Jsr Corporation

Takakazu Kimoto

Yusuke Asano

Tomohiro Kakizawa

Hiroshi Tomioka

Mitsuo Sato

Norihiko Sugie

Yasuhiko Matsuda

The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO, wherein a hydrogen atom or an electron-donating group bonds to an &#x3b1; carbon atom with respect to SO, and an electron-withdrawing group bonds to a &#x3b2; carbon atom with respect to SO; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), Rand Reach independently represent a hydrogen atom or a monovalent electron-donating group. Rrepresent a monovalent electron-withdrawing group. Rrepresents a hydrogen atom or a monovalent hydrocarbon group. 

Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound

A radiation-sensitive resin composition includes a polymer component, a radiation-sensitive acid generating agent, and a nitrogen-containing compound having a ring structure. The polymer component includes, in an identical polymer or different polymers, a first structural unit represented by a formula (1) and a second structural unit represented by a formula (2). Rrepresents a hydrogen atom or a methyl group. Z is a group which represents a divalent monocyclic alicyclic hydrocarbon group taken together with R. Rrepresents a carbon atom. Rrepresents a methyl group or an ethyl group. Rrepresents a hydrogen atom or a methyl group. X is a group which represents a divalent bridged alicyclic hydrocarbon group having no less than 10 carbon atoms taken together with R. Rrepresents a carbon atom. Rrepresents a branched alkyl group having 3 or 4 carbon atoms. 

Radiation-sensitive resin composition, polymer, and resist pattern-forming method

A radiation sensitive resin composition includes a first polymer having a group represented by a following formula (1), and a radiation sensitive acid generator. n is an integer of 2 to 4. X represents a single bond or a bivalent organic group. A represents a (n+1) valent linking group. Each Q independently represents a group that includes an alkali-dissociable group. 

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Tokyo, Japan

Takakazu Kimoto