Panasonic Corporation

Panasonic Intellectual Property Management Co., Ltd.

Panasonic Projector & Display Corporation

Takanori Yogo

Kazutoshi Onozawa

Motonori Ishii

Toshinobu Matsuno

Kimiaki Toshikiyo

Dai Shintani

Takakazu Bito

Masahiro Kasano

Michihiro Okuda

A light source device includes: a first light source that emits light of first linear polarization; a half mirror that separates emitted light from the first light source into first light traveling to a first optical path and second light traveling to a second optical path; a polarized light combination mirror that combines the first light and the second light; an optical path change element that is disposed on the second optical path and reflects the second light and guides the second light to the polarized light combination mirror; and a retardation plate that is disposed on the second optical path and converts the second light into second linear polarization inclined with respect to the first linear polarization. The optical path change element is disposed such that point images of the first light and point images of the second light on the polarized light combination mirror are alternately arranged.

Light source device and projection image display device

A light source device includes: a first light emitting device including a plurality of first solid-state light emitting elements arranged at a regular interval in a two dimensional array form; a second light emitting device including a plurality of second solid-state light emitting elements arranged at a regular interval in a two dimensional array form; and a first light combining plate including a first region and a second region, the first region transmitting first light beams emitted from the plurality of first solid-state light emitting elements of the first light emitting device, the second region reflecting second light beams emitted from the plurality of second solid-state light emitting elements of the second light emitting device. Beam arrangement of (i) the first light beams transmitted through the first light combining plate and (ii) the second light beams reflected by the first light combining plate form a closest packed array.

Light source device and projection display apparatus

A zoom lens system having a plurality of lens units, each lens unit being composed of at least one lens element, the zoom lens system, in order from an object side to an image side, comprising: a first lens unit having negative optical power and being composed of at least two lens elements; and a second lens unit having positive optical power, wherein in zooming from a wide-angle limit to a telephoto limit at the time of image taking, the lens units are individually moved along an optical axis to vary magnification such that an interval between the first lens unit and the second lens unit decreases, and the conditions: f/D&#x3e;7.5 and Z=f/f&#x3e;4.0 (f: a focal length of the entire system at a wide-angle limit, f: a focal length of the entire system at a telephoto limit, D: a center thickness of a lens element located on the most object side in the first lens unit) are satisfied; an imaging device; and a camera.

Zoom lens system, imaging device and camera

The present invention relates to an imaging unit including an imaging device for performing photoelectric conversion. There is provided an imaging unit with which the mechanical strength of an imaging device can be ensured while allowing light to pass through the imaging device so as to improve the usability in various operations using the imaging device. An imaging unit () includes a substrate (), a light-receiving portion () provided on the substrate (), an imaging device () configured to photoelectrically convert light received by the light-receiving portion () into an electric signal while light is allowed to pass through the imaging device (), and a glass substrate () bonded to the imaging device () and allowing light to pass therethrough.

Imaging unit

An imaging apparatus capable of performing phase difference detection while allowing light to enter an imaging device is provided. An imaging unit () includes an imaging device () configured to perform photoelectric conversion on received light and allow light to pass therethrough and a phase difference detection section () configured to perform phase difference detection on received light which has passed through the imaging device (). The imaging device () includes a color-purpose light receiving section (, . . . ) including color filters () and configured to obtain color information and an brightness-purpose light receiving section (, . . . ) configured to obtain brightness information and receive a larger amount of light than the color-purpose light receiving section (, . . . ). The phase difference detection section () performs phase difference detection on received light which has passed through at least the brightness-purpose light receiving section (, . . . ).

Imaging apparatus

The phase shift mask according to the present invention is a phase shift mask for manufacturing a semiconductor device. The phase shift mask includes a light-blocking portion, a light-transmitting portion, a phase shift portion, and an auxiliary pattern portion, the light-blocking portion, the light-transmitting portion, the phase shift portion, and the auxiliary pattern portion being concentrically arranged, wherein a width of the auxiliary pattern portion in a radius direction is less than a width of the light-transmitting portion and a width of the phase shift portion in a radius direction. Furthermore, it is possible that a phase of exposure light which passes through an auxiliary pattern portion is opposite to a phase of exposure light which passes through a light-transmitting portion or a phase shift portion, the light-transmitting portion or the phase shift portion being the closest to the auxiliary pattern portion.

Phase shift mask and method for manufacturing light-collecting device

The present invention provides a method of manufacturing a lens, in which the method includes exposing a photoresist to light using a phase shift mask. Here, the phase shift mask includes layout portions respectively corresponding to pixels and lens, in which each of the layout portions has: a light-blocking portion which has a shape of a substantially circle or a substantially concentric zone; a light-transmitting portion which has a shape of a substantially circle or a substantially concentric zone; a phase shift portion which has a shape of a substantially circle or a substantially concentric zone; and a light-blocking frame. Furthermore, the light-transmitting portion, the light-blocking portion and the phase shift portion are arranged alternately so as to form concentric circles, and the light-blocking frame corresponds to a whole or a part of a perimeter of the lens.

Manufacturing method of light-collecting device, light-collecting device and phase shift mask

A solid-state imaging device which includes a color filter having excellent color reproduction, a manufacturing method thereof and a camera are provided. A color filter in a solid-state imaging devicehaving an optical film thickness of approximately &#xbc; of a set wavelength &#x3bb;, being sandwiched by a third layer and a fourth layer which are spacer layers in which only 3 layers are laminated and which consist of two types of layers (first layers and a second layer) with different refractive indexes, and further, having a structure that is sandwiched by a film, a first layer, which has a film thickness approximately equal to the above &#x3bb;/4. Between the two types of layers having different refractive indexes, the first layers are composed of high refractive index material, and the second layer is composed of low refractive index material. The third layer and the fourth layer have an optical film thickness according to the light which passes through, and the material film thickness of the entire color filter also differs for each color of light.

Solid-state imaging device, manufactoring method thereof and camera

The present invention provides a solid-state imaging apparatus and the like which is able to support an optical system whose incident angle is wide. Each pixel is 2.25 &#x3bc;m square in size, and includes a distributed index lens (), a color filter (for example, for green) (), an Al interconnections (), a signal transmitting unit (), a planarized layer (), a light-receiving device (Si photodiodes) (), and an Si substrate (). The two-stage concentric circle structure of the distributed index lens is formed by SiO(n=2) with the film thickness 1.2 &#x3bc;m ('grey color'), the film thickness 0.8 &#x3bc;m ('dots pattern') and the film thickness of 0 &#x3bc;m (&#x201c;without pattern: white color&#x201d;), and the medium surrounding the distributed index lens ()is air (n=1).

Solid-state imaging device with light-collecting device having sub-wavelength periodic structure, solid-state imaging apparatus and manufacturing method thereof

A solid-state imaging apparatus includes a plurality of unit pixels with associated microlenses arranged in a two-dimensional array. Each microlens includes a distributed index lens with a modulated effective refractive index distribution obtained by including a combination of a plurality of patterns having a concentric structure, the plurality of patterns being divided into line widths equal to or shorter than a wavelength of an incident light. At least one of the plurality of patterns includes a lower light-transmitting film having the concentric structure and a first line width and a first film thickness, and an upper light-transmitting film having the concentric structure configured on the lower light-transmitting film having a second line width and a second film thickness. The distributed index lens has a structure in which a refractive index material is dense at a center and becomes sparse gradually toward an outer side in the concentric structure.

Growing community of inventors

Kyoto, Japan

Takanori Yogo