Tokin Corporation

Takanobu Tanabe

Yuichi Tokano

Tsugio Takeda

Ryoji Muramatsu

A system comprises a substrate 4, an incident optical waveguide 5 formed on the substrate for receiving a light beam incident thereto, two phase-shift optical waveguides 6 formed on the substrate 4 to be branched from the incident optical waveguide 4 for varying a phase of a transmitted light beam in response to an electric field intensity, an outgoing optical waveguide 7 formed on the substrate 4 to join the phase-shift optical waveguides 6. At least one of the phase-shift optical waveguides 6 has a reversely polarized portion 8 reversely polarized. A light transmission film may be formed at one or a plurality of portions on the phase-shift optical waveguides 6. A buffer layer 14 may be formed on a part on or in the vicinity of the phase-shift optical waveguides 6. A transparent substance film for imparting a stress to one of the phase-shift optical waveguides 6 may be formed on a part or a whole of a portion without the buffer layer 14. A stress imparting member may be formed to impart a stress to a part of one of the phase-shift optical waveguides 6. A light irradiation unit 26 may be formed to irradiate a light beam onto a part or a whole of one of the phase-shift optical waveguides 6.

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Sendai, Japan

Takanobu Tanabe