Canon Kabushiki Kaisha

Fujitsu Corporation

Takako Yamaguchi

Ryo Kuroda

Yasuhisa Inao

Toshiki Ito

Natsuhiko Mizutani

Toshikazu Houmura

Kazuhiro Yoshihara

Kazuma Nagaoka

Tomohiro Yamada

Yasuhiro Shimada

Mitsuhiro Ikuta

Junichi Seki

A communication terminal having one or more one-touch-dial buttons simplifies operations needed for registration of destination data such as phone numbers or mail addresses. A communication terminal (e.g., a cellular phone) having one or more one-touch-dial buttons includes a destination-data registration unit (e.g., a phone-directory database) that allows destination data such as phone numbers or mail addresses to be registered therein, a one-touch-dial registration unit that allows destination data to be registered therein so as to be associated with the one or more one-touch-dial buttons, and a control unit that, in response to an operation of the one or more one-touch-dial buttons, determines whether destination data has been registered in the one-touch-dial registration unit or the destination-data registration unit, and that outputs a result of the determination and a query message regarding registration of the destination data.

Communication terminal, and dial registration method and dial registration program therefor

Provided is a surface emitting laser manufacturing method, etc., which reduces process damage occurring to a surface relief structure, enabling stable provision of a single transverse mode characteristic. Provided is a method including a surface relief structure for controlling a reflectance in a light emitting portion of an upper mirror, the surface relief structure including a stepped structure, includes: forming a resist pattern including a pattern for forming a mesa structure and a pattern for forming a stepped structure, on or above the upper mirror, and performing first-phase etching for etching the surface layer of the upper mirror to determine the horizontal position of the stepped structure; forming a current confining structure after the performing first-phase etching; and performing second-phase etching for further etching the area that the first-phase etching has been performed, to determine the depth position of the stepped structure, after the forming a current confining structure.

Surface emitting laser manufacturing method, surface emitting laser array manufacturing method, surface emitting laser, surface emitting laser array, and optical apparatus including surface emitting laser array

A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein Rto Rare selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.

Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process

A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.

Sensor device and testing method utilizing localized plasmon resonance

Provided are a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern through fewer steps, and a method of forming a pattern using such photosensitive silane coupling agent. Used is a photosensitive silane coupling agent comprising a 1,2-naphthoquinone-2-diazido-5-sulfonyl group or a 1,2-naphthoquinone-2-diazido-4-sulfonyl group.

Photosensitive silane coupling agent, method of modifying surface, method of forming pattern, and method of fabricating device

A method of designing an exposure mask for exposing an image forming layer provided on a substrate, by use of near field light leaking from adjoining openings formed in a light blocking member. The method includes determining a width D of the openings and an opening interval of the openings to be formed in the light blocking member, in which a relation D&#x2266;(P&#x2212;W&#x2212;2T) is satisfied where T is the height of a pattern to be produced by the image forming layer, W is the linewidth of the pattern and P is the pitch of the pattern, so that an electrical field distribution, adjacent to the opening of the light blocking member as exposure light is projected on the light blocking member, is approximated to an electrical field model extending concentric-circularly with an edge of the light blocking member at an image forming layer side as a center.

Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method

Disclosed is a near-field exposure mask having a light blocking layer formed on a substrate, the light blocking layer having an opening with an opening width narrower than a wavelength of an exposure light source, wherein exposure of an object to be exposed is carried out by use of near-field light to be produced at the opening while the exposure mask and the object to be exposed are placed in contact with each other, an important feature residing in that the light blocking layer is provided by a film that contains silicon in a range from 50% to 100% in terms of mole fraction.

Near-field exposure mask, method of producing that mask, near-field exposure apparatus having that mask, and resist pattern forming method

A process for forming a resist pattern comprises the steps of applying on a substrate to form a photosensitive resist layer a photosensitive composition comprising at least one photosensitive compound having, in the molecule, two or more structural units represented by CR&#x2014;CHR&#x2014;ORor CR&#x2014;CHR&#x2014;COORwhere Ris a hydrogen atom or an alkyl group, at least one of R, R, R, R, and Ris a nitro group, and others are selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl, an alkoxy, a phenyl, a naphthyl, and an alkyl in which a part or the entire of hydrogen atoms are substituted by a fluorine atom, and Ris a substituted or unsubstituted phenylene or naphthylene group dissolved in an organic solvent, irradiating the resist layer selectively with a radiation ray, and developing a portion irradiated by the ray to form a pattern of the resist layer.

Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device production

A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein Rto Rare selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, acetoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.

A near-field exposure method including preparing a photomask for near-field exposure, having a light blocking film provided on a base material constituting a membrane portion and a support member supporting the base material, wherein a first alignment mark for rough alignment is provided on the support member and a second alignment mark for fine alignment is provided on the membrane portion, setting the photomask and an object to be exposed in a near-field exposure apparatus, aligning the photomask and the object using the first alignment mark, flexing the membrane portion to contact with the object and detecting a positional relation between the membrane portion and the object using the second alignment mark, aligning the photomask and the object based on the detected positional relation and flexing the membrane portion to contact with the object, and exposing the object to light from a light source by way of the photomask.

Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same

Provided is a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern with a smaller number of process steps, and a method of forming a pattern using such photosensitive silane coupling agent. Used is a photosensitive silane coupling agent having a secondary amino group protected by an o-nitrobenzyloxycarbonyl group.

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Yokohama, Japan

Takako Yamaguchi