Canon Kabushiki Kaisha

Takamitsu Komaki

Toshiki Iwai

Tadao Nakamura

Yasuyuki Unno

Nozomu Hayashi

Kiyohito Yamamoto

Takashi Shibayama

Kenji Yaegashi

Yoshiyuki Usui

Tomokazu Taki

Tooru Kawashima

A detector that detects relative positions of a first object and a second object in directions different from each other on a predetermined plane, includes an illumination optical system configured to illuminate a first mark provided on the first object and a second mark provided on the second object, and a detection optical system configured to detect interference light of diffracted lights from the first mark and the second mark illuminated by the illumination optical system. A light intensity distribution is formed, on a pupil plane of the illumination optical system, to illuminate the first mark and the second mark from a direction tilted with respect to a normal of the predetermined plane. A pupil plane of the detection optical system allows the interference light to pass through and block at least a part light other than the interference light.

Detector that detects relative positions of marks while blocking non-interference light

An imprint apparatus for performing an imprint process of forming a pattern of an imprint material on a substrate using a mold includes a mold holding unit that holds the mold, a stage that holds the substrate, a measurement unit that measures marks on the mold or the stage, a driving unit that brings the mold and the substrate into contact, a curing unit that cures the imprint material, and a control unit that controls various steps of the imprint process. The control unit obtains information about a difference between first and second position shift amounts obtained by measuring marks on the mold and substrate before and after performing a first imprint process, respectively. The control unit also controls the imprint apparatus to perform a second imprint process, following the first imprint process, based on the obtained information about the difference from performing the first imprint process.

Imprint apparatus and method of manufacturing article

An imprint apparatus brings an imprint material on a substrate including a first mark into contact with a mold including a second mark and cures the imprint material, thereby forming a cured product of the imprint material on the substrate. The apparatus includes a plurality of detectors used for alignment detection, and a controller configured to obtain a plurality of pieces of relative position information by detecting a relative position between the first mark and the second mark a plurality of times using the plurality of detectors in a state in which the imprint material is cured and a positional relationship between the substrate and the mold is maintained, and to calibrate, based on the plurality of pieces of relative position information, a plurality of detection processing operations each performed using each of the plurality of detectors.

Imprint apparatus and article manufacturing method

The present invention provides a measurement apparatus that measures a position of an object which includes a first mark and a second mark, comprising: an image capturing unit configured to capture the first mark and the second mark in a state in which the first mark and the second mark are contained in a field of view; and a polarizing element configured to generate different polarization directions from each other in light from the first mark and in light from the second mark which are incident on the image capturing unit.

Measurement apparatus, lithography apparatus, and method of manufacturing article

An imprint apparatus for performing an imprint process of forming a pattern of an imprint material on a substrate using a mold is disclosed. The imprint apparatus includes an adjustment unit configured to adjust a shape of the mold and a control unit configured to control the imprint process. The control unit obtains information indicating a tendency concerning a change of the shape of the mold corresponding to a use count of the mold used for the imprint process and controls the adjustment unit to correct the shape of the mold in accordance with the obtained information and a present use count of the mold. The control unit also controls the imprint apparatus to perform the imprint process after the shape of the mold has been corrected by the adjustment unit.

Provided is a position measurement apparatus in which a measurement error in a target is reduced. A position measurement apparatus measuring a position of a target includes an illumination unit configured to illuminate the target with illumination light including light of a first wavelength and light of a second wavelength different from the first wavelength, a measurement unit configured to measure the position of the target by detecting light from the target illuminated with the illumination light, and a control unit configured to adjust a ratio of a light intensity of the first wavelength to a light intensity of the second wavelength such that a measurement error varying depending on the position of the target in the measurement unit is reduced.

Position measurement apparatus, overlay inspection apparatus, position measurement method, imprint apparatus, and article manufacturing method

In an alignment apparatus, a measurement device includes an illuminator that illuminates a first original-side mark and a second original-side mark arranged in an original and a first substrate-side mark and second substrate-side mark arranged in a substrate. The measurement device performs coarse measurement based on light beams from the first original-side mark and the first substrate-side mark by causing the illuminator to illuminate the first original-side mark and the first substrate-side mark under a first condition, and performs fine measurement based on light beams from the second original-side mark and the second substrate-side mark by causing the illuminator to illuminate the second original-side mark and the second substrate-side mark under a second condition.

Alignment apparatus, alignment method, lithography apparatus, and method of manufacturing article

A measurement device for measuring a relative position between alignment marks includes an illumination unit capable of illuminating the alignment marks at a plurality of wavelengths, a detection unit that detects light from the alignment marks, a processing unit that obtain the relative position between the alignment marks, and an adjustment unit that adjusts a relative amount between light amounts of the plurality of wavelengths so that a relative value between detection light amounts of light from the alignment marks falls within a predetermined range.

Measurement device, imprint apparatus, method for manufacturing product, light amount determination method, and light amount adjustment method

A detection device includes an illumination optical system and a detection optical system. The illumination optical system is configured to illuminate a first diffraction grating having a first period in a first direction and a second diffraction grating having a second period different from the first period. The detection optical system is configured to detect light diffracted by the first and second diffraction gratings. The illumination optical system includes an optical member configured to form, on a pupil plane, a first pole and a second pole opposite to the first pole. The illumination optical system causes lights from the first and second poles to obliquely enter the first and second diffraction gratings from the first direction to illuminate the first and second diffraction gratings. The detection optical system detects diffracted light diffracted by one of the first and second diffraction gratings and by an other diffraction grating.

Detection device, imprint apparatus, planarization device, detection method, and article manufacturing method

A detection device includes an illumination optical system configured to illuminate a first alignment mark for detecting a position of an object in a first direction and a second alignment mark for detecting a position of the object in a second direction and a detection optical system configured to detect light beams from the alignment marks. The illumination optical system includes an optical element disposed at a position optically conjugate to a surface to be illuminated, and the optical element includes a region configured to form an illumination light beam for illuminating a first portion of the surface to be illuminated with a first angular distribution and a region configured to form an illumination light beam for illuminating a second portion of the surface to be illuminated with a second angular distribution.

Detection device, imprint apparatus, method of manufacturing article, illumination optical system, and detection method

An imprint apparatus for forming a pattern on an imprinting material includes an alignment unit that detects a mold-side mark formed on a mold and a substrate-side mark formed on the substrate, forming a mark pair, and aligns the mold and the substrate on the basis of a detection result. The alignment unit obtains, by using the detection result of a first mark pair and the detection result of a second mark pair, which is different from the first mark pair, positional deviation information of the first mark pair and positional deviation information of the second mark pair in the same direction; obtains a determination value by using the positional deviation information of the first mark pair and the positional deviation information of second mark pair; and determines that mark detection is abnormal when the determination value is not in an allowable range.

The present invention provides a detection apparatus for detecting a plurality of marks provided on a substrate, comprising: an optical system; an illumination unit configured to selectively illuminate the plurality of marks with a plurality of light beams via the optical system such that each of the plurality of marks is illuminated with at least one light beam; and an image capturing device configured to capture an image of the plurality of marks via the optical system, wherein the illumination unit includes a change unit configured to individually change an incident angle of each of the plurality of light beams on a pupil plane of the optical system, thereby changing an irradiated position of each of the plurality of light beams on the substrate.

Growing community of inventors

Utsunomiya, Japan

Takamitsu Komaki