provided, the first feedback loop being coupled from an output of differential amplifier (1) to the input of the drivers (2, 3) vary the impedance characteristics of the first and second resistances (8, 9) so that a high impedance is synthesized across each of the first and second resistances. The second and third feedback loops are also coupled from the output of differential amplifier (1) to the drivers (2, 3), each of the second and third feedback loops having a different passband frequency characteristic and having the effect of reducing the synthesized impedances to a predetermined value.

Growing community of inventors

Tokyo, Japan

Takao Hayashi