Jsr Corporation

Takanori Kawakami

Yasuhiko Matsuda

Hiromitsu Nakashima

Kazuki Kasahara

Yuusuke Asano

Masafumi Hori

Makoto Sugiura

Kazuo Nakahara

Yoshifumi Oizumi

Tomoki Nagai

Yukio Nishimura

Tsutomu Shimokawa

Makoto Shimizu

Norihiko Ikeda

Hayato Namai

Eiji Yoneda

Takuma Ebata

Noboru Otsuka

Mitsuo Satou

Takehiko Naruoka

Ken Maruyama

Yusuke Asano

Mitsuo Sato

Tomohisa Fujisawa

Yuko Kiridoshi

Yukari Hama

A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. Rrepresents an alkali-labile group. A represents an oxygen atom, &#x2014;NR'&#x2014;, &#x2014;CO&#x2014;O&#x2014;or &#x2014;SO&#x2014;O&#x2014;, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R&#x2032; represents a hydrogen atom or an alkali-labile group, and '#' and '##' each indicate a bonding hand bonded to R.-A-R&#x2003;&#x2003;(x).

Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound

A photoresist composition containing (A) a polymer having a structural unit (I) that includes an acid-labile group, and (I) a compound represented by the following formula (1). In the following formula (1), R, R, Rand R represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. X represents a single bond, an oxygen atom or &#x2014;NR&#x2014;. Rrepresents a hydrogen atom, a hydroxy group or a monovalent organic group having 1 to 20 carbon atoms, and optionally taken together represents a ring structure by binding with R each other. Arepresents &#x2014;SOor &#x2014;CO. Mrepresents a monovalent onium cation. 

Photoresist composition, compound, and production method thereof

A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer has a structure unit represented by a following formula (1-1), a structure unit represented by a following formula (1-2), or both thereof, and has a content of fluorine atoms of no less than 5% by mass to a total mass of the first polymer. The second polymer has an acid-dissociable group, and has a content of fluorine atoms of less than 5% by mass to a total mass of the second polymer. 

Radiation-sensitive resin composition, polymer and method for forming a resist pattern

A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. Rrepresents an alkali-labile group. A represents an oxygen atom, &#x2014;NR'&#x2014;, &#x2014;CO&#x2014;O&#x2014;or &#x2014;SO&#x2014;O&#x2014;, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R&#x2032; represents a hydrogen atom or an alkali-labile group, and '#' and '##' each indicate a bonding hand bonded to R. 

A radiation-sensitive resin composition includes a compound represented by a following formula (1), and a first polymer that serves as a base resin. Rrepresents a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or the like. The Mrepresents a monovalent cation. The first polymer (B) is preferably insoluble or hardly soluble in alkali, the polymer including a structure unit represented by a formula (5) or a structure unit represented by a formula (6), and a structure unit represented by a formula (7). 

Radiation-sensitive resin composition

The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. Rrepresents a hydrogen atom, a methyl group or a trifluoromethyl group. Rrepresents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. Rrepresents a hydrogen atom or a monovalent organic group. 

Radiation-sensitive resin composition, polymer, and method for forming resist pattern

A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein Rand Rrepresent a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, Rrepresents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X represents a hydrogen atom, a hydroxyl group, or an acyl group, m represents an integer from 1 to 18, and n represents an integer from 4 to 8.

A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. Rrepresents an alkali-labile group. A represents an oxygen atom, &#x2014;NR'&#x2014;, &#x2014;CO&#x2014;O&#x2014;or &#x2014;SO&#x2014;O&#x2014;, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R&#x2032; represents a hydrogen atom or an alkali-labile group, and '#' and '##' indicates a bonding hand bonded to R.-A-R&#x2003;&#x2003;(x)

A radiation-sensitive resin composition includes a first polymer that includes a repeating unit having an acid-labile group and becomes alkali-soluble upon dissociation of the acid-labile group, and a radiation-sensitive acid-generating agent. The acid-labile group has a structure shown by a general formula (1). Rrepresents a methyl group or the like, Rrepresents a hydrocarbon group that forms a cyclic structure, Rrepresents a fluorine atom or the like, Rrepresents a carbon atom, and nis an integer from 1 to 7. 

Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer

A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, a radiation-sensitive acid generator, and a solvent. The acid-dissociable group-containing resin includes a copolymer containing a repeating unit. The reparing unit includes an acid-dissociable group-containing repeating unit in an amount of more than about 55 mol % of a total amount of the repeating units in the copolymer. A content of the copolymer in the acid-dissociable group-containing resin is about 90 mass % or more of a total amount of the acid-dissociable group-containing resin.

A compound is shown by the following formula (5) in which at least one of Rgroups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A' represents a substituted or unsubstituted, linear or branched alkylene group having 1 to 20 carbon atoms, an alkylene group having at least one hetero atom, or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mrepresents an onium cation, m represents a natural number of 1 to 3, and p represents a natural number of 1 to 8. 

Sulfonium compound

A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2), wherein Rrepresents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the Rs represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mrepresents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8.

Growing community of inventors

Tokyo, Japan

Takanori Kawakami