Tokyo Electron Limited

Tokyo Electron Limi Ted

Takami Fukasawa

Daisuke Hayashi

Norihiko Amikura

Masatomo Kita

Toshiaki Toyomaki

Masahiro Dogome

Ryosuke Kanamaru

A transfer device for simultaneously or separately transferring a wafer and a consumable part having a circular shape is disclosed. The consumable part is disposed in a wafer processing module, and the outer diameter of the consumable part is larger than the outer diameter of the wafer. The transfer device comprises an end effector configured to place the wafer and the consumable part thereon simultaneously or separately, an arm configured to move the end effector, and a controller configured to control the arm, to place the consumable part on the end effector such that the center of gravity of the consumable part coincides with a first position when transferring the consumable part, and to place the wafer on the end effector such that the center of gravity of the wafer coincides with a second position between the first position and front ends of the end effector when transferring the wafer.

Transfer device, transfer system, and end effector

There is provided a transfer device for transferring a substrate. The transfer device comprises a robot arm having an arm for transferring the substrate and a driving unit for rotating the arm, a first light irradiation unit configured to irradiate light along a first optical path, a first light receiving unit configured to receive the light irradiated from the first light irradiation unit, and a control device configured to control the driving unit so that the arm is rotated across the first optical path.

Transfer device and teaching method of robot arm

A substrate transfer mechanism includes a moving body, a support body supported by the moving body, first and second rotary shafts at the support body, first and second arms respectively extending from first and second rotary shafts and having first and second substrate support regions. The first arm and the second arm are disposed at different height positions. The mechanism includes a third rotary shaft rotating the support body with respect to the moving body, and a switching mechanism switching a first rotation operation of rotating the support body such that a distance in a right-left direction between the first and second substrate support region is maintained and a second rotation operation of rotating the support body together with rotation of at least one of the first and second rotary shaft such that the distance is changed between a first distance and a second distance shorter than the first distance.

Substrate transfer mechanism, substrate processing apparatus, and substrate transfer method

A storage unit of an embodiment includes a container, a rectifying plate, and an exhaust duct. The container provides a first space for storing a plurality of substrates therein, and a second space behind the first space. The rectifying plate is provided between the first and second spaces. The exhaust duct communicates with the second space. The rectifying plate has an effective region facing the first space. The effective region includes a first region and a second region. The first region faces a center of the first space. The second region extends on one side or both sides of the first region. In the first region, a plurality of through holes are formed to be distributed over the first region. The second region has a conductance lower than a conductance of the first region.

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Yamanashi, Japan

Takami Fukasawa