Mitsubishi Denki Kabushiki Kaisha

Astellas Pharma Gmbh

Sony Corporation

Takanori Sasaki

Hiromu Sato

Katsunari Taguchi

Makoto Ohori

Shunsuke Suzuki

Mahito Sawada

Atsuo Yonezawa

Hiromichi Kobayashi

Kazuyuki Fujii

Kouichiro Tsutahara

There is a demand for a technique capable of associating pieces of tag information with each other when the pieces of tag information are assigned to object information on a social network. According to the present disclosure, there is provided an information processing device including a control unit configured to associate a plurality of pieces of tag information assigned to object information existing on a social network. Therefore, pieces of tag information can be associated with each other when the pieces of tag information are assigned to object information existing on a social network.

Information processing device and information processing method

The invention provides an anti-human IL-23R antibody having excellent activity and/or cross-reactivity compared to conventional IL-23R antibodies and methods of using the same for treating or preventing various diseases in which human IL-23R is involved in the pathogenesis of the diseases.

Anti-human IL-23 receptor antibody

[Problem] An object of the present invention is to provide an anti-human IL-23R antibody having excellent activity and/or cross-reactivity compared to conventional IL-23R antibodies, and means for using the antibody to prevent or treat various diseases such as ophthalmic disease, inflammatory bowel disease, or psoriasis in which human IL-23R is involved in pathogenesis. [Means for Solution] An anti-human IL-23R antibody comprising a heavy-chain variable region consisting of the amino acid sequence shown by SEQ ID NO:10 or 14 and a light-chain variable region consisting of the amino acid sequence shown by SEQ ID NO:6 or 18.

Anti-human IL-23 receptor antibody and encoding polynucleotides

There is described a semiconductor device which has an isolation region, the isolation region being polished by means of chemical-and-mechanical polishing, and which prevents occurrence of variations in a finished state of active regions even in a case where a large isolation area is present. An isolation region for separating active regions is formed on a semiconductor wafer. An annular dummy pattern is formed in an inactive region of greater than a predetermined size, so as to surround the isolation region. An isolation region is ensured between the active regions surrounding the inactive region and the dummy pattern.

Semiconductor device, and method of manufacturing the same

A method of manufacturing a semiconductor device using a polishing apparatus is provided. A top ring holding a wafer is arranged on a pad. A polishing chemical liquid supply line for supplying a polishing chemical liquid is arranged above the pad in a direction ahead of rotation with respect to the top ring. Around the center of rotation of the pad, a partition plate having a columnar side surface is arranged. Above the pad on a side which goes away from the top ring when the pad is rotated, a polishing chemical liquid draining mechanism is arranged extending continuously from the partition plate to the outer periphery of the pad. Accordingly, a polishing apparatus is obtained by which the amount of polishing of the surface to be polished of the semiconductor substrate is stabilized and generation of microscratches on the surface to be polished can be suppressed.

Growing community of inventors

Tokyo, Japan

Takanori Sasaki