Solexel, Inc.

Dainippon Screen Mfg. Co., Ltd.

Trutag Technologies, Inc.

Ob Realty, LLC

Takamitsu Inahara

Takao Yonehara

Karl-Josef Kramer

Subramanian Tamilmani

Yasuyoshi Miyaji

Noriyuki Hayashi

Mehrdad M Moslehi

Jay Ashjaee

Yasuhiro Miyaji

Tokuyuki Hayashi

This disclosure enables high-productivity fabrication of porous semiconductor layers (made of single layer or multi-layer porous semiconductors such as porous silicon, comprising single porosity or multi-porosity layers). Some applications include fabrication of MEMS separation and sacrificial layers for die detachment and MEMS device fabrication, membrane formation and shallow trench isolation (STI) porous silicon (using porous silicon formation with an optimal porosity and its subsequent oxidation). Further, this disclosure is applicable to the general fields of photovoltaics, MEMS, including sensors and actuators, stand-alone, or integrated with integrated semiconductor microelectronics, semiconductor microelectronics chips and optoelectronics.

High-throughput batch porous silicon manufacturing equipment design and processing methods

High-Throughput batch porous silicon manufacturing equipment design and processing methods

An apparatus for anodizing substrates immersed in an electrolyte solution. A substrate holder mounted in a storage tank includes a first support unit having first support elements for supporting, in a liquid-tight condition, only lower circumferential portions of the substrates, and a second support unit attachable to and detachable from the first support unit and having second support elements for supporting, in a liquid-tight condition, remaining circumferential portions of the substrates. A drive mechanism separates the first support unit and the second support unit when loading and unloading the substrates, and for connecting the first support unit and the second support unit after the substrates are placed in the substrate holder.

Anodizing apparatus

Growing community of inventors

Uji, Japan

Takamitsu Inahara