Toray Industries, Inc.

Takao Amioka

Hitoshi Nobumasa

Gentaro Ohbayashi

Kusato Hirota

Kunihisa Nagino

Takashi Sato

Takashi Arai

Michiko Minomo

Tsunenori Komori

Keitaro Sakamoto

A back sheet for a photovoltaic module includes a single substrate film and a layer C, the layer C contains an acrylic resin as a major component, the substrate film including a layer A and a layer B, wherein the layer A contains a polyester resin as a major component, contains a white pigment in an amount of 5.0% by mass to 25% by mass, has a thickness of 5 &#x3bc;m or more, and is disposed on another surface of the back sheet, and the layer B contains a polyester resin as a major component, contains a white pigment in an amount of 1.0% by mass to less than 5.0% by mass based on the total amount of the layer B, and has a thickness accounting for 70% or more of the total thickness of the back sheet. The layer C may be made of a composition of an acrylic resin having a reactive functional group, a protected isocyanate compound, and an unprotected isocyanate compound.

Solar cell back sheet and solar cell module

A plasma CVD device comprises a vacuum vessel that houses a discharge electrode plate and a ground electrode plate to which is attached a substrate for thin film formation. The plasma CVD device has an earth cover at an interval from and facing the aforementioned discharge electrode plate; the aforementioned discharge electrode plate has gas inlets and exhaust outlets (which expel gas introduced through said gas inlets) that are connected at one end to equipment supplying raw gas for thin film formation and that open at the other end at the bottom face of the aforementioned discharge electrode plate; the aforementioned earth cover has second gas inlets corresponding to the aforementioned gas inlets, and second exhaust outlets corresponding to the aforementioned exhaust outlets. The plasma CVD device has an electric potential control plate disposed at an interval from and facing the aforementioned ground cover.

Plasma CVD device and method of manufacturing silicon thin film

An optical recording medium having each of a land and a groove and comprises at least a recording layer, dielectric layers and reflection layer. Recording and erasing of data can be carried out on both land and groove by a phase change between amorphous and crystalline states. The mirror portion may have reflectance characteristics selected from at least one of a reflectance of more than 15% and no more than 35%, when in a crystalline state, and 10% or less, when in an amorphous state. Alternatively, additionally, the depth of the groove may be such as to form an optical path length equal to 1/7 to 1/5 of the wavelength of the reproducing light and the photo-absorbance of the recording layer in the amorphous phase and the photo-absorbance in the crystalline phase may satisfy the following formula, Aa-Ac.ltoreq.10 where Aa is the photo-absorbance (%) of the recording layer in the amorphous phase and Ac is the photo-absorbance (%) of the recording layer in the crystalline phase. In an optical recording method, an edge type recording system is provided on an optical recording medium in which recording and erasing are effected by a phase change between amorphous and crystalline states. Recorded marks are provided by pulse trains each comprising a number of recording power pulses and, additionally, a power pulse, after the last of the recording power pulses, of a power less than a erase power and of a duration in a range of 1.1 to 6 times the duration of the last recording power pulse.

Method for recording on optical recording media

An optical recording medium having each of a land and a groove and comprises at least a recording layer, dielectric layers and reflection layer. Recording and erasing of data can be carried out on both land and groove by a phase change between amorphous and crystalline states. The mirror portion may have reflectance characteristics selected from at least one of a reflectance of more than 15% and no more than 35%, when in a crystalline state, and 10% or less, when in an amorphous state. Alternatively, additionally, the depth of the groove may be such as form an optical path length equal to 1/7 to 1/5 of the wavelength of the reproducing light and the photo-absorbance of the recording layer in the amorphous phase and the photo-absorbance in the crystalline phase may satisfy the following formula,

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Otsu, Japan

Takao Amioka