Tokyo Ohka Kogyo Co., Ltd.

Fujitsu Corporation

Takako Suzuki

Kousuke Doi

Toshimasa Nakayama

Hidekatsu Kohara

Satoshi Niikura

Takashi Ohno

Kenji Maruyama

Satoshi Okuyama

Jun Kakuta

Kenichi Horio

Masaki Kurihara

Koji Yonemura

Hisayuki Morishima

Shoichi Fujita

Sachiko Tamura

Yuuki Yamamoto

Ken Tanaka

Toshinao Gunchi

Yuji Tabuchi

A positive resist composition for a thin-film implantation process of the present invention includes: a resin component (A) with an acid-dissociable dissolution inhibiting group, whose alkali solubility increases by the action of an acid; an acid generator component (B) which generates an acid by irradiation with radiation; and a compound (C) having a radiation absorbing ability, wherein said resin component (A) comprises a structural unit (a1) derived from a hydroxystyrene and a structural unit (a2) obtained by substituting the hydrogen atom in a hydroxyl group of said structural unit (a1) with an acid-dissociable dissolution inhibiting group, and said acid-dissociable dissolution inhibiting group contains an acid-dissociable dissolution inhibiting group (II) represented by the following general formula (II) as a main component. 

Positive resist composition for thin-film implantation process and method for forming resist pattern

This invention is to enable transfer of a right to speak in an audio teleconference in view of usability. In this invention, a PoC server is introduced to achieve new functions, such as transfer of the right to speak, reservation to acquire the right to speak, and deprivation of the right to speak. The PoC server has a teleconference presence manager, a teleconference manager, and a teleconference audio communication manager. The right to speak is managed in a presence data storage of the teleconference presence manager. The teleconference presence manager directly manages the presence data storage, but the teleconference manager manages transfer of the right to speak. In addition, the teleconference manager manages reservation of the right to speak by a storage for a reservation list of the right to speak. The teleconference audio communication manager carries out routing of audio data. At that time, only audio data received from a user holding the right to speak is transferred.

Audio teleconference system with wireless communication portable terminals

A composition includes (A) an alkali-soluble resin, (B) a quinonediazide ester of a compound represented by the following formula:and (C) a compound represented by the following formula:This composition is a positive photoresist composition that is excellent in sensitivity and definition and causes less shrink.

Positive photoresist composition

A positive photoresist composition includes (A) an alkali-soluble resin, (B) a photosensitizer including, for example, a quinonediazide ester of bis&lsqb;2,5-dimethyl-3-(2-hydroxy-5-methylbenzyl)-4-hydroxyphenyl&rsqb;methane, and (C) a compound having a gram absorption coefficient of 5 to 60 with respect to light with a wavelength of 365 nm.

Positive photoresist composition, substrate with a photosensitive film and process for imaging a resist pattern

A positive photoresist composition includes (A) an alkali-soluble resin, (B) a quinonediazide ester of, e.g., bis&lsqb; -dimethyl- -( -hydroxy- -methylbenzyl)- -hydroxyphenyl&rsqb;methane and/or -bis&lsqb; -hydroxy- -( -hydroxybenzyl)- -methylbenzyl&rsqb;- -cyclohexylphenol, and (C) -bis(diethylamino)benzophenone. The composition exhibits high sensitivity and definition and improved focal depth range properties and underexposure margin.

Positive photoresist composition and process for forming resist pattern

Disclosed are a positive photoresist composition including (A) an alkali-soluble resin, (B) a photosensitizer containing a quinonediazide ester of, e.g., bis&lsqb;2,5-dimethyl-3-(2-hydroxy-5-methylbenzyl)-4-hydroxyphenyl&rsqb;methane and (C) e.g., 2,6-bis(2,5-dimethyl-4-hydroxybenzyl)-4-methylphenol; and a process including the steps of coating the composition onto a 8 to 12-inch substrate, drying, exposing and developing the same. The composition which can form a pattern having a good shape whose dimensional changes are minimized in a wide range over surface of the substrate, particularly in processes using a large-diameter substrate, and the process for forming a resist pattern using the composition are provided.

Positive photoresist composition and process for forming resist pattern using same

In a positive photoresist composition including (A) an alkali-soluble resin and (B) a photosensitizer, Ingredient (B) contains (B-1) a quinonediazide ester of, e.g., bis&lsqb;2,5-dimethyl-3-(2-hydroxy-5-methylbenzyl)-4-hydroxyphenyl&rsqb;methane or 2,4-bis&lsqb;4-hydroxy-3-(4-hydroxybenzyl)-5-methylbenzyl&rsqb;-6-cyclohexylphenol, and (B-2) a quinonediazide ester of, e.g., methyl gallate or 2,2-bis(2,3,4-trihydroxyphenyl)propane. The composition exhibits high sensitivity and definition, and improved focal depth range properties and underexposure margin.

The present invention provides a positive resist composition and method capable of achieving a resist pattern whose photosensitivity is less variable relative to its thickness, which exhibits small thickness reduction even when the pattern is fine, is capable of coping with irregularities in the exposure value since it has a wide focal-depth range, and exhibits reduced size-deviation from the mask size. The positive resist composition comprises (A) an alkali-soluble resin, (B) a quinonediazide-group-containing compound, and (C) an organic solvent, wherein the ingredient (C) is a mixture solvent containing (i) 2-heptanone, (ii) ethyl lactate, and (iii) a high-boiling organic solvent having a boiling point of 200 to 350.degree. C. The above-described resist pattern can be formed by using the positive resist composition.

Positive resist composition

A positive photoresist composition comprising: (A) an alkali-soluble resin; (B) a quinone diazide group-containing compound; and (C) at least one compound selected from the polyhydroxy compounds, such as 1,3-bis�2-(5-cyclohexyl-2-methyl-4-hydroxyphenyl)-2-propyl!benzene. The composition of the present invention exhibits excellent image contrast between exposed portions and unexposed portions, and actualizes formation of a resist pattern with excellent resolution, exposure range, and focal depth range.

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Kanagawa, Japan

Takako Suzuki