Shin-etsu Chemical Co., Ltd.

Takanobu Tsudera

Takayuki Honma

Shuji Tanaka

Hiromi Nishiwaki

Daisuke Iwai

Tohru Kubota

Ayumu Kiyomori

Kazuhiro Hirahara

A method for producing an isocyanate group-containing siloxane compound is provided. In this method, a halogenated siloxane compound represented by the following general formula (1): or the following general formula (2) wherein R, R, R, and Rare independently hydrogen atom, a monovalent hydrocarbon group containing 1 to 8 carbon atoms, or a siloxy group represented by OSiRRRwherein R, R, and Rare a monovalent hydrocarbon group containing 1 to 8 carbon atoms, X is a halogen atom, n is an integer of 1 to 10, a is 0, 1, or 2, and b is an integer of 2 to 9; is reacted with a cyanate salt represented by the following general formula (3):M(OCN)&#x2003;&#x2003;(3)wherein M represents an alkali metal or an alkaline earth metal, and m is 1 or 2. The isocyanate group-containing siloxane compound produced is represented by the following general formula (4): or the following general formula (5): wherein R, R, R, R, n, q, and a are as defined above.

Method for producing isocyanate group-containing siloxane compound

High-purity trimethylaluminum has the following impurity contents: organosilicon components&#x2266;0.5 ppm, chlorine components&#x2266;20 ppm, hydrocarbon components&#x2266;1,000 ppm, Ca&#x2266;0.05 ppm, Fe&#x2266;0.05 ppm, Mg&#x2266;0.05 ppm, Na&#x2266;0.05 ppm, Si (Si components other than the organosilicon components)&#x2266;0.07 ppm, Zn&#x2266;0.05 ppm, and S&#x2266;0.05 ppm. The high-purity trimethylaluminum can be obtained by removing impurities from crude trimethylaluminum through distillation and evaporation.

High-purity trimethylaluminum and purification method of crude trimethylaluminum

A method of purifying an organometallic compound comprising

Purification method for organometallic compounds and organometallic compounds obtained therefrom

A contaminated Group III metal hydrocarbon is purified by providing an adduct of Group III metal hydrocarbon with a Lewis base in a solvent having a boiling point which is up to 200&#xb0; C., but at least 30&#xb0; C. higher than the boiling point of the Group III metal hydrocarbon, separating the solvent from the adduct, and heating the adduct for thermal dissociation, thereby releasing the Group III metal hydrocarbon in high purity form.

Purification of metal hydrocarbon

An organometallic compound vaporizing and feeding system includes a carrier gas feed passageway connecting a carrier gas source to a container containing an organometallic compound MO and having a carrier gas mass flow controller, an MO gas passageway connecting the container to an in-line monitor for transporting the MO gas, a sample gas passageway connecting the in-line monitor to a sample inlet of an ICP spectrometer, a standard gas passageway connecting a gas cylinder filled with a calibration standard gas to the sample gas passageway and having a standard gas mass flow controller, and a diluent gas passageway connected to the standard gas passageway for passing a diluent gas for adjusting the concentration of the standard gas and having a diluent gas mass flow controller.

Organometallic compound vaporizing/feeding system

Trialkylgallium is prepared by reacting a gallium halide or alkyl gallium with trialkylaluminum in a solvent having a boiling point which is at least 10&#xb0; C. higher than the boiling point of the trialkylgallium, such as mesitylene or o-dichlorobenzene. High purity alkyl gallium is obtained in high yields.

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Joetsu, Japan

Takanobu Tsudera